发明授权
US08889333B2 Salt, photoresist composition, and method for producing photoresist pattern
有权
盐,光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
- 专利标题: Salt, photoresist composition, and method for producing photoresist pattern
- 专利标题(中): 盐,光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
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申请号: US13443166申请日: 2012-04-10
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公开(公告)号: US08889333B2公开(公告)日: 2014-11-18
- 发明人: Koji Ichikawa , Isao Yoshida , Yuko Yamashita
- 申请人: Koji Ichikawa , Isao Yoshida , Yuko Yamashita
- 申请人地址: JP Tokyo
- 专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2011-088879 20110413; JP2011-109086 20110516; JP2011-214045 20110929
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; C07C303/32 ; C07C309/06 ; C07C309/07 ; C07C309/12 ; C07C309/19 ; G03F7/039 ; C07C381/12 ; C07C309/17 ; C07C25/18
摘要:
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 respectively represent a C3-C36 hydrocarbon ring, R1 and R2 respectively represent a hydrogen atom or C1-C6 alkyl group, R3 represents C1-C6 alkyl group, t represents an integer of 0 to 2 and Z+ represents an organic counter ion.
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