公开(公告)号：US08889333B2

公开(公告)日：2014-11-18

申请号：US13443166

申请日：2012-04-10

申请人： Koji Ichikawa ,  Isao Yoshida ,  Yuko Yamashita

发明人： Koji Ichikawa ,  Isao Yoshida ,  Yuko Yamashita

IPC分类号： G03F7/004 ,  C07C303/32 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/19 ,  G03F7/039 ,  C07C381/12 ,  C07C309/17 ,  C07C25/18

CPC分类号： C07C309/17 ,  C07C25/18 ,  C07C303/32 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/19 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

摘要： A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 respectively represent a C3-C36 hydrocarbon ring, R1 and R2 respectively represent a hydrogen atom or C1-C6 alkyl group, R3 represents C1-C6 alkyl group, t represents an integer of 0 to 2 and Z+ represents an organic counter ion.

摘要翻译： 由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示其中亚甲基可以被氧原子代替的C1-C17二价饱和烃基或 羰基，L2和L3分别表示单键或C1-C6二价饱和烷基，其中亚甲基可被氧原子或羰基取代，环W1和环W2分别表示C3-C36烃 环，R1和R2分别表示氢原子或C1-C6烷基，R3表示C1-C6烷基，t表示0〜2的整数，Z +表示有机抗衡离子。

公开(公告)号：US08802352B2

公开(公告)日：2014-08-12

申请号：US13567892

申请日：2012-08-06

申请人： Koji Ichikawa ,  Yuichi Mukai ,  Isao Yoshida

发明人： Koji Ichikawa ,  Yuichi Mukai ,  Isao Yoshida

IPC分类号： G03F7/004 ,  G03F7/26 ,  G03F7/027 ,  C07C69/753

CPC分类号： C07C309/17 ,  C07C381/12 ,  C07C2603/74

摘要： A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+are defined in the specification.

摘要翻译： 由式（I）表示的盐：其中Q1，Q2，L1，W和Z +在说明书中定义。

公开(公告)号：US20110076617A1

公开(公告)日：2011-03-31

申请号：US12888243

申请日：2010-09-22

申请人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

发明人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

IPC分类号： G03F7/20 ,  G03C1/73

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.

摘要翻译： 本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由 式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团 。

公开(公告)号：US09507258B2

公开(公告)日：2016-11-29

申请号：US13290558

申请日：2011-11-07

申请人： Koji Ichikawa ,  Masahiko Shimada ,  Takashi Nishimura

发明人： Koji Ichikawa ,  Masahiko Shimada ,  Takashi Nishimura

IPC分类号： G03F7/004 ,  C08F220/38 ,  G03F7/039 ,  G03F7/20 ,  C08F220/28

CPC分类号： G03F7/004 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—, * represents a binding position to X1, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

公开(公告)号：US09346750B2

公开(公告)日：2016-05-24

申请号：US12947349

申请日：2010-11-16

申请人： Koji Ichikawa ,  Mitsuyoshi Ochiai ,  Masako Sugihara

发明人： Koji Ichikawa ,  Mitsuyoshi Ochiai ,  Masako Sugihara

IPC分类号： C07C309/19 ,  C07C309/17 ,  C07C381/12 ,  C07D307/33 ,  C07D307/93 ,  C07D327/06 ,  C07D333/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

CPC分类号： C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D307/33 ,  C07D307/93 ,  C07D327/06 ,  C07D333/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

摘要翻译： 由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子等，L1和L2各自独立地表示C1-C17二价饱和烃基，环W1表示C3-C36饱和烃环，R2 每次出现羟基等，s表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示的基团：其中，环W2表示C4-C36 饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替，R3是 在每次出现时独立地为C1-C6烷基等，t表示0〜2的整数，或式（X-2）表示的基团：其中，环W3表示C3-C36饱和烃环，R4表示 在每次出现时都独立地是羟基等，R5各自独立地出现 含有C 1 -C 6烷基等，v表示1〜3的整数，w表示0〜2的整数。

公开(公告)号：US09291893B2

公开(公告)日：2016-03-22

申请号：US13281145

申请日：2011-10-25

申请人： Tatsuro Masuyama ,  Satoshi Yamamoto ,  Koji Ichikawa

发明人： Tatsuro Masuyama ,  Satoshi Yamamoto ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

摘要翻译： 抗蚀剂组合物含有 具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

公开(公告)号：US09229320B2

公开(公告)日：2016-01-05

申请号：US13196446

申请日：2011-08-02

申请人： Koji Ichikawa ,  Satoshi Yamamoto

发明人： Koji Ichikawa ,  Satoshi Yamamoto

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/2059

摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.

