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公开(公告)号：US09547236B2
公开(公告)日：2017-01-17
申请号：US14568317
申请日：2014-12-12
Inventor： Qiang Wu , Huayong Hu , Chang Liu , Jianhua Ju , Charles Kwok Fung Lee
CPC classification number: B05D3/06 , B05B7/228 , B05D1/02 , B41J2/447 , G03F7/0002
Abstract: A patterning apparatus is provided. The patterning apparatus includes a plurality of liquid jet units arranged in one or more groups and configured to jet an anti-etching liquid onto a surface of a substrate. The patterning apparatus also includes a plurality of exposure units configured to expose light on the anti-etching liquid jetted on the surface of the substrate to heat and cure the jetted anti-etching liquid to form anti-etching patterns on the surface of the substrate. Further, the patterning apparatus includes a control unit configured to control motion status and jetting status of the plurality of liquid jet units and motion status and exposure status of the plurality of exposure units, so as to form the anti-etching patterns at a predetermined line width and thickness.
Abstract translation: 提供了图案形成装置。 图案形成装置包括多个液体喷射单元，其以一个或多个组的形式排列并且构造成将抗蚀刻液体喷射到基板的表面上。 图案形成装置还包括多个曝光单元，其配置为在喷射在基板表面上的抗蚀刻液体上曝光，以加热和固化喷射的抗蚀刻液体，以在基板的表面上形成抗蚀刻图案。 此外，图案形成装置包括控制单元，其被配置为控制多个液体喷射单元的运动状态和喷射状态以及多个曝光单元的运动状态和曝光状态，以便在预定行上形成防蚀刻图案 宽度和厚度。
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公开(公告)号：US11085884B2
公开(公告)日：2021-08-10
申请号：US16523859
申请日：2019-07-26
Applicant: Semiconductor Manufacturing International (Shanghai) Corporation , Semiconductor Manufacturing International (Beijing) Corporation
Abstract: A substrate surface defect detection device includes an optical waveguide for receiving first light and directing the received first light to a surface of a to be tested substrate, the optical waveguide having a first surface facing toward the substrate and a second surface facing away from the substrate, a microlens array disposed on the second surface of the optical waveguide, the microlens array including a plurality of microlenses arranged in an array for receiving second light from the surface of the to be tested substrate and converging the received second light to converged light, and an imaging component for receiving the converged light from the at least one microlens array for optical imaging. The substrate surface defect detection device requires significantly less time than conventional substrate surface defect detection devices.
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公开(公告)号：US10679881B2
公开(公告)日：2020-06-09
申请号：US15797966
申请日：2017-10-30
Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION , SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
Inventor： Qiang Wu , Xuan Liu , Shifeng He , Jianyao Liu
IPC: H01L21/67 , H01L23/544 , G03F7/20
Abstract: An apparatus for detecting a mark having first and second stripe groups on a substrate includes a detection module moveable over a surface of the substrate. The detection module includes a detection unit and a positioning unit configured to align the detection unit with the mark. The detection unit is configured to obtain data of the mark and operative to perform repeated acquisition operations on the first and second stripe groups of the mark. Each of the acquisition operations acquires data associated with the first stripe group or the second stripe group. The apparatus also includes a processing module configured to determine a positional deviation between the first stripe group and the second stripe group in response to the obtained data of the mark and data associated with a motion of the detection module.
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公开(公告)号：US10187964B2
公开(公告)日：2019-01-22
申请号：US15967852
申请日：2018-05-01
Abstract: Calibrating apparatus and method for correcting aberrations in an extreme ultraviolet (EUV) light source are provided. A calibrating apparatus includes an illuminant positioned at a radiating position, including a plurality of light sources arranged along a straight scanning direction, the plurality of light sources emitting light sequentially; a condenser stage configured to carry a to-be-corrected condenser mirror and drive the to-be-corrected condenser mirror to rotationally scan so that a reflective ellipsoidal surface of the to-be-corrected condenser mirror collects light emitted by the light sources and converge collected light at a center of focus through reflection; and an array detector positioned at the center of focus configured to detect light reflected by the to-be-corrected condenser mirror to obtain a detection spot, the array detector including a standard center point overlapping with the center of focus for comparing a position difference between the detection spot and the standard center point.
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公开(公告)号：US10180631B2
公开(公告)日：2019-01-15
申请号：US13924325
申请日：2013-06-21
Inventor： Qiang Wu
IPC: G03F7/20
Abstract: A lithography system may include a wafer stage. The wafer stage may include a wafer mounting part configured to carry a wafer and configured to oscillate along a plane that is parallel to a top surface of the wafer in a wafer exposure process. The wafer stage may further include a driving device configured to affect an oscillatory movement of the wafer mounting part in the wafer exposure process.
