公开(公告)号：US07138726B2

公开(公告)日：2006-11-21

申请号：US11200373

申请日：2005-08-09

申请人： Gonzalo Amador ,  Sandra Rodriguez

发明人： Gonzalo Amador ,  Sandra Rodriguez

IPC分类号： H01L21/58 ,  B65B39/00

CPC分类号： H01L21/67366 ,  H01L21/67369 ,  H01L21/67383 ,  H01L21/67396

摘要： A package includes a first and a second wafer stored therein in a stacked configuration. The first wafer has interconnection conductor material portions extending from a first surface thereof. The interconnection conductor material portions have a maximum height. An interleaf member is located between the first and second wafers. A first recessed portion is formed in the interleaf member, and it has an outer perimeter shape corresponding to an outer perimeter shape of the first wafer. The first recessed portion has a first depth from a top surface of the interleaf member. A second recessed portion is formed in the interleaf member and located at least partially within the first recessed portion, and it has a bottom surface at a second depth from the top surface. The second depth is greater than the first depth. The second depth minus the first depth is greater than the maximum height.

公开(公告)号：US20060120840A1

公开(公告)日：2006-06-08

申请号：US10905089

申请日：2004-12-15

申请人： MING-CHIEN CHIU ,  MING-LUNG CHIU ,  YU-CHIAN YAN

发明人： MING-CHIEN CHIU ,  MING-LUNG CHIU ,  YU-CHIAN YAN

IPC分类号： B65B69/00

CPC分类号： H01L21/67353 ,  G03F1/64 ,  G03F1/66 ,  G03F7/70916 ,  H01L21/67366

摘要： A semiconductor container molded from a plastic material containing silver that absorb sulfide to prevent crystal formation on masks/wafers carried in the enclosed storage space inside the semiconductor container during a photolithographic process under the radiation of a deep-ultraviolet light source. In an alternate form of the invention, the inside wall of the semiconductor container is coated with a layer of silver to absorb sulfide. In another alternate form of the present invention, blocks of silver are fixedly provided inside the semiconductor container to absorb sulfide in the enclosed storage space.

摘要翻译： 一种由含有银的塑料材料制成的半导体容器，其在深紫外光源的辐射下的光刻工艺期间，在含有银的塑料材料中，该银吸收硫化物以防止在半导体容器内的封闭存储空间中携带的掩模/晶片上的晶体形成。 在本发明的替代形式中，半导体容器的内壁涂有一层银以吸收硫化物。 在本发明的另一种替代形式中，银块固定地设置在半导体容器内部以吸收封闭存储空间中的硫化物。

公开(公告)号：US20060032784A1

公开(公告)日：2006-02-16

申请号：US10917048

申请日：2004-08-12

申请人： Valoris Forsyth

发明人： Valoris Forsyth

IPC分类号： B65D85/30 ,  B65D81/02

CPC分类号： H01L21/67366 ,  H01L21/67369 ,  H01L21/67396

摘要： A cushion-like device is provided for the transportation of semiconductor wafers. The device includes an interior formed from polyethylene closed cell foam that utilizes a foaming agent that imparts minimal alkanes and cations into the polyethylene foam material. An electrostatic discharge dissipative polyethylene film surrounds the foam interior and is joined thereto by hot melt EVA material. An array of apertures of approximately 0.010 inch diameter and less than 0.25 inch spacing is formed in the film to allow the foam to compress upon impact.

摘要翻译： 提供了用于半导体晶片的输送的衬垫状器件。 该装置包括由聚乙烯闭孔泡沫形成的内部，该内部利用将最小的烷烃和阳离子赋予聚乙烯泡沫材料的发泡剂。 静电放电耗散聚乙烯膜围绕泡沫内部并通过热熔EVA材料与其连接。 在膜中形成大约0.010英寸直径和小于0.25英寸间距的孔阵列，以允许泡沫在冲击时压缩。

公开(公告)号：US20040191649A1

公开(公告)日：2004-09-30

申请号：US10818311

申请日：2004-04-05

发明人： Giang T. Dao ,  Ronald J. Kuse

IPC分类号： G03F009/00

CPC分类号： H01L21/67359 ,  G03F1/62 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H01L21/67366 ,  H01L21/67393

摘要： A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.

