公开(公告)号：US08982358B2

公开(公告)日：2015-03-17

申请号：US13740464

申请日：2013-01-14

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Gregory Brady ,  Kevin Peterlinz

IPC: G01B11/02 ,  G01B9/02 ,  G01B11/24

CPC classification number: G01B9/02 ,  G01B11/24 ,  G01B2210/56

Abstract: Systems and methods are presented to enhance and isolate residual signals indicative of the speckle field based on measurements taken by optically based metrology systems. Structural irregularities such as roughness and topographical errors give rise to light scattered outside of the specularly reflected component of the diffracted light. The scattered light interferes constructively or destructively with the specular component in a high numerical aperture illumination and detection system to form a speckle field. Various methods of determining residual signals indicative of the speckle field are presented. Furthermore, various methods of determining structural irregularities based on analysis of the residual signals are presented. In various embodiments, illumination with a high degree of spatial coherence is provided over any of a wide range of angles of incidence, multiple polarization channels, and multiple wavelength channels. In addition, diffracted light is collected over a wide range of angles of detection.

Abstract translation: 提出了系统和方法，以基于光学测量系统所采取的测量来增强和分离指示散斑场的残留信号。 诸如粗糙度和形貌错误的结构不规则导致散射在衍射光的镜面反射分量之外的光。 散射光在高数值孔径照明和检测系统中与镜面分量建设性或破坏性地干涉以形成斑点。 提出了确定表示斑点的残余信号的各种方法。 此外，提出了基于剩余信号分析确定结构不规则性的各种方法。 在各种实施例中，在宽范围的入射角，多个极化通道和多个波长通道中的任何一个上提供具有高度空间相干性的照明。 另外，在宽范围的检测角度收集衍射光。

公开(公告)号：US20130182263A1

公开(公告)日：2013-07-18

申请号：US13740464

申请日：2013-01-14

Applicant: KLA-TENCOR CORPORATION

Inventor： Andrei V. Shchegrov ,  Gregory Brady ,  Kevin Peterlinz

IPC: G01B9/02

CPC classification number: G01B9/02 ,  G01B11/24 ,  G01B2210/56

Abstract: Systems and methods are presented to enhance and isolate residual signals indicative of the speckle field based on measurements taken by optically based metrology systems. Structural irregularities such as roughness and topographical errors give rise to light scattered outside of the specularly reflected component of the diffracted light. The scattered light interferes constructively or destructively with the specular component in a high numerical aperture illumination and detection system to form a speckle field. Various methods of determining residual signals indicative of the speckle field are presented. Furthermore, various methods of determining structural irregularities based on analysis of the residual signals are presented. In various embodiments, illumination with a high degree of spatial coherence is provided over any of a wide range of angles of incidence, multiple polarization channels, and multiple wavelength channels. In addition, diffracted light is collected over a wide range of angles of detection.

Abstract translation: 提出了系统和方法，以基于光学测量系统所采取的测量来增强和分离指示散斑场的残留信号。 诸如粗糙度和形貌错误的结构不规则导致散射在衍射光的镜面反射分量之外的光。 散射光在高数值孔径照明和检测系统中与镜面分量建设性或破坏性地干涉以形成斑点。 提出了确定表示斑点的残余信号的各种方法。 此外，提出了基于剩余信号分析确定结构不规则性的各种方法。 在各种实施例中，在宽范围的入射角，多个极化通道和多个波长通道中的任何一个上提供具有高度空间相干性的照明。 另外，在宽范围的检测角度收集衍射光。

公开(公告)号：US10969328B2

公开(公告)日：2021-04-06

申请号：US16284950

申请日：2019-02-25

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Lawrence D. Rotter ,  David Y. Wang ,  Andrei Veldman ,  Kevin Peterlinz ,  Gregory Brady ,  Derrick A. Shaughnessy

IPC: G01N21/55 ,  G01N21/21 ,  G03F7/20 ,  G01B11/06 ,  G01N21/47

Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.

