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公开(公告)号：US06261738B1
公开(公告)日：2001-07-17
申请号：US09533952
申请日：2000-03-23
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： G03G7004
CPC分类号： G03F7/039 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22 , G03F7/0045 , Y10S430/12
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.
摘要翻译： 式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的， 未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合作为光敏酸供体。
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公开(公告)号：US20110171569A1
公开(公告)日：2011-07-14
申请号：US12996795
申请日：2009-06-02
IPC分类号： G03F7/004 , C07D335/08 , C07D339/08 , C07D413/02 , C07D285/16 , C07D327/08 , C08F228/06 , G03F7/20 , G03F1/00
CPC分类号： C07D339/08 , C07D327/08
摘要： Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30-cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X− is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.
摘要翻译： 式（I）化合物，其中R1，R2和R3例如是氢，卤素，CN，C1-C18烷基，C1-C10卤代烷基，（CO）R8，（CO）OR4或（CO）NR5R6; Y为O，S或CO; D2，D3和D4例如是直接键合，O，S，NR7，CO，O（CO），（CO）O，S（CO），（CO）S，NR7（CO） SO，SO 2或OSO 2，C 1 -C 18亚烷基，C 3 -C 30亚环烷基，C 2 -C 12亚烯基，C 4 -C 30环亚烯基，Ar 1; Ar 1，Ar 2和Ar 3是例如亚苯基，R 4，R 5，R 6，R 7和R 8是例如氢，C 3 -C 30 - 环烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3 - 烷基; X-是式（IA），（IB）或（IC）; R 10例如为C 1 -C 18烷基，C 1 -C 10卤代烷基，樟脑基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基; R 11，R 12，R 13，R 14和R 15例如为C 1 -C 10卤代烷基; 可用作可聚合的光潜酸。
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公开(公告)号：US20090042114A1
公开(公告)日：2009-02-12
申请号：US12154333
申请日：2008-05-22
IPC分类号： C07D209/82 , C07C317/12 , G03F7/004 , C07D335/04
CPC分类号： C07C251/48 , B33Y70/00 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/40 , C07D209/86 , C07D307/91 , C07D333/76 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Compounds of the formula I or II wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar″1-A1-Y1-A1-Ar″1—; wherein these radicals optionally are substituted; Ar″1 is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A1 is for example a direct bond, —O—, —S—, or —NR6—; Y1 inter alia is C1-C18alkylene; X is halogen; D is for example —O—, —S— or —NR6—; D1 inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.
摘要翻译： 式I或II的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，亚二苯基，亚杂芳基，氧联二苯基，亚苯基-D-D1-D-phenylene或-Ar''1-A1-Y1-A1-Ar'1,1- 其中这些基团任选被取代; Ar 1是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部被取代; A1是例如直接键，-O - ， - S - 或-NR 6 - ; Y1特别是C 1 -C 18亚烷基; X是卤素; D是例如-O - ， - S-或-NR 6 - ; D1特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特别适合作为光潜酸。
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公开(公告)号：US20050153244A1
公开(公告)日：2005-07-14
申请号：US10495710
申请日：2003-01-28
IPC分类号： C07C301/00 , C07C309/67 , C07C309/68 , C07C317/04 , C07C317/14 , C07C323/66 , C07C381/00 , C07D209/48 , C07D209/76 , C07D291/00 , C07D333/36 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0037 , B33Y70/00 , C07C323/66 , C07C381/00 , G03F7/001 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0758 , Y10S430/114
摘要： Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X0 is —[CH2]h—X or —CH═CH2; h is 2, 3, 4, 5 or 6; R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example —OR20, —NR21R22, —SR23; X′ is —X1-A3-X2—; X1 and X2 are for example —O—, —S— or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is —S— or —O—; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-C18alkyl; R20, R21, R22 and R23 i.a are phenyl or C1-C18alkyl; give high resolution with good resist profile.
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公开(公告)号：US06673850B1
公开(公告)日：2004-01-06
申请号：US09959174
申请日：2001-10-18
IPC分类号： C08F246
CPC分类号： C07D295/108 , B33Y70/00 , C07C323/54 , C08F2/50 , C08F293/005 , C08F295/00 , C08L53/00 , C08L53/02 , C09D153/00 , C09D153/02 , C09J153/00 , C09J153/02 , G03F7/031 , Y10S522/904
摘要： Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.
