公开(公告)号：US06441382B1

公开(公告)日：2002-08-27

申请号：US09316657

申请日：1999-05-21

Applicant: Yongzhang Huang

Inventor： Yongzhang Huang

IPC: H01J37317

CPC classification number: H01J37/3171 ,  H01J2237/04756

Abstract: A deceleration electrode for a high-energy, ultra-low ion implanter is provided. The deceleration electrodes are “tilted” (i.e., not perpendicular with respect the ion beam axis. The deceleration electrode reduces the energy of the ion beam and simultaneously separates neutral particles out of the ion beam. The length of the deceleration electrode is slightly longer than a conventional deceleration electrode. However, because the device functions to also separate neutral particles out of the ion beam, the need for a separate neutral particle separation device is eliminated. Thus, the compact design of the dual function electrode configuration permits a shortening of the distance that a high-current, ultra-low energy ion beam must travel to the target wafer. Further, because the neutral particles can be almost completely separated from the ion beam, the decel ratio may be set high enabling an ultra-low energy, high current ion beam. In the tilted decel apparatus of the present invention, a plurality of decel electrodes having openings are arranged in an inclined manner against the axis which is perpendicular to the base axis of a beam passage. An ion beam impinging with a predetermined ion beam offset distance and inclination angle passes through gaps formed between the decel electrodes and thus, an ion beam is decelerated and neutral particles are separated from the ion beam. Thus, an ion beam can be formed having a high current, low neutral contamination, and ultra-low energy.

Abstract translation: 提供了一种用于高能超低离子注入机的减速电极。 减速电极相对于离子束轴线“倾斜”（即不垂直），减速电极降低离子束的能量，同时将中性粒子从离子束中分离出来，减速电极的长度略长于 然而，由于该装置还用于将离子束中的中性粒子分离，因此不需要分离的中性粒子分离装置，因此双功能电极构造的紧凑设计可以缩短 高电流，超低能量离子束必须行进到目标晶片的距离，此外，由于中性粒子几乎可以完全与离子束分离，所以减小比可以设定得高，能够实现超低能量， 高电流离子束在本发明的倾斜减速装置中，具有开口的多个减速电极设置在倾斜的人中 相对于垂直于梁通道的基轴的轴线。 以预定的离子束偏移距离和倾斜角度照射的离子束通过形成在减速电极之间的间隙，因此离子束被减速，中性粒子与离子束分离。 因此，可以形成具有高电流，低中性污染和超低能量的离子束。

公开(公告)号：US07915597B2

公开(公告)日：2011-03-29

申请号：US12050594

申请日：2008-03-18

Applicant: Yongzhang Huang ,  Ilya Pokidov

Inventor： Yongzhang Huang ,  Ilya Pokidov

IPC: H01J3/14

CPC classification number: H01J37/3171 ,  H01J27/024 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J2237/0458 ,  H01J2237/083 ,  H01J2237/20214 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/30455 ,  H01J2237/30483 ,  H01J2237/31703

Abstract: A system and method extraction electrode system, comprising an extraction electrode, wherein the extraction electrode, further defines an aperture and forms a portion of the outside wall of the ion source and is configured to extract ions from the ion source, a suppression disk half assembly comprising two suppression electrode plate disk halves that form a variable suppression aperture, a ground disk half assembly comprising two ground electrode plate disk halves that form an variable ground aperture, wherein the suppression disk half assembly is configured between the extraction electrode and the ground disk half assembly, wherein the suppression aperture and the ground aperture variable in the direction perpendicular to the ion beam direction of travel, and wherein the extraction electrode system is used with a pendulum reciprocating drive apparatus.

Abstract translation: 一种系统和方法提取电极系统，包括提取电极，其中所述提取电极还限定孔并形成离子源的外壁的一部分，并且被配置为从离子源提取离子，抑制盘半组件 包括形成可变抑制孔径的两个抑制电极板半部，包括形成可变接地孔的两个接地电极板半部的接地盘半组件，其中抑制盘半组件配置在提取电极和接地盘半部之间 组件，其中所述抑制孔径和所述接地孔径在垂直于所述离子束行进方向的方向上可变，并且其中所述引出电极系统与摆锤往复驱动装置一起使用。

公开(公告)号：US20090267001A1

公开(公告)日：2009-10-29

申请号：US12108890

申请日：2008-04-24

Applicant: Yongzhang Huang

Inventor： Yongzhang Huang

IPC: G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J37/3007 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/202 ,  H01J2237/24528

Abstract: An ion implantation system comprising an ion source that generates an ion beam along a beam path, a mass analyzer component downstream of the ion source that performs mass analysis and angle correction on the ion beam, a resolving aperture electrode comprising at least one electrode downstream of the mass analyzer component and along the beam path having a size and shape according to a selected mass resolution and a beam envelope, a deflection element downstream of the resolving aperture electrode that changes the path of the ion beam exiting the deflection element, a deceleration electrode downstream of the deflection element that decelerates the ion beam, a support platform within an end station for retaining and positioning a workpiece which is implanted with charged ions, and wherein the end station is mounted approximately eight degrees counterclockwise so that the deflected ion beam is perpendicular to the workpiece.

