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    Neutral Atom Imaging System
    11.
    发明申请
    Neutral Atom Imaging System 审中-公开

    公开(公告)号：US20190378684A1

    公开(公告)日：2019-12-12

    申请号：US16141150

    申请日：2018-09-25

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Eugene Shifrin ,  Gildardo Delgado ,  Rudy F. Garcia

    IPC: H01J37/26 ,  H01J37/08 ,  H01J37/317 ,  H01J37/28 ,  H01J37/304

    Abstract: An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.

    Continuous-wave laser-sustained plasma illumination source
    12.
    发明授权
    Continuous-wave laser-sustained plasma illumination source 有权

    公开(公告)号：US10217625B2

    公开(公告)日：2019-02-26

    申请号：US15064294

    申请日：2016-03-08

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin ,  Matthew Panzer

    IPC: H01J65/04 ,  H05G2/00

    Abstract: An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.

    System and Method for Enhanced Defect Detection with a Digital Matched Filter
    14.
    发明申请
    System and Method for Enhanced Defect Detection with a Digital Matched Filter 有权
    用数字匹配滤波器增强缺陷检测的系统和方法

    公开(公告)号：US20160140412A1

    公开(公告)日：2016-05-19

    申请号：US14937409

    申请日：2015-11-10

    Applicant: KLA-Tencor Corporation

    Inventor： Pavel Kolchin ,  Eugene Shifrin

    IPC: G06K9/40 ,  G06K9/62 ,  G06T7/00

    CPC classification number: G06K9/40 ,  G06K9/209 ,  G06K9/6202 ,  G06T5/002 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/20024 ,  G06T2207/30024 ,  G06T2207/30148

    Abstract: Enhanced defect detection of a sample includes acquiring two or more inspection images from a sample from two or more locations of the sample for a first optical mode. The defection detection also generating an aggregated defect profile based on the two or more inspection images from the two or more locations for the first optical mode for a selected defect type and calculating one or more noise correlation characteristics of the two or more inspection images acquired from the two or more locations for the first optical mode. Defect detection further includes the generation of a matched filter for the first optical mode based on the generated aggregated defect profile and the calculated one or more noise correlation characteristics.

    Abstract translation: 样本的增强缺陷检测包括从用于第一光学模式的样本的两个或更多个位置的样本获取两个或更多个检查图像。 所述缺陷检测还基于来自所选择的缺陷类型的第一光学模式的两个或更多个位置的两个或更多个检查图像生成聚合缺陷轮廓，并计算从两个或更多个检测图像获取的两个或更多个检查图像的一个或多个噪声相关特性 用于第一光学模式的两个或多个位置。 缺陷检测还包括基于生成的聚合缺陷轮廓和所计算的一个或多个噪声相关特性来生成用于第一光学模式的匹配滤波器。

    Wafer Inspection Using Free-Form Care Areas
    15.
    发明申请
    Wafer Inspection Using Free-Form Care Areas 有权
    使用自由形式护理区域的晶圆检查

    公开(公告)号：US20140376802A1

    公开(公告)日：2014-12-25

    申请号：US14168011

    申请日：2014-01-30

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Kenong Wu ,  Tao Luo ,  Lisheng Gao ,  Eugene Shifrin ,  Aravindh Balaji

    IPC: G06T7/00

    CPC classification number: G06T7/0004 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

    Abstract: Methods and systems for detecting defects on a wafer are provided. One method includes determining characteristics of care areas for a wafer based on wafer patterns. Determining the characteristics includes determining locations of care areas, identifying at least one pattern of interest (POI) in the wafer patterns for each of the care areas, allowing any of the care areas to have a free-form shape, allowing the care areas to be larger than frame images and selecting two or more POIs for at least one of the care areas. The method also includes searching for POIs in images generated for the wafer using an inspection system. In addition, the method includes detecting defects on the wafer by determining positions of the care areas in the images and applying one or more defect detection methods to the images based on the positions of the care areas in the images.

    Abstract translation: 提供了用于检测晶片上的缺陷的方法和系统。 一种方法包括基于晶片图案确定晶片护理区域的特征。 确定特征包括确定护理区域的位置，为每个护理区域确定晶片图案中的至少一种感兴趣模式（POI），允许任何护理区域具有自由形状，允许护理区域 大于框架图像并且为至少一个护理区域选择两个或更多个POI。 该方法还包括使用检查系统搜索为晶片生成的图像中的POI。 此外，该方法包括通过确定图像中的护理区域的位置并基于图像中的护理区域的位置将一个或多个缺陷检测方法应用于图像来检测晶片上的缺陷。

    System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination
    18.
    发明授权
    System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination 有权

    公开(公告)号：US10714327B2

    公开(公告)日：2020-07-14

    申请号：US16283379

    申请日：2019-02-22

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin ,  Matthew Derstine

    IPC: H01J61/02 ,  G02B27/14 ,  H01J65/04 ,  G01N21/55 ,  G01N23/04

    Abstract: A system for pumping laser sustained plasma and enhancing one or more selected wavelengths of output illumination generated by the laser sustained plasma is disclosed. In embodiments, the system includes one or more pump modules configured to generate pump illumination for the laser sustained plasma and one or more enhancing illumination sources configured to generate enhancing illumination at one or more selected wavelengths. The pump illumination may be directed along one or more pump illumination paths that are non-collinear to an output illumination path of the output illumination. The enhancing illumination may be directed along an illumination path that is collinear to the output illumination path of the output illumination so that the enhancing illumination is combined with the output illumination, thereby enhancing the output illumination at the one or more selected wavelengths.

    Neutral atom imaging system
    19.
    发明授权
    Neutral atom imaging system 有权

    公开(公告)号：US10714307B2

    公开(公告)日：2020-07-14

    申请号：US16141150

    申请日：2018-09-25

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Eugene Shifrin ,  Gildardo Delgado ,  Rudy F. Garcia

    IPC: H01J37/26 ,  H01J37/08 ,  H01J37/304 ,  H01J37/28 ,  H01J37/317 ,  H01J37/00

    Abstract: An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.

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