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公开(公告)号：US20160216197A1
公开(公告)日：2016-07-28
申请号：US15092329
申请日：2016-04-06
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
CPC classification number: G01N21/01 , G01B11/272 , G01N21/4788 , G01N21/9501 , G01N21/956 , G01N2201/068 , G02B27/4255 , G02B27/4272 , G03F7/70633 , G03F7/70683
Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
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公开(公告)号：US20130229661A1
公开(公告)日：2013-09-05
申请号：US13865104
申请日：2013-04-17
Applicant: KLA-TENCOR CORPORATION
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01N21/47
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
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公开(公告)号：US11137692B2
公开(公告)日：2021-10-05
申请号：US16313972
申请日：2018-11-29
Applicant: KLA-TENCOR CORPORATION
Inventor： Yoel Feler , Mark Ghinovker , Alexander Svizher , Vladimir Levinski , Inna Tarshish-Shapir
Abstract: Metrology targets, design methods and measurement methods thereof are provided with periodic structure(s) which are oblique with respect to orthogonal production axes X and Y of the lithography tool—enabling more accurate overlay measurements of devices having diagonal (oblique, tilted) elements such as DRAM devices. One or more oblique periodic structure(s) may be used to provide one- or two-dimensional signals, with respect to one or more layers, possibly providing overlay measurements for multiple steps applied to one layer. The oblique periodic structure(s) may be used to modify current metrology target designs (e.g., imaging targets and/or scatterometry targets) or to design new targets, and measurement algorithms may be adjusted respectively to derive signals from the oblique periodic structure(s) and/or to provide pre-processed images thereof. The disclosed targets are process compatible and reflect more accurately the device overlays with respect to various process steps.
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公开(公告)号：US20190074227A1
公开(公告)日：2019-03-07
申请号：US15774025
申请日：2018-04-05
Applicant: KLA-TENCOR CORPORATION
Inventor： Einat Peled , Eran Amit , Alexander Svizher , Yuval Lamhot , Noga Sella , Wei-Te Cheng
Abstract: Methods applicable in metrology modules and tools are provided, which enable adjusting metrology measurement parameters with respect to process variation, without re-initiating metrology recipe setup. Methods comprise, during an initial metrology recipe setup, recording a metrology process window and deriving baseline information therefrom, and during operation, quantifying the process variation with respect to the baseline information, and adjusting the metrology measurement parameters within the metrology process window with respect to the quantified process variation. The quick adjustment of metrology parameters avoids metrology-related process delays and releases prior art bottlenecks related thereto. Models of effects of various process variation factors on the metrology measurements may be used to enhance the derivation of required metrology tuning and enable their application with minimal delays to the production process.
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公开(公告)号：US09851300B1
公开(公告)日：2017-12-26
申请号：US14678411
申请日：2015-04-03
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Ofer Zaharan , Amnon Manassen , Nadav Carmel , Victoria Naipak , Alexander Svizher , Tzahi Grunzweig , Daniel Kandel
IPC: G01N21/55
CPC classification number: G03F7/70633
Abstract: Methods and metrology modules and tools are provided, which minimize an estimated overlay variation measure at misalignment vector values obtained from a derived functional form of an overlay linear response to non-periodic effects. Provided methods further quantifying target noise due to the non-periodic effects using multiple repeated overlay measurements of the target cells, calculating an ensemble of overlay measurements between the cells over the multiple measurement repeats and expressing the target noise as a statistical derivative of the calculated overlay measurements. Sub-ensembles may be selected to further characterize the target noise. Various outputs include optimized scanning patterns, target noise metrics and recipe and target optimization.
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Patent Agency Ranking
16.发明申请SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY 有权SCATTERMETRY OVERLAY METROLOGY中的对称目标设计公开(公告)号：US20150204664A1
公开(公告)日：2015-07-23
申请号：US14161398
申请日：2014-01-22
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Irina Paykin , Alexander Svizher , Meir Aloni , Guy BEN DOV , Hadar Shalmoni , Vladimir Levinski
IPC: G01B11/27
CPC classification number: G01N21/01 , G01B11/272 , G01N21/4788 , G01N21/9501 , G01N21/956 , G01N2201/068 , G02B27/4255 , G02B27/4272 , G03F7/70633 , G03F7/70683
Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
Abstract translation: 提供了计量方法，系统和目标，实现了并行范例。 使用具有周期性结构的相邻小区来提取覆盖误差，例如通过引入可控相移或图像偏移，这使得能够进行覆盖的算法计算。 周期性结构被设计为展现旋转对称性以支持计算并减少误差。
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公开(公告)号：US20150036142A1
公开(公告)日：2015-02-05
申请号：US14516540
申请日：2014-10-16
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01N21/47 , G01N21/956 , G01N21/95 , G01B11/02
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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公开(公告)号：US20140240951A1
公开(公告)日：2014-08-28
申请号：US13774025
申请日：2013-02-22
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
CPC classification number: G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。
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公开(公告)号：US10527952B2
公开(公告)日：2020-01-07
申请号：US15576602
申请日：2017-10-24
Applicant: KLA-Tencor Corporation
Inventor： Tzahi Grunzweig , Jordan Pio , Alexander Svizher
IPC: G03F7/20 , H01L23/544 , H01L21/66
Abstract: Scatterometry overlay targets and measurement methods are provided, which are configured to detect and eliminate process-related errors and illumination-related errors from overlay measurements of the targets. Targets comprise at least three cells associated with a measurement direction, wherein at least two of the cells comprise periodic structures at different target layers, having a same pitch and opposite offsets between the two cells, and at least an additional cell comprises a periodic structure with the same pitch at only one of the target layers. The additional cell(s) are used to detect irregularities in the respective periodic structure(s), enable estimation of process quality, provide reference images, enhance metrology simulations and provide mitigation of errors in critical process steps. Measurement methods incorporate scatterometry measurements ion the additional cell(s) for these purposes.
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公开(公告)号：US09581430B2
公开(公告)日：2017-02-28
申请号：US14057827
申请日：2013-10-18
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Ohad Bachar , Daria Negri , Boris Golovanevsky , Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
CPC classification number: G01B9/0209 , G01B9/02027 , G01B9/02043 , G01B9/02087 , G01N21/45
Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。
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