摘要翻译： 具有链转移基团的式（Ia）或（Ib）的光引发剂，其中n为1或2; PI是例如式（IIa）的一组; PI“特别是一组式（IIIa）; Ar是例如苯基; Ar2尤其是亚苯基; R 1和R 2例如是C 1 -C 8烷基，或者R 1和R 2一起是C 2 -C 9亚烷基; M1特别是-NR 3 R 4或-OH; M1'例如是一组（c）; R3'是直接键，C1-C12亚烷基或亚苯基; R3是例如氢或C1-C12烷基; R4是例如 C 1 -C 12烷基; A1和A2例如是直接键; CT是链转移组; 可用于制备可用于制备嵌段共聚物的大分子引发剂。
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公开(公告)号：US06306555B1
公开(公告)日：2001-10-23
申请号：US09740205
申请日：2000-12-18
申请人： Reinhard Schulz , Jean-Luc Birbaum , Jean-Pierre Wolf , Stephan Ilg , Hitoshi Yamato , Toshikage Asakura
发明人： Reinhard Schulz , Jean-Luc Birbaum , Jean-Pierre Wolf , Stephan Ilg , Hitoshi Yamato , Toshikage Asakura
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , B33Y70/00 , C07C17/00 , C07C25/18 , C07C2601/14 , C08G59/68 , C08G65/105 , G03F7/0045 , G03F7/038 , G03F7/0392 , Y10S430/115
摘要： Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I X is branched C3-C20alkyl or C3-C8cycloalkyl; X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4; Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl; A− is a non-nucleophilic anion, selected from the group (BF4)−, (SbF6)−, (PF6)−, (B(C6F5))4−, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; and R1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen; with the proviso that the two phenyl rings on the iodine atom are not identically substituted.
摘要翻译： 辐射敏感性组合物，其包含（a1）阳离子或酸可催化聚合或交联的化合物或（a2）在酸的作用下增加其在显影剂中的溶解度的化合物; 和（b）式IX的至少一种二芳基碘鎓盐是支链C 3 -C 20烷基或C 3 -C 8环烷基; X 1是氢，直链C 1 -C 20烷基，支链C 3 -C 20烷基或C 3 -C 8环烷基; 条件是X和X 1中的碳原子总数至少为4; Y为直链C 1 -C 10烷基，支链C 3 -C 10烷基或C 3 -C 8环烷基; A-为非亲核阴离子，选自（BF 4 ） - ，（SbF 6） - ，（PF 6） - ，（B（C 6 F 5））4-，C 1 -C 20烷基磺酸酯，C 2 -C 20卤代烷基磺酸酯，未取代的C 6 -C 10芳基磺酸酯，樟脑磺酸酯和C 6 -C 10芳基磺酸酯，被卤素， ，C 1 -C 12卤代烷基，C 1 -C 12烷氧基或COOR 1; 并且R 1是C 1 -C 20烷基，苯基，苄基; 或被C 1 -C 12烷基，C 1 -C 12烷氧基或卤素单取代或多取代的苯基;条件是碘原子上的两个苯环不同等取代。
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公开(公告)号：US20110217654A1
公开(公告)日：2011-09-08
申请号：US13028323
申请日：2011-02-16
IPC分类号： G03F7/004 , C07C69/753 , C07D311/74 , C07C69/63 , C07D307/77 , C07D207/277 , C07C309/82 , C07C69/96 , C07C271/24 , C07D265/30 , C07D233/38 , C08F28/02 , G03F7/20
CPC分类号： C07C69/63 , B33Y70/00 , B33Y80/00 , C07C69/753 , C07C69/96 , C07C271/24 , C07C309/82 , C07D207/277 , C07D233/38 , C07D265/30 , C07D307/77 , C07D311/74 , C08F28/02 , G03F7/004 , G03F7/20
摘要： The invention pertains to a compound generating an acid of the formula I or II, for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes wherein X is CH2 or CO; Y is O, NR4, S, O(CO), O(CO)O, O(CO)NR4, OSO2, O(CS), or O(CS)NR4; R1 is for example C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, interrupted C2-C18alkyl, interrupted C3-C30cycloalkyl, interrupted C3-C30cycloalkyl-C1-C18alkyl, interrupted C4-C30cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R1 is NR12R13; R2 and R3 are for example C3-C30cycloalkylene, C3-C30cycloalkyl-C1-C18alkylene, C1-C18alkylene, C1-C10haloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R4 is for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl; R12 and R13 are for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, Ar, (CO)R15, (CO)OR15 or SO2R15; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.
