发明申请
- 专利标题： PHOTORESIST COMPOSITION
- 专利标题（中）： 光电组合物
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申请号： US12888243申请日： 2010-09-22
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公开(公告)号： US20110076617A1公开(公告)日： 2011-03-31
- 发明人: Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
- 申请人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JPJP2009-220388 20090925; JPJP2010-012866 20100125
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03C1/73
摘要：
The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
公开/授权文献
- US08530135B2 Photoresist composition 公开/授权日：2013-09-10
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