公开(公告)号：US20040004079A1

公开(公告)日：2004-01-08

申请号：US10190355

申请日：2002-07-05

发明人： Sanjiv Bhatt

IPC分类号： B65D090/22

CPC分类号： H01L21/67769 ,  B29C45/14 ,  B29C45/16 ,  H01L21/67366

摘要： A fire retardant container for semiconductor wafers having an enclosure portion formed from polycarbonate plastic. The enclosure has a top, a bottom, a pair of opposing sides, a back, and an open front. The container includes a door to close the open front having an outer surface portion formed from a plastic material having a flame propagation index of not greater than 9.0 (m/s 1/2)(kW/m)null2/3.

摘要翻译： 一种用于半导体晶片的阻燃容器，具有由聚碳酸酯塑料形成的外壳部分。 外壳具有顶部，底部，一对相对的侧面，后部和敞开的前部。 容器包括用于封闭开口前部的门，其具有由塑料材料形成的外表面部分，该塑料材料具有不大于9.0（m / s 1/2）（k / s 1/2）（kw / m 2） >。

公开(公告)号：US20030035713A1

公开(公告)日：2003-02-20

申请号：US09933503

申请日：2001-08-20

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Tsung-Chieh Tsai ,  Ching-Shan Lu ,  Tom Tseng

IPC分类号： B65G049/07

CPC分类号： H01L21/67366 ,  H01L21/67393

摘要： A moisture-controlled wafer storage container for storing semiconductor wafers during processing and a method for using the container are provided. The container may be constructed of a container body that has a front wall, a back wall, a left-side wall, a right-side wall and a top wall defining a cavity therein for receiving a wafer cassette and wafers stored in the cassette. The cavity is further defined by a bottom wall of a wafer cassette when the cassette is positioned in the container to form a sealed cavity. The container further includes a moisture-absorbing means that is placed in the container or in fluid communication with the sealed cavity of the container for absorbing moisture and for controlling a relative humidity in the sealed cavity to less than 30%, and preferably to less than 20%, and more preferably to less than 10%.

摘要翻译： 提供了一种用于在处理期间存储半导体晶片的湿度控制晶片储存容器以及使用该容器的方法。 容器可以由容器主体构成，该容器主体具有前壁，后壁，左侧壁，右侧壁和限定其中的空腔的顶壁，用于接收晶片盒和存储在盒中的晶片。 当盒被定位在容器中以形成密封空腔时，空腔进一步由晶片盒的底壁限定。 容器还包括吸湿装置，其被放置在容器中或与容器的密封腔流体连通，用于吸收水分并将密封空腔中的相对湿度控制在小于30％，优选小于 20％，更优选小于10％。

公开(公告)号：US20030019783A1

公开(公告)日：2003-01-30

申请号：US09926173

申请日：2001-09-18

发明人： Hideki Munakata

IPC分类号： B65D085/30 ,  B65D085/00

CPC分类号： H01L21/67366

摘要： There are provided a dust generation preventing structure of a wafer storage case and a process for preventing dust generation thereof, wherein dust generation is effectively prevented by blocking or suppressing free movement of particles constantly generated from a surface of a wafer storage case of a synthetic resin with a coating layer of a surfactant, and a wafer storing method using the wafer storage case. The wafer storage case of synthetic resin housing wafers, wherein a surface of the wafer storage case is coated with a coating layer of a coating agent to prevent dust generation from the surface.

摘要翻译： 提供了晶片储存箱的防尘结构和防止其产生粉尘的方法，其中通过阻挡或抑制从合成树脂的晶片储存盒的表面恒定产生的颗粒的自由移动有效地防止了粉尘产生 具有表面活性剂的涂层和使用晶片储存盒的晶片存储方法。 合成树脂壳体晶片的晶片储存盒，其中晶片储存盒的表面涂覆有涂层的涂层，以防止表面产生灰尘。

公开(公告)号：US5593916A

公开(公告)日：1997-01-14

申请号：US485012

申请日：1995-06-07

申请人： Yoshihisa Gotoh ,  Motoo Kawamata ,  Toshiaki Takahashi

发明人： Yoshihisa Gotoh ,  Motoo Kawamata ,  Toshiaki Takahashi

IPC分类号： H01L21/673 ,  H01L21/68 ,  H01L21/469

CPC分类号： H01L21/67363 ,  H01L21/67366 ,  Y10S156/914 ,  Y10S206/832 ,  Y10S438/974

摘要： A holding container which is made of a polyether ether ketone resin and is suitable for use in holding one or more substrates upon fabrication of the corresponding number of thin-film semiconductor substrates useful in driving a planar display, for example, a liquid crystal display.

