公开(公告)号：US20080073563A1

公开(公告)日：2008-03-27

申请号：US11479628

申请日：2006-07-01

Applicant: W. Thomas Novak ,  Michael Binnard ,  Alex Ka Tim Poon ,  Masahiro Totsu ,  Leonard Wai Fung Kho ,  Gaurav Keswani

Inventor： W. Thomas Novak ,  Michael Binnard ,  Alex Ka Tim Poon ,  Masahiro Totsu ,  Leonard Wai Fung Kho ,  Gaurav Keswani

IPC: G01F23/00

CPC classification number: G03F7/70875 ,  G03F7/70758 ,  H01L21/67248 ,  H01L21/68 ,  H02K9/20 ,  H02K41/02

Abstract: A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).

Abstract translation: 用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330） 。 循环系统（330）将循环流体（378）引导到流体通道（370）中。 循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。 通过这种设计，可以优化液体（378A）和气体（378B）的管道。 另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。 通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于 通道入口处的循环流体（378）的温度（374）。 此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体的状态的压力控制装置（996） 978）在通道入口附近（974）。 通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。

公开(公告)号：US6140734A

公开(公告)日：2000-10-31

申请号：US54766

申请日：1998-04-03

Applicant: Andrew J. Hazelton ,  W. Thomas Novak

Inventor： Andrew J. Hazelton ,  W. Thomas Novak

IPC: H02K3/04 ,  H02K3/24 ,  H02K3/47 ,  H02K15/04 ,  H02K15/06 ,  H02K41/03 ,  H02K9/00 ,  H02K7/197

CPC classification number: H02K15/061 ,  H02K15/0435 ,  H02K3/04 ,  H02K3/24 ,  H02K3/47 ,  H02K41/03

Abstract: Regular windings for use in an armature in an electric motor. Windings, each having approximately the same shape as a regular winding, may be overlapped to increase a conductor density within a volume encompassing portions of the windings by having a portion of each winding at least partially fill an aperture of an adjacent overlapping winding. The windings are associated with phases used to operate an electric motor. The windings and armature should be particularly useful in linear electric motors and in steppers used in semiconductor manufacture. Windings of the same shape improve manufacturability of the armature and electric motor. High conductor densities in the windings significantly improve efficiency of the electric motor.

Abstract translation: 用于电动机中电枢的常规绕组。 每个具有与常规绕组大致相同形状的绕组可以重叠，以通过使每个绕组的一部分至少部分地填充相邻的重叠绕组的孔径来增加包围绕组部分的体积内的导体密度。 绕组与用于操作电动机的相关联。 绕组和电枢在线性电动机和半导体制造中使用的步进器中特别有用。 相同形状的绕组改善了电枢和电动机的可制造性。 绕组中的高导体密度显着提高了电动机的效率。

公开(公告)号：US4723086A

公开(公告)日：1988-02-02

申请号：US916129

申请日：1986-10-07

Applicant: Vladimir E. Leibovich ,  W. Thomas Novak

Inventor： Vladimir E. Leibovich ,  W. Thomas Novak

IPC: G05B19/39 ,  H01L21/68 ,  H01L41/09 ,  H01L41/08

CPC classification number: H02N2/04 ,  G05B19/39 ,  H01L21/68 ,  H02N2/028

Abstract: The positioning system, particularly useful for moving a stage mounting a semiconductor wafer for the manufacture of semiconductor devices, provides a lead screw and zero backlash nut for coarse motion of the stage. A thrust member fixedly mounts the nut and the member is flexurally mounted to a housing supporting the stage acting through a piezoelectric motor connection. This action brings the stage in a coarse adjustment mode into the capture range of the piezoelectric motor for fine adjustment by in and out movement of a pusher rod extending from the motor. Flexures allow motion of the thrust member parallel to the lead screw and protects the piezoelectric motor from undesirable side loads. A separate duplicate mechanism is used for each of x-axis and y-axis movements of the housing and stage to bring the stage to a precise position by the respective coarse and fine translationary movements of the lead screw, thrust members and piezoelectric motors.

