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1.发明授权公开(公告)号：US09606429B2
公开(公告)日：2017-03-28
申请号：US14498883
申请日：2014-09-26
发明人： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC分类号： G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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2.发明申请公开(公告)号：US20170192365A1
公开(公告)日：2017-07-06
申请号：US15452445
申请日：2017-03-07
发明人： Nicolaas Rudolf KEMPER , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC分类号： G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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3.发明授权公开(公告)号：US10018925B2
公开(公告)日：2018-07-10
申请号：US15452445
申请日：2017-03-07
发明人： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC分类号： G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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