公开(公告)号：US20080053151A1

公开(公告)日：2008-03-06

申请号：US11897406

申请日：2007-08-30

Applicant: Tatsuhiro Sato

Inventor： Tatsuhiro Sato

IPC: C03B19/00 ,  C03C3/078 ,  C03C3/095 ,  C03C3/112

CPC classification number: C03C1/00 ,  C03B19/063 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/36 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/36

Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.

Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英的粉末，或是玻璃状SiO 2颗粒的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。

公开(公告)号：US06611650B2

公开(公告)日：2003-08-26

申请号：US09925678

申请日：2001-08-09

Applicant: Hiroyuki Hayami ,  Terunobu Iio ,  Toshikazu Gozen ,  Hirokazu Kuzushita ,  Michitsugu Mori ,  Takashi Okamura ,  Shuichi Ohmori

Inventor： Hiroyuki Hayami ,  Terunobu Iio ,  Toshikazu Gozen ,  Hirokazu Kuzushita ,  Michitsugu Mori ,  Takashi Okamura ,  Shuichi Ohmori

IPC: G02B600

CPC classification number: C03C3/06 ,  C03B37/01413 ,  C03B37/01426 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2207/30 ,  C03B2207/32 ,  C03C13/045 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/26 ,  G02B6/06

Abstract: A silica optical fiber is provided, which contains a pure-silica core and a cladding layer formed on the pure-silica core, wherein the pure-silica core contains a C element and has a content of elements belonging to the third period-the seventh period of the periodic table, except Si element that constitutes the quartz structure, of not more than 100 ppm. The present invention can provide a silica optical fiber superior in the resistance to high energy electromagnetic waves such as UV light and &ggr;-rays.

公开(公告)号：US06399526B2

公开(公告)日：2002-06-04

申请号：US09871979

申请日：2001-06-04

Applicant: Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

Inventor： Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

IPC: C03C306

CPC classification number: C03B32/00 ,  C03B20/00 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/20 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2203/50 ,  Y10S501/905

Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E′ center as measured by means of an. electron spin resonance analysis is 3×1019 cm−3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E′ center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of-silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包括通过以下方法测量的E'中心浓度的区域。 电子自旋共振分析为3×10 19 cm -3以上。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％硅的石英玻璃原料的方法，通过向初始石英玻璃照射紫外线的方法或通过给予磨损损伤的方法来制造 通过喷砂处理到初始石英玻璃的表面。

公开(公告)号：US2556616A

公开(公告)日：1951-06-12

申请号：US1695448

申请日：1948-03-25

Applicant: CORNING GLASS WORKS

Inventor： ELLIS RICHARD B

IPC: C03C3/06 ,  C03C3/076 ,  C03C3/089 ,  C03C4/14 ,  C03C17/02 ,  H01B3/08

CPC classification number: H01B3/087 ,  C03C3/06 ,  C03C3/076 ,  C03C3/089 ,  C03C4/14 ,  C03C17/02 ,  C03C23/0095 ,  C03C2201/10 ,  C03C2201/26 ,  C03C2201/50 ,  C03C2203/10

公开(公告)号：US20190062193A1

公开(公告)日：2019-02-28

申请号：US16061929

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Matthias OTTER ,  Walter LEHMANN ,  Michael HÜNERMANN ,  Nils Christian NIELSEN ,  Nigel Robert WHIPPEY ,  Boris GROMANN ,  Abdoul-Gafar KPEBANE ,  Matthias SÖHN

IPC: C03B20/00 ,  C03B17/04 ,  C03B37/012 ,  C03B37/027 ,  C03C3/06 ,  C03C1/02

CPC classification number: C03B20/00 ,  C03B17/04 ,  C03B19/106 ,  C03B19/1095 ,  C03B37/01211 ,  C03B37/027 ,  C03B2201/04 ,  C03C1/022 ,  C03C1/026 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/54 ,  C03C2203/10 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/50

Abstract: The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

公开(公告)号：US20090098370A1

公开(公告)日：2009-04-16

申请号：US12249616

申请日：2008-10-10

Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida

Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida

IPC: B32B17/06 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03C4/02 ,  C03C4/082 ,  C03C23/008 ,  C03C2201/02 ,  C03C2201/26 ,  C03C2203/54 ,  Y10T428/261

Abstract: To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.