Abstract translation: 定位系统特别适用于移动安装用于制造半导体器件的半导体晶片的平台，为舞台的粗略运动提供导螺杆和零齿隙螺母。 推力构件固定地安装螺母，并且构件弯曲地安装到支撑通过压电马达连接作用的台架的壳体上。 该动作使粗调调整模式进入压电电动机的捕获范围，通过从电动机延伸的推杆的进出运动进行微调。 弯曲允许推力构件平行于导螺杆运动，并保护压电马达免受不利的侧向载荷。 壳体和平台的x轴和y轴运动中的每一个都使用单独的重复机构，以通过导螺杆，推力构件和压电马达的相应的粗略和精细的平移运动使台架达到精确的位置。

公开(公告)号：US4704033A

公开(公告)日：1987-11-03

申请号：US836784

申请日：1986-03-06

Applicant: Bernard Fay ,  W. Thomas Novak

Inventor： Bernard Fay ,  W. Thomas Novak

IPC: G03F9/00 ,  G01B9/02 ,  G01B11/27

CPC classification number: G03F9/7076 ,  G21K1/06

Abstract: An optical alignment apparatus and method for a semiconductor lithography mask and wafer utilizes two monochromatic light sources of different wavelengths. The mask contains targets in the form of linear Fresnel zone plates and the wafer contains a reflecting grating. Incident illumination from the two light sources illuminates the mask targets and is reflected from the wafer gratings in various intensity depending on the physical characteristics of the wafer and mask layers and thicknesses and by the targets. A detector detects the strongest of the diffracted return beams from each of the monochromatic light sources and uses the strongest to align the targets and grating on the mask and wafer for more accurate printing of mask patterns on the wafer.

Abstract translation: 用于半导体光刻掩模和晶片的光学对准装置和方法利用了不同波长的两个单色光源。 该掩模包含线性菲涅耳区板形式的靶，并且晶片包含反射光栅。 来自两个光源的入射照明照射掩模目标，并且根据晶片和掩模层的厚度以及靶材的物理特性以各种强度从晶片光栅反射。 检测器检测来自每个单色光源的最强的衍射返回光束，并且使用最强的对准掩模和晶片上的目标和光栅，以更准确地印刷晶片上的掩模图案。

公开(公告)号：US4648106A

公开(公告)日：1987-03-03

申请号：US673964

申请日：1984-11-21

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: H01L21/027 ,  G03F7/20 ,  G21K5/00

CPC classification number: G03F7/70866 ,  G03F7/2039

Abstract: A controlled flow of X-ray attenuating gas such as helium is provided to an upper portion of a beam exposure chamber. A vent tube (21) extends from a lower portion of the chamber adjacent a mask to an exterior exit orifice (23) positioned at mask level to prevent ingress of air to the chamber and prevent mask membrane deflecton and change in the mask-to-silicon wafer substrate gap distance. The substrate (20) is positioned below the mask membrane and is surrounded by a mask-to-wafer zone into which is flowed a substrate fabrication process gas which is vented either by a gas flange (25) in spaced gapped relation to the mask holder and mask, or by a vent tube (46) extending from the zone to an orifice end (46a) approximate the level of the mask. There is then no pressure differential on the top and bottom surfaces of the mask membrane affecting the mask-to-wafer gap distance (8) during substrate fabrication operations.

Abstract translation: X射线衰减气体如氦的受控流动被提供给光束曝光室的上部。 通气管（21）从邻近掩模的腔室的下部延伸到位于掩模水平处的外部出口孔（23），以防止空气进入腔室并防止掩膜膜偏转并改变掩模 - 硅晶片衬底间隙距离。 衬底（20）位于掩模膜下方并且由掩模到晶片区域围绕，衬底制造工艺气体通过气体凸缘（25）以间隔开的间隙与掩模保持器 和掩模，或通过从区域延伸到孔口端部（46a）的通气管（46）近似于掩模的水平面。 在衬底制造操作期间，在掩模膜的顶表面和底表面上没有压差影响掩模到晶片间隙距离（8）。

公开(公告)号：US20130141735A1

公开(公告)日：2013-06-06

申请号：US13488322

申请日：2012-06-04

Applicant: Michael Sogard ,  Alexander Cooper ,  W. Thomas Novak

Inventor： Michael Sogard ,  Alexander Cooper ,  W. Thomas Novak

IPC: G01B11/14

CPC classification number: G01B11/14 ,  G01B11/002

Abstract: A target (16) for a metrology system (10) that monitors the position of an object (12) includes a target housing (225) and a photo detector assembly (226). The target housing (225) can include a first target surface (218A), and a second target surface (218B) that is at an angle relative to the first target surface (218A). The photo detector assembly (226) can include a first detector (220A) that is secured to the first target surface (218A), and a second detector (220B) that is secured to the second target surface (218B). Each of the detectors (220A) (220B) can be a quad cell that includes four detector cells (238A) (238B) (238C) (238D) that are separated by a gap (236).