Abstract translation: 一种离子注入系统，包括沿光束路径产生离子束的离子源，离子源下游的质量分析器组件，其对离子束执行质量分析和角度校正;分辨孔径电极，包括至少一个电极 所述质量分析器部件并且沿着所述光束路径具有根据所选择的质量分辨率和光束包络的尺寸和形状;在所述分辨孔径电极下游的偏转元件改变离开偏转元件的离子束的路径;减速电极 在偏转元件的下游，使离子束减速，在终端站内的支撑平台，用于保持和定位植入有带电离子的工件，并且其中终端站逆时针安装大约八度，使得偏转的离子束垂直 到工件。

公开(公告)号：US20090236547A1

公开(公告)日：2009-09-24

申请号：US12050594

申请日：2008-03-18

Applicant: Yongzhang Huang ,  Ilya Pokidov

Inventor： Yongzhang Huang ,  Ilya Pokidov

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J27/024 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J2237/0458 ,  H01J2237/083 ,  H01J2237/20214 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/30455 ,  H01J2237/30483 ,  H01J2237/31703

Abstract: A system and method extraction electrode system, comprising an extraction electrode, wherein the extraction electrode, further defines an aperture and forms a portion of the outside wall of the ion source and is configured to extract ions from the ion source, a suppression disk half assembly comprising two suppression electrode plate disk halves that form a variable suppression aperture, a ground disk half assembly comprising two ground electrode plate disk halves that form an variable ground aperture, wherein the suppression disk half assembly is configured between the extraction electrode and the ground disk half assembly, wherein the suppression aperture and the ground aperture variable in the direction perpendicular to the ion beam direction of travel, and wherein the extraction electrode system is used with a pendulum reciprocating drive apparatus.

Abstract translation: 一种系统和方法提取电极系统，包括提取电极，其中所述提取电极还限定孔并形成离子源的外壁的一部分，并且被配置为从离子源提取离子，抑制盘半组件 包括形成可变抑制孔径的两个抑制电极板半部，包括形成可变接地孔的两个接地电极板半部的接地盘半组件，其中抑制盘半组件配置在提取电极和接地盘半部之间 组件，其中所述抑制孔径和所述接地孔径在垂直于所述离子束行进方向的方向上可变，并且其中所述引出电极系统与摆锤往复驱动装置一起使用。

公开(公告)号：US06835930B2

公开(公告)日：2004-12-28

申请号：US10753731

申请日：2004-01-08

Applicant: Victor M. Benveniste ,  Yongzhang Huang

Inventor： Victor M. Benveniste ,  Yongzhang Huang

IPC: H01J4930

CPC classification number: H01J37/32082 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/3266 ,  H01J2237/0041

Abstract: A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.

公开(公告)号：US06777696B1

公开(公告)日：2004-08-17

申请号：US10370952

申请日：2003-02-21

Applicant: Robert D. Rathmell ,  Bo H. Vanderberg ,  Yongzhang Huang

Inventor： Robert D. Rathmell ,  Bo H. Vanderberg ,  Yongzhang Huang

IPC: H01J37317

CPC classification number: H01J37/3171 ,  H01J37/1472

Abstract: An accelerating structure and related method for accelerating/decelerating ions of an ion beam are disclosed. The structure and related method are suitable for use in selectively implanting ions into a workpiece or wafer during semiconductor fabrication to selectively dope areas of the wafer. In addition to accelerating and/or decelerating ions, aspects of the present invention serve to focus as well as to deflect ions of an ion beam. This is accomplished by routing the ion beam through electrodes having potentials developed thereacross. The ion beam is also decontaminated as electrically neutral contaminants within the beam are not affected by the potentials and continue on generally traveling along an original path of the ion beam. The electrodes are also arranged in such a fashion so as to minimize the distance the beam has to travel, thereby mitigating the opportunity for beam blow up.

Abstract translation: 公开了一种用于离子束离子加速/减速的加速结构和相关方法。 该结构和相关方法适用于在半导体制造期间选择性地将离子注入到工件或晶片中以选择性地掺杂晶片的区域。 除了加速和/或减速离子之外，本发明的方面还用于聚焦以及偏转离子束的离子。 这是通过将离子束穿过具有在其上形成的电位的电极来实现的。 离子束也被净化，因为光束内的电中性污染物不受电位的影响，并且通常沿着离子束的原始路径继续行进。 电极也以这样的方式布置，以便使束必须行进的距离最小化，从而减轻了射束的机会。

公开(公告)号：US06770888B1

公开(公告)日：2004-08-03

申请号：US10606087

申请日：2003-06-25

Applicant: Victor M. Benveniste ,  Yongzhang Huang

Inventor： Victor M. Benveniste ,  Yongzhang Huang

IPC: H01J37147

CPC classification number: H01J37/32082 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/3266 ,  H01J2237/0041

Abstract: A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.

