公开(公告)号：US20170047194A1

公开(公告)日：2017-02-16

申请号：US15225969

申请日：2016-08-02

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Hideo INOUE ,  Hayato KIMURA ,  Yasuo KATO ,  Jun YASHIMA

IPC: H01J37/20 ,  H01J37/24 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

Abstract translation: 多带电粒子束写入装置包括最大照射时间获取处理电路，用于针对每个射束的多光束获取每个多光束的照射时间的最大照射时间，单位区域写入时间计算处理电路 使用每个镜头的最大照射时间来计算单位区域的写入时间，通过在每个单元中累积在阶段移动期间照射相关单元区域的多次照射多次拍摄的每次镜头的最大照射时间 通过划分目标物体的写入区域而获得的多个单位区域的区域，台阶速度计算处理电路，通过使用单位区域写入时间，计算各单位区域的台阶速度，使台阶速度变化， 用于可变地控制舞台速度的舞台控制处理电路。