Abstract translation: 用于监测物体（12）的位置的测量系统（10）的目标（16）包括目标壳体（225）和光电检测器组件（226）。 目标壳体（225）可以包括第一目标表面（218A）和相对于第一目标表面（218A）成一定角度的第二目标表面（218B）。 光检测器组件（226）可以包括固定到第一目标表面（218A）的第一检测器（220A）和固定到第二目标表面（218B）的第二检测器（220B）。 每个检测器（220A）（220B）可以是四边形单元，其包括由间隙（236）分开的四个检测器单元（238A）（238B）（238C）（238D）。

公开(公告)号：US20120050726A1

公开(公告)日：2012-03-01

申请号：US13214717

申请日：2011-08-22

Applicant: W. Thomas Novak ,  Daniel G. Smith ,  Lloyd Holland

Inventor： W. Thomas Novak ,  Daniel G. Smith ,  Lloyd Holland

IPC: G01J1/00

CPC classification number: G01B11/14 ,  G01B11/002 ,  G01S5/16 ,  G01S5/163 ,  G01S17/00

Abstract: A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.

Abstract translation: 一种测量系统，其使用位于要组装的物体上的多个光检测目标，多个旋转光发射头，产生参考RF信号的主信号发生器，以及确定每个 从由每个目标响应于光发射头的信号产生的目标。 在操作期间，将参考RF信号广播到旋转的光发射头和光检测目标。 RF信号用于以高精确度确定磁头相对于零参考位置的方位角。

公开(公告)号：US07932989B2

公开(公告)日：2011-04-26

申请号：US11808850

申请日：2007-06-13

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03C5/00

CPC classification number: G03F7/70341

Abstract: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

Abstract translation: 用于浸没式光刻设备的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，通过该曝光区域将图像图案投影到诸如晶片的工件上。 这些喷嘴各自适于选择性地用作用于将流体供应到曝光区域中的源喷嘴或用作从曝光区域回收流体的回收喷嘴。 流体控制装置用于使得在曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴并且使所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得可以建立期望的流动模式 为了方便浸没光刻。

公开(公告)号：US07889207B2

公开(公告)日：2011-02-15

申请号：US11704404

申请日：2007-02-08

Applicant: Li Hong ,  Maki Suzuki ,  Mark Takita ,  W. Thomas Novak

Inventor： Li Hong ,  Maki Suzuki ,  Mark Takita ,  W. Thomas Novak

IPC: G06T17/00 ,  G09G5/00 ,  H04N5/235 ,  H04N7/12 ,  G06K9/40 ,  G03B7/00

CPC classification number: H04N5/235 ,  G06T5/002 ,  G06T5/009 ,  G06T5/20 ,  G06T5/40 ,  G06T5/50 ,  G06T2207/10024 ,  G06T2207/20012 ,  G06T2207/20192 ,  H04N5/2355 ,  H04N5/243 ,  H04N2101/00

Abstract: An image apparatus (10) for providing an adjusted image (242) of a scene (236) includes a capturing system (16) and a control system (24). The capturing system (16) captures an underexposed first frame (240) that is defined by a plurality of pixels (240A), including a first pixel and a second pixel. The first frame (240) includes at least one of a first texture region (240S) and a second texture region (240T). The control system (24) can analyze information from the pixels (240A) and determine if the first pixel has captured a portion of the first texture region (240S) or the second texture region (240T). Further, the control system (16) can analyze information from the pixels (240A) and to determine if the second pixel has captured a portion of the first texture region (240S) or the second texture region (240T). With this design, the control system (16) can reduce the noise in the first frame (240) to provide a well exposed adjusted image (242).

Abstract translation: 用于提供场景（236）的调整图像（242）的图像设备（10）包括捕获系统（16）和控制系统（24）。 捕获系统（16）捕获由包括第一像素和第二像素的多个像素（240A）限定的曝光不足的第一帧（240）。 第一框架（240）包括第一纹理区域（240S）和第二纹理区域（240T）中的至少一个。 控制系统（24）可以分析来自像素（240A）的信息，并且确定第一像素是否已经捕获了第一纹理区域（240S）或第二纹理区域（240T）的一部分。 此外，控制系统（16）可以分析来自像素（240A）的信息，并且确定第二像素是否已经捕获了第一纹理区域（240S）或第二纹理区域（240T）的一部分。 利用这种设计，控制系统（16）可以减少第一帧（240）中的噪声，以提供良好曝光的调整图像（242）。

公开(公告)号：US07821615B2

公开(公告)日：2010-10-26

申请号：US11808850

申请日：2007-06-13

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03C5/00

Abstract: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.