Abstract translation: 为了提供具有透明层的黑色合成石英玻璃，其在远红外区域具有高发射率，具有优异的遮光性能，在金属杂质方面保持与合成石英玻璃相同的纯度，具有高温粘度 与天然石英玻璃相当的特性，可进行焊接等高温加工，不会从表面释放碳; 以及其生产方法。 含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应，反应开始后，达到一定程度的 真空度超过10mmHg（1343Pa），在1200℃〜2000℃的温度下进行加热，生成紧凑的玻璃体。

公开(公告)号：US20060059948A1

公开(公告)日：2006-03-23

申请号：US10535935

申请日：2003-11-28

Applicant: Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

Inventor： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

IPC: C03C25/64

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是 烘烤，从而形成致密的玻璃体。

公开(公告)号：US20040223694A1

公开(公告)日：2004-11-11

申请号：US10406926

申请日：2003-04-04

Inventor： William V. Dower ,  Nirmal K. Viswanathan ,  Dora M. Paolucci ,  Michael D. Barrera

IPC: G02B006/34

CPC classification number: G02B6/02114 ,  C03C3/06 ,  C03C13/045 ,  C03C13/047 ,  C03C25/607 ,  C03C25/6226 ,  C03C2201/21 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/31 ,  C03C2201/60

Abstract: The present invention relates to increasing the photosensitivity of optical fibers. One aspect of the present invention comprises a method for rapidly diffusing hydrogen or deuterium into an optical fiber from a gas mixture having a low total hydrogen content to generate changes in the refractive index of the optical fiber. The resulting photosensitive fiber may be used to create optical devices including Bragg gratings and Bragg grating-based devices.

Abstract translation: 本发明涉及增加光纤的光敏性。 本发明的一个方面包括从具有低总氢含量的气体混合物将氢或氘快速扩散到光纤中以产生光纤的折射率变化的方法。 所得到的光敏纤维可以用于产生包括布拉格光栅和基于布拉格光栅的器件的光学器件。

公开(公告)号：US20020144517A1

公开(公告)日：2002-10-10

申请号：US10107792

申请日：2002-03-28

Applicant: Nikon Corporation

Inventor： Seishi Fujiwara ,  Kazuhiro Nakagawa ,  Hiroki Jinbo ,  Norio Komine

IPC: C03B020/00 ,  C03B019/14

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/24 ,  C03B2207/32 ,  C03B2207/36 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/50 ,  C03C2203/52

Abstract: A method is provided for manufacturing a synthetic silica glass. The method includes the steps of emitting an oxygen containing gas and a hydrogen containing gas from a burner; emitting a mixture of an organic silicon compound and a halogen compound from the burner; and reacting the mixture with the oxygen containing gas and the hydrogen containing gas to synthesize the silica glass.

Abstract translation: 提供了一种制造合成石英玻璃的方法。 该方法包括从燃烧器发射含氧气体和含氢气体的步骤; 从燃烧器发射有机硅化合物和卤素化合物的混合物; 并使混合物与含氧气体和含氢气体反应以合成二氧化硅玻璃。

公开(公告)号：US06380110B1

公开(公告)日：2002-04-30

申请号：US09484113

申请日：2000-01-14

Applicant: Waltraud Werdecker ,  Heinz Fabian ,  Udo Gertig ,  Johann Leist ,  Rolf Göbel

Inventor： Waltraud Werdecker ,  Heinz Fabian ,  Udo Gertig ,  Johann Leist ,  Rolf Göbel

IPC: C03B2000

CPC classification number: C03C1/026 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/54

Abstract: In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO2 granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO2 granulate to be used is a SiO2 granulate (21; 31) composed of at least partially porous agglomerates of SiO2 primary particles, with a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.8 g/cm3. A SiO2 granulate (21; 31) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO2 primary particles and in that it has a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.6 g/cm3.

Abstract translation: 在制造不透明石英玻璃的已知方法中，由合成SiO 2颗粒形成坯料，并在玻璃化温度下加热以形成不透明石英玻璃体。 为了在此基础上提供具有均匀孔分布，高密度，高粘度和低失透倾向的纯不透明石英玻璃的制备方法，根据本发明提出使用的SiO 2颗粒是 SiO 2颗粒（21; 31），其由SiO 2一次颗粒的至少部分多孔的附聚物组成，BET比表面积为1.5m 2 / g至40m 2 / g，表观密度为至少0.8g / cm 3。 适用于实施该方法的SiO 2颗粒（21; 31）的特征在于其由SiO 2一次颗粒的至少部分多孔的附聚物形成，并且其具有范围为1.5m 2 / g至40m 2的比BET表面积 / g，表观密度为0.6g / cm 3以上。