Abstract translation: 公开了一种用于带状离子束的质量分析器。 质量分析器包括限定分析器的入口端和出口端的一对线圈。 场夹具用于质量分析器的入口和出口端中的一个或多个处或其附近。 场夹具用于终止接近质量分析器入口和出口端的边缘场，从而减少这种边缘场对带状束的影响，并提高光束的均匀性。

公开(公告)号：US07994488B2

公开(公告)日：2011-08-09

申请号：US12108890

申请日：2008-04-24

Applicant: Yongzhang Huang

Inventor： Yongzhang Huang

IPC: G21K1/00

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J37/3007 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/202 ,  H01J2237/24528

Abstract: An ion implantation system comprising an ion source that generates an ion beam along a beam path, a mass analyzer component downstream of the ion source that performs mass analysis and angle correction on the ion beam, a resolving aperture electrode comprising at least one electrode downstream of the mass analyzer component and along the beam path having a size and shape according to a selected mass resolution and a beam envelope, a deflection element downstream of the resolving aperture electrode that changes the path of the ion beam exiting the deflection element, a deceleration electrode downstream of the deflection element that decelerates the ion beam, a support platform within an end station for retaining and positioning a workpiece which is implanted with charged ions, and wherein the end station is mounted approximately eight degrees counterclockwise so that the deflected ion beam is perpendicular to the workpiece.

Abstract translation: 一种离子注入系统，包括沿光束路径产生离子束的离子源，离子源下游的质量分析器组件，其对离子束执行质量分析和角度校正;分辨孔径电极，包括至少一个电极 所述质量分析器部件并且沿着所述光束路径具有根据所选择的质量分辨率和光束包络的尺寸和形状;在所述分辨孔径电极下游的偏转元件改变离开偏转元件的离子束的路径;减速电极 在偏转元件的下游，使离子束减速，在终端站内的支撑平台，用于保持和定位植入有带电离子的工件，并且其中终端站逆时针安装大约八度，使得偏转的离子束垂直 到工件。

公开(公告)号：US07701230B2

公开(公告)日：2010-04-20

申请号：US11742178

申请日：2007-04-30

Applicant: John Zheng Ye ,  Michael Paul Cristoforo ,  Yongzhang Huang ,  Michael A. Graf ,  Bo H. Vanderberg

Inventor： John Zheng Ye ,  Michael Paul Cristoforo ,  Yongzhang Huang ,  Michael A. Graf ,  Bo H. Vanderberg

IPC: G01R27/08 ,  H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578 ,  H01J2237/30477

Abstract: One embodiment of the invention relates to an apparatus for profiling an ion beam. The apparatus includes a current measuring device having a measurement region, wherein a cross-sectional area of the ion beam enters the measurement region. The apparatus also includes a controller configured to periodically take beam current measurements of the ion beam and to determine a two dimensional profile of the ion beam by relating the beam current measurements to sub-regions within the current measuring device. Other apparatus and methods are also disclosed.

Abstract translation: 本发明的一个实施例涉及一种用于对离子束进行成像的装置。 该装置包括具有测量区域的电流测量装置，其中离子束的横截面积进入测量区域。 该装置还包括控制器，其被配置为周期性地对离子束进行束电流测量，并且通过将束电流测量值与当前测量装置内的子区域相关联来确定离子束的二维轮廓。 还公开了其它装置和方法。

公开(公告)号：US07579604B2

公开(公告)日：2009-08-25

申请号：US11445722

申请日：2006-06-02

Applicant: John W. Vanderpot ,  Yongzhang Huang

Inventor： John W. Vanderpot ,  Yongzhang Huang

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

Abstract: A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and selectively travels through the mass analyzer to the end station, based on a position of a beam stop assembly. The beam stop assembly selectively prevents the ion beam from entering and/or exiting the mass analyzer, therein minimizing contamination associated with an unstable ion source during transition periods such as a start-up of the ion implantation system.

Abstract translation: 提供了用于减轻与离子注入相关的污染的系统，方法和装置。 提供了一种位于离子源和终端之间的离子源，终端站和质量分析器，其中离子源由离子源形成，并且基于位置，选择性地通过质量分析器传送到终端站 光束挡块组件。 光束停止组件选择性地防止离子束进入和/或离开质量分析器，其中最小化在诸如离子注入系统的启动的过渡期间与不稳定离子源相关联的污染。