Tag input device of electronic device and control method thereof

    公开(公告)号:US10739981B2

    公开(公告)日:2020-08-11

    申请号:US15812481

    申请日:2017-11-14

    Abstract: A method of an electronic device is provided. The electronic device includes a display, a memory storing instructions, and at least one processor electrically coupled with the display and the memory. The at least one processor is configured to control to display at least one content in a first area, control display a first tag mapped to a first content in a second area, in response to detecting an input on the first content included in the at least one content, control to display a second tag distinguished from the first tag, in a third area, and map the second tag to the first content, in response to detecting an input to move the second tag to the second area, the second tag being displayed in the third area.

    Texture processing method and device

    公开(公告)号:US10733764B2

    公开(公告)日:2020-08-04

    申请号:US15622927

    申请日:2017-06-14

    Abstract: A texture processing method and apparatus that obtains information about a first data loss amount that occurred during a texture compression process. A determination is made regarding a second data loss amount that allowable during a texture filtering process based on the obtained information regarding the first data loss amount. Texture filtering is then performed by using the second data loss amount. At least one processor determines the second data loss amount based on a difference between the third data loss amount and the first data loss amount.

    PLASMA GENERATING APPARATUS
    16.
    发明申请
    PLASMA GENERATING APPARATUS 审中-公开
    等离子体发生装置

    公开(公告)号:US20150206716A1

    公开(公告)日:2015-07-23

    申请号:US14601878

    申请日:2015-01-21

    Abstract: A plasma generating apparatus includes a chamber that encloses a reaction space that is isolated from the outside; a wafer chuck disposed in a lower portion of the chamber; a plasma generation unit disposed in an upper portion of the chamber; a first radio-frequency (RF) power source that supplies RF power to the plasma generation unit; a first matching unit interposed between the first RF power source and the plasma generation unit; a second RF power source that supplies RF power to the wafer chuck; and a second matching unit interposed between the second RF power source and the wafer chuck. The first RF power source supplies a first pulse power level and a different second pulse power level at different times.

    Abstract translation: 等离子体发生装置包括:室,其包围与外部隔离的反应空间; 设置在所述室的下部的晶片卡盘; 设置在所述室的上部的等离子体产生单元; 向所述等离子体发生单元提供RF功率的第一射频(RF)电源; 介于所述第一RF电源和所述等离子体产生单元之间的第一匹配单元; 向晶片卡盘提供RF功率的第二RF电源; 以及插入在第二RF电源和晶片卡盘之间的第二匹配单元。 第一RF电源在不同时间提供第一脉冲功率电平和不同的第二脉冲功率电平。

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