公开(公告)号：US09816810B2

公开(公告)日：2017-11-14

申请号：US15268217

申请日：2016-09-16

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Shankar Krishnan ,  Kevin Peterlinz ,  Thaddeus Gerard Dziura ,  Noam Sapiens ,  Stilian Ivanov Pandev

IPC: G01B11/27 ,  G03F7/20 ,  H01L21/66 ,  G03F7/00

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G03F7/0002 ,  G03F7/70141 ,  G03F7/70625 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.

公开(公告)号：US09574992B1

公开(公告)日：2017-02-21

申请号：US15214814

申请日：2016-07-20

Applicant: KLA-Tencor Corporation

Inventor： Esen Salcin ,  Fuming Wang ,  Kevin Peterlinz ,  Hidong Kwak ,  Damon Kvamme ,  Uri Greenberg ,  Daniel R. Hennigan

IPC: G01J4/00 ,  G01N21/21 ,  G01J4/04

CPC classification number: G01N21/211 ,  G01B11/065 ,  G01B2210/56 ,  G01N21/9501

Abstract: Methods and systems for performing single wavelength ellipsometry (SWE) measurements with reduced measurement spot size are presented herein. In one aspect, a pupil stop is located at or near a pupil plane in the collection optical path to reduce sensitivity to target edge diffraction effects. In another aspect, a field stop is located at or near an image plane conjugate to the wafer plane in the collection optical path to reduce sensitivity to undesired optical-structural interactions. In another aspect, a linear polarizer acting on the input beam of the SWE system includes a thin, nanoparticle based polarizer element. The nanoparticle based polarizer element improves illumination beam quality and reduces astigmatism on the wafer plane. The pupil and field stops filter out unwanted light rays before reaching the detector. As a result, measurement spot size is reduced and tool-to-tool matching performance for small measurement targets is greatly enhanced.

Abstract translation: 本文介绍了用于执行单波长椭偏仪（SWE）测量的方法和系统，其测量点尺寸减小。 在一个方面，光瞳停止位于收集光路中的光瞳平面处或附近，以降低对目标边缘衍射效应的灵敏度。 在另一方面，场停止位于收集光路中与晶片平面共轭的图像平面附近或附近，以降低对不期望的光学 - 结构相互作用的灵敏度。 在另一方面，作用在SWE系统的输入光束上的线性偏振器包括薄的基于纳米颗粒的偏振器元件。 基于纳米颗粒的偏振器元件改善照明光束质量并减少晶片平面上的像散。 瞳孔和场域在到达检测器之前将不需要的光线过滤掉。 结果，测量点尺寸减小，并且大大提高了小测量目标的工具对工具匹配性能。

公开(公告)号：US20170003123A1

公开(公告)日：2017-01-05

申请号：US15268217

申请日：2016-09-16

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Shankar Krishnan ,  Kevin Peterlinz ,  Thaddeus Gerard Dziura ,  Noam Sapiens ,  Stilian Ivanov Pandev

IPC: G01B11/27 ,  G03F7/20 ,  H01L21/66

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G03F7/0002 ,  G03F7/70141 ,  G03F7/70625 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.

Abstract translation: 提出了评估多个图案化工艺性能的方法和系统。 测量图案化结构，并确定表征由多重图案化工艺引起的几何误差的一个或多个参数值。 在一些示例中，测量单个图案化靶和多个图案化靶，所收集的数据拟合到组合测量模型，并且基于拟合来确定指示由多次图案化工艺引起的几何误差的结构参数的值 。 在一些其它示例中，收集并分析具有不同于零的衍射级的光，以分析其结果参数的值，该结构参数指示由多重图案化工艺引起的几何误差。 在一些实施例中，收集不同于零的单个衍射级。 在一些示例中，度量目标被设计为增强以不同于零的顺序衍射的光。

公开(公告)号：US09490182B2

公开(公告)日：2016-11-08

申请号：US14574021

申请日：2014-12-17

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Shankar Krishnan ,  Kevin Peterlinz ,  Thaddeus Gerard Dziura ,  Noam Sapiens ,  Stilian Ivanov Pandev

IPC: G01B11/27 ,  H01L21/66 ,  G03F7/20 ,  G03F7/00

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G03F7/0002 ,  G03F7/70141 ,  G03F7/70625 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.