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Patent Agency Ranking
公开(公告)号：US20180079159A1
公开(公告)日：2018-03-22
申请号：US15659377
申请日：2017-07-25
Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION , SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
Inventor： XIAOFENG YUAN , Qiang Wu
CPC classification number: B29D11/00365 , G02B1/041 , G02B3/0006 , G02B3/0012 , G02B3/0056 , G02B3/0062 , G02B3/0068 , G02B3/0075 , G02B5/1885 , G02B6/4203 , G02B13/0085 , G02B17/08 , G02B27/32
Abstract: A method for assembling a microlens array assembly including a set of microlens array elements having at least two array elements having a first array element and a second array element includes adsorbing the first array element using a mobile platform, adsorbing the second array element using a fixture platform, coarsely aligning the second array element with the first array element based on edges of the second array element and edges of the first array element, finely aligning the second array element with the first array element based on an array pattern of the second array element and an array pattern of the first array element, and attaching the second array element to the first array element. The method enables assembling of multiple microlens array elements.
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公开(公告)号：US10427185B2
公开(公告)日：2019-10-01
申请号：US15372091
申请日：2016-12-07
Inventor： Qiang Wu , Huayong Hu , Chang Liu , Jianhua Ju , Charles Kwok Fung Lee
Abstract: A patterning apparatus is provided. The patterning apparatus includes a plurality of liquid jet units arranged in one or more groups and configured to jet an anti-etching liquid onto a surface of a substrate. The patterning apparatus also includes a plurality of exposure units configured to expose light on the anti-etching liquid jetted on the surface of the substrate to heat and cure the jetted anti-etching liquid to form anti-etching patterns on the surface of the substrate. Further, the patterning apparatus includes a control unit configured to control motion status and jetting status of the plurality of liquid jet units and motion status and exposure status of the plurality of exposure units, so as to form the anti-etching patterns at a predetermined line width and thickness.
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公开(公告)号：US10416091B2
公开(公告)日：2019-09-17
申请号：US15706409
申请日：2017-09-15
Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION , SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
Abstract: A substrate surface defect detection device includes an optical waveguide for receiving first light and directing the received first light to a surface of a to be tested substrate, the optical waveguide having a first surface facing toward the substrate and a second surface facing away from the substrate, a microlens array disposed on the second surface of the optical waveguide, the microlens array including a plurality of microlenses arranged in an array for receiving second light from the surface of the to be tested substrate and converging the received second light to converged light, and an imaging component for receiving the converged light from the at least one microlens array for optical imaging. The substrate surface defect detection device requires significantly less time than conventional substrate surface defect detection devices.
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公开(公告)号：US10105722B2
公开(公告)日：2018-10-23
申请号：US14287716
申请日：2014-05-27
Inventor： Yang Liu , Qiang Wu , Huayong Hu
IPC: H01L21/027 , B05B12/12 , G03F7/16
Abstract: A photoresist coating apparatus is provided. The photoresist coating apparatus includes a base; and a position platform moving back and forth along a scanning direction on the base. The photoresist coating apparatus also includes an imprinter having a trench configured to hold photoresist and fixed on the position platform; and a photoresist spray nozzle disposed above the imprinter and configured to spray the photoresist into the trench. Further, the photoresist coating apparatus includes a reticle frame configured to install a cylindrical reticle and enable the cylindrical reticle to rotate around a center axis and contact with the imprinter so as to coat the photoresist in the trench on a surface of the cylindrical reticle.
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公开(公告)号：US10007331B2
公开(公告)日：2018-06-26
申请号：US14569860
申请日：2014-12-15
Applicant: Semiconductor Manufacturing International (Beijing) Corporation , Semiconductor Manufacturing International (Shanghai) Corporation
Inventor： Qiang Wu
CPC classification number: G06F3/011 , G02B27/0093 , G02B27/017 , G02B2027/014 , G02B2027/0178 , G02B2027/0187 , G06F3/017
Abstract: A wearable intelligent system is provided. The system includes a frame; and a micro projector disposed on the frame configured to project an image interface onto a beam splitter. The system also includes the beam splitter disposed on the frame configured to receive the image interface and form a virtual image in a user's eye; and a position sensor disposed on the front of the frame configured to sense a position of at least a body part and a change mode of the position with time and convert the change mode of the position into operation commands and the position into a position data. Further, the system includes a central data hub disposed on the frame configured to at least receive the position data and the operation commands and adjust the image interface to match the part of the user's body and perform corresponding operations according to the position data.
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