SOLID-STATE IMAGING APPARATUS AND METHOD OF DRIVING THE SAME

    公开(公告)号:US20250080870A1

    公开(公告)日:2025-03-06

    申请号:US18951132

    申请日:2024-11-18

    Abstract: An imaging device including a photoelectric converter that generates signal charge; a charge storage region that stores the signal charge; a first transistor that has a gate coupled to the charge storage region and reads out the signal charge; a feedback amplifier that feeds back an output of the first transistor in a negative feedback manner to the charge storage region, the feedback amplifier having two input terminals, the output of the first transistor being input to a first input terminal, a reference voltage being input to a second input terminal; and voltage supply circuitry. In a reset operation for discharging the signal charge stored in the charge storage region, the voltage supply circuitry supplies voltages to the second input terminal of the feedback amplifier, and the voltages include at least three voltages different from each other.

    SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE DEVICE
    15.
    发明申请
    SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE DEVICE 有权
    固态成像装置及其制造方法

    公开(公告)号:US20150123180A1

    公开(公告)日:2015-05-07

    申请号:US14556093

    申请日:2014-11-28

    Abstract: Each unit pixel includes a photoelectric converter, an n-type impurity region forming an accumulation diode together with the semiconductor region, the accumulation diode accumulating a signal charge generated by the photoelectric converter, an amplifier transistor including a gate electrode electrically connected to the impurity region, and an isolation region formed around the amplifier transistor and implanted with p-type impurities. The amplifier transistor includes an n-type source/drain region formed between the gate electrode and the isolation region, and a channel region formed under the gate electrode. A gap in the isolation region is, in a gate width direction, wider at a portion including the channel region than at a portion including the source/drain region.

    Abstract translation: 每个单位像素包括光电转换器,与半导体区域一起形成累积二极管的n型杂质区域,累积二极管累积由光电转换器产生的信号电荷;放大器晶体管,包括电连接到杂质区的栅电极 以及形成在放大晶体管周围并注入p型杂质的隔离区域。 放大器晶体管包括形成在栅极电极和隔离区域之间的n型源极/漏极区域和形成在栅电极下方的沟道区域。 在包括沟道区域的部分中,隔离区域中的间隙在栅极宽度方向上比在包括源极/漏极区域的部分处更宽。

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