摘要翻译： 本发明涉及产生式I或II的酸的化合物，例如相应的锍盐和碘鎓盐，以及其中X是CH 2或CO的相应的磺酰肟; Y是O，NR4，S，O（CO），O（CO）O，O（CO）NR4，OSO2，O（CS）或O（CS）NR4; R 1是例如C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，间断的C 2 -C 18烷基，间断的C 3 -C 30环烷基， 间断的C 3 -C 30环烷基-C 1 -C 18烷基，间断的C 4 -C 30环烯基，苯基，萘基，蒽基，菲基，联苯基，芴基或杂芳基，全部未取代或被取代; 或R1是NR12R13; R2和R3是例如C 3 -C 30亚环烷基，C 3 -C 30环烷基-C 1 -C 18亚烷基，C 1 -C 18亚烷基，C 1 -C 10卤代亚烷基，C 2 -C 12亚烯基，C 4 -C 30亚环烯基，亚苯基，亚萘基，亚蒽基，亚菲基，亚联苯基或亚杂芳基。 全部未取代或取代; R4是例如C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12链烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基; R 12和R 13例如为C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基，Ar，（CO）R 15 CO）OR15或SO2R15; 并且Ar是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，全部是未取代或取代的。
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公开(公告)号：US07687220B2
公开(公告)日：2010-03-30
申请号：US11632687
申请日：2005-07-11
IPC分类号： G03F7/028 , C07C259/08
CPC分类号： C07C309/67 , B33Y70/00 , C07C309/65 , C07C309/73 , C07C309/74 , C07C309/75 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/66 , C07D209/86 , C07F9/097 , G03F7/0007 , G03F7/0045 , G03F7/0382 , G03F7/0392 , Y10S430/12
摘要： The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group X1, X2 and X3 independently of each other are O or S; R′1, is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.
摘要翻译： 本发明涉及式I，II或III的新型光致酸产生剂化合物，其中R 1为例如C 1 -C 18烷基磺酰基或苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，均为任选取代的，或者R 1为基团X 1 ，X2和X3彼此独立地为O或S; R'1，例如 亚苯基二磺酰基，亚苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，全部任选被取代; R2是卤素或C1-C10卤代烷基; X是卤素; Ar1为例如联苯基或芴基，或为取代的萘基; Ar'1是杂亚芳基，任选取代; R8，R9，R10和R11例如是未被取代或被卤素取代的C1-C6烷基; 或R 8，R 9和R 10为未被取代或被C 1 -C 4烷基或卤素取代的苯基; 或R 10和R 11一起是1,2-亚苯基或未被取代或被C 1 -C 4烷基或卤素取代的C 2 -C 6亚烷基。
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公开(公告)号：US20080286693A1
公开(公告)日：2008-11-20
申请号：US11999116
申请日：2007-12-04
IPC分类号： G03F7/20
CPC分类号： G03F7/0037 , B33Y70/00 , C07C323/66 , C07C381/00 , G03F7/001 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0758 , Y10S430/114
摘要： Chemically amplified photoresist compositions comprising,(a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula Ia, Ib, IIa, IIb, IIIa, IIIb, IVa, IVb, Va, Vb or VIa wherein n is 1 or 2; m is 0 or 1; X0 is —[CH2]h—X or —CH═CH2; h is 2, 3, 4, 5 or 6; R1, when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example —OR20, —NR21R22, —SR23; X′ is —X1-A3-X-; X1 and X2 are for example —O—, —S— or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is —S— or —O—; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-C18alkyl; R20, R21, R22 and R23 i.a. are phenyl or C1-C18alkyl; give high resolution with good resist profile.
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公开(公告)号：US07399577B2
公开(公告)日：2008-07-15
申请号：US10543429
申请日：2004-02-09
IPC分类号： G03C5/00 , C07C255/50 , C07C251/32
CPC分类号： C07C251/48 , B33Y70/00 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/40 , C07D209/86 , C07D307/91 , C07D333/76 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Compounds of the formula (I) or (II) wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2- C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10 haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D1-D-phenylene or —Ar′1-A1—Y1-A1—Ar′1—; wherein these radicals optionally are substituted; Ae′, is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for example a direct bond, —0—, —S—, or —NR6—; Y, inter alia is C1-C18alkylene; X is halogen; D is for example —0—, —S— or —NR6—; D, inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.
摘要翻译： 式（I）或（II）的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 卤代烷酰基，卤代苯甲酰基， R 2是卤素或C 1 -C 10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1是例如亚苯基，亚萘基，二亚苯基，亚杂芳基，氧联二苯基，亚苯基D-D 1-D-亚苯基或-Ar' -A 1 -Y 1-A 1 -Ar'1 - ; - - - - 其中这些基团任选被取代; Ae'是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部任意取代; A是例如直接键，-O - ， - S-或-NR 6 - 。 Y尤其是C 1 -C 18亚烷基; X是卤素; D是例如-O - ， - S-或-NR 6 - 。 D，尤其是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特别适合作为光潜酸。
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