公开(公告)号：US20140179041A1

公开(公告)日：2014-06-26

申请号：US13973954

申请日：2013-08-22

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Jeong-Ho Yi ,  Yong-Suk Lee

IPC: H01L33/52

CPC classification number: H01L33/52 ,  B05D1/60 ,  B05D1/62 ,  H01L21/67207 ,  H01L51/5253 ,  H01L51/5256 ,  H01L51/56

Abstract: An apparatus and method for manufacturing a thin film encapsulation includes: a first cluster configured to form a first inorganic layer on a display substrate using a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the display substrate using a monomer deposition process; and a third cluster configured to form a second inorganic layer on the first organic layer on the display substrate using a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.

Abstract translation: 一种用于制造薄膜封装的装置和方法包括：第一簇，其被配置为使用溅射工艺在显示基板上形成第一无机层; 第二簇，其被配置为使用单体沉积工艺在所述显示基板上的所述第一无机层上形成第一有机层; 以及第三簇，其被配置为使用化学气相沉积（CVD）工艺或等离子体增强化学气相沉积（PECVD）工艺在所述显示衬底上的所述第一有机层上形成第二无机层。

公开(公告)号：US20140134768A1

公开(公告)日：2014-05-15

申请号：US14078422

申请日：2013-11-12

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Cheol-Min Jang ,  Myung-Soo Huh ,  Suk-Won Jung ,  Jae-Hyun Kim ,  Sung-Chul Kim ,  Jin-Kwang Kim ,  Chang-Woo Shim ,  Sung-Hun Key ,  In-Kyo Kim

IPC: H01L33/52

CPC classification number: C23C16/45544 ,  C23C16/403 ,  C23C16/4412 ,  C23C16/45519 ,  C23C16/45563 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/0011 ,  H01L51/50 ,  H01L51/56

Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.

Abstract translation: 一种用于在基板上沉积薄膜的气相沉积设备，通过该气相沉积设备有效地进行沉积工艺并容易地改善沉积膜特性;以及气相沉积设备，包括：设置有基板的平台; 以及供给单元，其配置成面对基板，具有主体部件和喷嘴部件，所述主体部件和喷嘴部件配置在与所述基板相对的所述主体部件的一个表面上，以顺序向所述基板供给多个气体;以及制造有机物的方法 发光显示装置。

公开(公告)号：US20190169747A1

公开(公告)日：2019-06-06

申请号：US16271189

申请日：2019-02-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

IPC: C23C16/455

Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

公开(公告)号：US09673265B2

公开(公告)日：2017-06-06

申请号：US14020849

申请日：2013-09-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Jeong-Ho Yi ,  Sang-Hyuk Hong ,  Yong-Suk Lee

IPC: H01L21/68 ,  H01L27/32 ,  C23C16/04 ,  C23C16/458 ,  H01L21/687

CPC classification number: C23C16/042 ,  C23C16/4405 ,  C23C16/4585 ,  C23C16/50 ,  C23C16/52 ,  H01L21/681 ,  H01L21/682 ,  H01L21/68735 ,  H01L21/68742 ,  H01L27/3244 ,  H01L51/0012 ,  H01L51/56

Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.

公开(公告)号：US09590207B2

公开(公告)日：2017-03-07

申请号：US15073354

申请日：2016-03-17

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Sun-Ho Kim ,  Hyun-Woo Joo ,  Jae-Hyun Kim

IPC: H01L51/52 ,  H01L51/56 ,  H01L51/00 ,  H01L27/32 ,  H01L51/50

CPC classification number: H01L51/5253 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/5012 ,  H01L51/56 ,  H01L2251/558

Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.

Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。

公开(公告)号：US20160348241A1

公开(公告)日：2016-12-01

申请号：US15231647

申请日：2016-08-08

Applicant: Samsung Display Co., Ltd.