Abstract translation: 提出了评估多个图案化工艺性能的方法和系统。 测量图案化结构，并确定表征由多重图案化工艺引起的几何误差的一个或多个参数值。 在一些示例中，测量单个图案化靶和多个图案化靶，所收集的数据拟合到组合测量模型，并且基于拟合来确定指示由多次图案化工艺引起的几何误差的结构参数的值 。 在一些其它示例中，收集并分析具有不同于零的衍射级的光，以分析其结果参数的值，该结构参数指示由多重图案化工艺引起的几何误差。 在一些实施例中，收集不同于零的单个衍射级。 在一些示例中，度量目标被设计为增强以不同于零的顺序衍射的光。

公开(公告)号：US20150176985A1

公开(公告)日：2015-06-25

申请号：US14574021

申请日：2014-12-17

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Shankar Krishnan ,  Kevin Peterlinz ,  Thaddeus Gerard Dziura ,  Noam Sapiens ,  Stilian Ivanov Pandev

IPC: G01B11/27

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G03F7/0002 ,  G03F7/70141 ,  G03F7/70625 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.

Abstract translation: 提出了评估多个图案化工艺性能的方法和系统。 测量图案化结构，并确定表征由多重图案化工艺引起的几何误差的一个或多个参数值。 在一些示例中，测量单个图案化靶和多个图案化靶，所收集的数据拟合到组合测量模型，并且基于拟合来确定指示由多次图案化工艺引起的几何误差的结构参数的值 。 在一些其它示例中，收集并分析具有不同于零的衍射级的光，以分析其结果参数的值，该结构参数指示由多重图案化工艺引起的几何误差。 在一些实施例中，收集不同于零的单个衍射级。 在一些示例中，度量目标被设计为增强以不同于零的顺序衍射的光。

公开(公告)号：US20150051877A1

公开(公告)日：2015-02-19

申请号：US14461416

申请日：2014-08-17

Applicant: KLA-Tencor Corporation

Inventor： Michael S. Bakeman ,  Andrei V. Shchegrov ,  Kevin Peterlinz ,  Thaddeus Gerard Dziura

IPC: G06F17/50 ,  G01N23/223 ,  G01N23/201

CPC classification number: G01N23/223 ,  G01N23/201 ,  G01N2223/6116

Abstract: Methods and systems for performing simultaneous X-ray Fluorescence (XRF) and small angle x-ray scattering (SAXS) measurements over a desired inspection area of a specimen are presented. SAXS measurements combined with XRF measurements enables a high throughput metrology tool with increased measurement capabilities. The high energy nature of x-ray radiation penetrates optically opaque thin films, buried structures, high aspect ratio structures, and devices including many thin film layers. SAXS measurements of a particular location of a planar specimen are performed at a number of different out of plane orientations. This increases measurement sensitivity, reduces correlations among parameters, and improves measurement accuracy. In addition, specimen parameter values are resolved with greater accuracy by fitting data sets derived from both SAXS and XRF measurements based on models that share at least one material parameter. The fitting can be performed sequentially or in parallel.

Abstract translation: 提出了在样本的期望检查区域上执行同时X射线荧光（XRF）和小角度X射线散射（SAXS）测量的方法和系统。 SAXS测量结合XRF测量，可实现高吞吐量测量工具，增加测量能力。 x射线辐射的高能量性质穿透光学不透明的薄膜，掩埋结构，高纵横比结构以及包括许多薄膜层的器件。 平面样本的特定位置的SAXS测量在多个不同的平面外取向进行。 这增加了测量灵敏度，降低了参数之间的相关性，并提高了测量精度。 此外，通过根据共享至少一个材料参数的模型拟合从SAXS和XRF测量得到的数据集，可以更准确地解决样本参数值。 可以顺序地或并行地执行装配。