摘要翻译： 抗蚀剂组合物含有 具有衍生自由式（a）表示的化合物的结构单元的树脂; 和由式（B1）表示的酸发生剂。 其中R1表示氢原子或甲基; A10表示单键，可以具有取代基的C1〜C6烷二基或由说明书中定义的式（a-1）表示的基团; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。

公开(公告)号：US08916330B2

公开(公告)日：2014-12-23

申请号：US12821850

申请日：2010-06-23

申请人： Koji Ichikawa ,  Takashi Hiraoka

发明人： Koji Ichikawa ,  Takashi Hiraoka

IPC分类号： G03F7/004 ,  G03F7/40 ,  C07C321/00 ,  C07D407/00

CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/20 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041

摘要： The present invention provides a resist composition giving a resist pattern excellent in CD uniformity and focus margin. A chemically amplified photoresist composition comprises a resin (A) and an acid generator (B), and the resin (A) contains, as a part or an entirety thereof, a copolymer (A1) which is obtained by polymerizing at least: a (meth)acrylic monomer (a1) having C5-20 alicyclic hydrocarbon group which becomes soluble in an aqueous alkali solution by the action of an acid; a (meth)acrylic monomer (a2) having a hydroxy group-containing adamantyl group; and a (meth)acrylic monomer (a3) having a lactone ring, and the copolymer (A1) has a weight-average molecular weight of 2500 or more and 5000 or less, and a content of the copolymer (A1) is not less than 50 parts by mass with respect to 100 parts by mass of the resin (A).

摘要翻译： 本发明提供了具有优异的CD均匀性和聚焦余量的抗蚀剂图案的抗蚀剂组合物。 化学放大型光致抗蚀剂组合物包含树脂（A）和酸产生剂（B），树脂（A）的一部分或全部含有共聚物（A1），其通过至少聚合得到：（ 甲基）丙烯酸单体（a1），其具有通过酸的作用变得可溶于碱性水溶液的C5-20脂环族烃基; 具有含羟基金刚烷基的（甲基）丙烯酸系单体（a2） 和具有内酯环的（甲基）丙烯酸系单体（a3），共聚物（A1）的重均分子量为2500以上且5000以下，共聚物（A1）的含量为 相对于100质量份树脂（A）为50质量份。

公开(公告)号：US08859182B2

公开(公告)日：2014-10-14

申请号：US13404064

申请日：2012-02-24

申请人： Koji Ichikawa ,  Takahiro Yasue ,  Akira Kamabuchi

发明人： Koji Ichikawa ,  Takahiro Yasue ,  Akira Kamabuchi

IPC分类号： G03F7/004 ,  G03F7/027 ,  C08F26/06 ,  G03F7/20 ,  G03F7/039

CPC分类号： G03F7/027 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041

摘要： A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), wherein R1, ring X1, R3, R4, m, and n are defined in the specification.

摘要翻译： 抗蚀剂组合物含有（A）具有由式（I）表示的结构单元，（B）酸产生剂和（D）由式（II）表示的化合物的树脂，其中R1，X1，R3，R4 ，m和n在说明书中定义。

公开(公告)号：US08753796B2

公开(公告)日：2014-06-17

申请号：US13443155

申请日：2012-04-10

申请人： Koji Ichikawa ,  Hiromu Sakamoto ,  Yuichi Mukai

发明人： Koji Ichikawa ,  Hiromu Sakamoto ,  Yuichi Mukai

IPC分类号： G03F7/039 ,  G03F7/38

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

摘要翻译： 本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ Z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示 有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。