Inventor： Cheol-Min Jang ,  Myung-Soo Huh ,  Suk-Won Jung ,  Jae-Hyun Kim ,  Sung-Chul Kim ,  Jin-Kwang Kim ,  Chang-Woo Shim ,  Sung-Hun Key ,  In-Kyo Kim

IPC: C23C16/455 ,  H01L51/00 ,  C23C16/44 ,  H01L51/56

CPC classification number: C23C16/45544 ,  C23C16/403 ,  C23C16/4412 ,  C23C16/45519 ,  C23C16/45563 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/0011 ,  H01L51/50 ,  H01L51/56

Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.

Abstract translation: 一种用于在基板上沉积薄膜的气相沉积设备，通过该气相沉积设备有效地进行沉积工艺并容易地改善沉积膜特性;以及气相沉积设备，包括：设置有基板的平台; 以及供给单元，其配置成面对基板，具有主体部件和喷嘴部件，所述主体部件和喷嘴部件配置在与所述基板相对的所述主体部件的一个表面上，以顺序向所述基板供给多个气体;以及制造有机物的方法 发光显示装置。

公开(公告)号：US20160203954A1

公开(公告)日：2016-07-14

申请号：US15076488

申请日：2016-03-21

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Suk-Won Jung ,  Myung-Soo Huh ,  Choel-Min Jang

IPC: H01J37/32

CPC classification number: H01L27/32 ,  C23C16/4401 ,  C23C16/452 ,  C23C16/45542 ,  C23C16/45551 ,  C23C16/50 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32513 ,  H01J37/32541 ,  H01J37/32834 ,  H01L51/56 ,  H05H1/2406 ,  H05H2001/2418 ,  H05H2001/2431

Abstract: Provided is a vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.

Abstract translation: 提供了一种蒸镀装置，其特征在于，包括：等离子体发生器，被配置为将第一原料气体的至少一部分变为自由基形式; 对应于等离子体发生器的对应表面; 等离子体发生器和相应表面之间的反应空间; 以及与等离子体发生器分离并围​​绕等离子体发生器的绝缘构件。

公开(公告)号：US09306192B2

公开(公告)日：2016-04-05

申请号：US13965182

申请日：2013-08-12

Applicant: Samsung Display Co., LTD

Inventor： Myung-Soo Huh ,  Sun-Ho Kim ,  Hyun-Woo Joo ,  Jae-Hyun Kim

IPC: H01L51/56 ,  H01L51/00 ,  H01L51/52

CPC classification number: H01L51/5253 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/5012 ,  H01L51/56 ,  H01L2251/558

Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.

Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。

公开(公告)号：US20160020428A1

公开(公告)日：2016-01-21

申请号：US14872978

申请日：2015-10-01

Applicant: SAMSUNG DISPLAY CO., LTD

Inventor： Sung-Joong Joo ,  Myung-Soo Huh ,  Suk-Won Jung

IPC: H01L51/52

CPC classification number: H01L51/5256 ,  H05B33/04 ,  H05B33/10

Abstract: A flat panel display device provides a sealing structure for comprising and sealing a display unit disposed in a first region on a substrate. The display unit includes the first region and a second region, and a barrier is disposed in the first region on the substrate, on an outer side of the display unit, and adjacent to the second region. The sealing structure contacts the barrier, and includes at least one first layer of an inorganic material and at least one second layer of an organic material. A method of manufacturing the flat panel display device is also disclosed.

Abstract translation: 平板显示装置提供密封结构，用于包括并密封设置在基板上的第一区域中的显示单元。 所述显示单元包括所述第一区域和第二区域，并且所述屏障设置在所述基板的所述第一区域中，所述显示单元的外侧上并且与所述第二区域相邻。 密封结构与屏障接触，并且包括至少一个无机材料的第一层和至少一个有机材料的第二层。 还公开了一种制造平板显示装置的方法。

公开(公告)号：US10038169B2

公开(公告)日：2018-07-31

申请号：US14020848

申请日：2013-09-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Jin-Kwang Kim ,  In-Kyo Kim ,  Choel-Min Jang

IPC: H01J37/00 ,  H01L51/56 ,  C23C16/452 ,  H01J37/32

CPC classification number: H01L51/56 ,  C23C16/452 ,  H01J37/32357

Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.