摘要翻译： 一种保持容器，其由聚醚醚酮树脂制成，并且适用于在制造可用于驱动平面显示器例如液晶显示器的相应数量的薄膜半导体衬底时保持一个或多个衬底。

公开(公告)号：US5577610A

公开(公告)日：1996-11-26

申请号：US533784

申请日：1995-09-26

申请人： Kazuya Okuda ,  Satoshi Kawakami

发明人： Kazuya Okuda ,  Satoshi Kawakami

IPC分类号： B65D85/86 ,  G03F1/40 ,  G03F1/62 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  B65D81/18

CPC分类号： H01L21/67359 ,  G03F1/62 ,  G03F1/66 ,  G03F7/70691 ,  H01L21/67366 ,  H01L21/67396

摘要： Proposed is a novel casing for frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning process for the manufacture of fine electronic devices. Different from conventional casings made from a plastic resin, the casing of the invention is characterized by the use of a unique permanently antistatic resin composition which is a resin blend consisting of 80-95% by weight of an ABS or acrylic resin and 20-5% by weight of a specific hydrophilic polymer. By virtue of the excellent antistatic behavior of the resin composition, the frame-supported pellicle encased in the casing is safe from the troubles due to deposition of dust particles during transportation and from contamination by the vaporized matter from the casing.

摘要翻译： 提出了用于制造精细电子器件的光刻图案化工艺中用于光掩模防尘保护的框架支撑防护薄膜的新颖外壳。 不同于由塑料树脂制成的常规外壳，本发明的外壳的特征在于使用独特的永久抗静电树脂组合物，其是由80-95重量％的ABS或丙烯酸树脂组成的树脂共混物和20-5 重量％的特定亲水性聚合物。 由于树脂组合物具有优异的抗静电特性，因此，包装在壳体中的框架支撑的防护薄膜组件在运输期间由于灰尘颗粒的沉积和来自壳体的气化物质的污染而引起的麻烦是安全的。

公开(公告)号：US5284802A

公开(公告)日：1994-02-08

申请号：US768190

申请日：1991-10-16

申请人： Hisashi Muraoka ,  Takeyoshi Kakizaki

发明人： Hisashi Muraoka ,  Takeyoshi Kakizaki

IPC分类号： G01N1/28 ,  H01L21/304 ,  H01L21/66 ,  H01L21/673 ,  H01L21/00 ,  H01L21/02

CPC分类号： H01L21/67353 ,  H01L21/67366 ,  H01L21/67383

摘要： There is disclosed a container which conveys a semiconductor wafer and in which the face of the wafer is chemically treated. The container comprises a receiving platelike member and a cover made from a transparent or semitransparent plastic. The platelike member is made from a hydrophobic plastic such as a fluorocarbon resin and provides a quite small area in contact with the sample of the wafer to support it. Tonguelike portions extend steeply upwardly around the sample. When the cover is closed, the tonguelike portions are thrown toward the center of the container, bent, and pressed against the side surface of the sample. The container locks the sample without making contact with the face of the sample. The top cover is fitted over the platelike member to maintain the airtightness. To assure the airtightness, the container is equipped with an O ring and a tightening implement.

摘要翻译： PCT No.PCT / JP91 / 00205 Sec。 371日期1991年10月16日 102（e）日期1991年10月16日PCT 1991年2月19日PCT PCT。 出版物WO91 / 12631 日期为1991年8月22日。公开了一种传送半导体晶片的容器，其中晶片的表面经过化学处理。 容器包括接收板状构件和由透明或半透明塑料制成的盖。 板状构件由诸如氟碳树脂的疏水性塑料制成，并提供与晶片样品接触的相当小的面积以支撑它。 Tonguelike部分围绕样品陡峭地向上延伸。 当盖关闭时，将舌状部分朝向容器的中心抛出，弯曲并压靠在样品的侧表面上。 容器锁定样品，而不与样品的表面接触。 顶盖安装在板状构件上以保持气密性。 为了保证气密性，容器配有O形圈和紧固件。