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    LASER APPARATUS
    11.
    发明申请
    LASER APPARATUS 审中-公开
    激光装置

    公开(公告)号：US20130107899A1

    公开(公告)日：2013-05-02

    申请号：US13657964

    申请日：2012-10-23

    Applicant: Gigaphoton Inc.

    Inventor： Takashi MATSUNAGA ,  Masaya Yoshino ,  Osamu Wakabayashi

    IPC: H01S3/10

    CPC classification number: H01S3/0818 ,  H01S3/0014 ,  H01S3/005 ,  H01S3/076 ,  H01S3/08009 ,  H01S3/225

    Abstract: A laser apparatus may include a laser oscillator capable of tuning a spectral bandwidth of a laser beam to be outputted therefrom, a spectrum detecting unit that detects a spectrum of the laser beam outputted from the laser oscillator and an attenuation unit capable of regulating light intensity of the laser beam that enters the spectrum detecting unit. The attenuation unit may include a variable attenuator whose transmittance varies depending on an incident position of the laser beam and a movement mechanism that moves the variable attenuator so that the incident position of the laser beam is changed.

    Abstract translation: 激光装置可以包括能够调谐要从其输出的激光束的光谱带宽的激光振荡器，检测从激光振荡器输出的激光束的光谱的光谱检测单元和能够调节激光振荡器的光强度的衰减单元 进入频谱检测单元的激光束。 衰减单元可以包括可变衰减器，其可变衰减器根据激光束的入射位置而变化，移动机构使可变衰减器移动，从而改变激光束的入射位置。

    LASER APPARATUS
    12.
    发明申请
    LASER APPARATUS 有权
    激光装置

    公开(公告)号：US20160248219A1

    公开(公告)日：2016-08-25

    申请号：US15145251

    申请日：2016-05-03

    Applicant: GIGAPHOTON INC.

    Inventor： Osamu WAKABAYASHI ,  Takashi MATSUNAGA

    IPC: H01S3/13 ,  H01S3/225 ,  H01S3/139

    CPC classification number: H01S3/1305 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/0092 ,  H01S3/08009 ,  H01S3/10092 ,  H01S3/139 ,  H01S3/1625 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2375

    Abstract: A laser apparatus may include a first laser resonator configured to generate a laser beam, a first optical element configured to adjust a divergence in a first direction of the laser beam, a second optical element configured to adjust a divergence in a second direction of the laser beam, a measuring unit configured to measure the divergence in the first direction and the divergence in the second direction of the laser beam, and a controller configured to control one or both of the first optical element and the second optical element based on the divergence in the first direction and the divergence in the second direction of the laser beam both measured by the measuring unit.

    Abstract translation: 激光装置可以包括被配置为产生激光束的第一激光谐振器，被配置为调节激光束的第一方向上的发散度的第一光学元件，被配置为调节激光器的第二方向上的发散度的第二光学元件 光束，测量单元，其被配置为测量所述激光束的所述第一方向上的发散度和所述第二方向上的发散度;以及控制器，被配置为基于所述第一光学元件和所述第二光学元件的发散度来控制所述第一光学元件和所述第二光学元件中的一个或两个 激光束的第二方向上的第一方向和偏离均由测量单元测量。

    LASER SYSTEM
    14.
    发明申请
    LASER SYSTEM 审中-公开
    激光系统

    公开(公告)号：US20170063024A1

    公开(公告)日：2017-03-02

    申请号：US15350277

    申请日：2016-11-14

    Applicant: Gigaphoton Inc.

    Inventor： Kouji KAKIZAKI ,  Takashi MATSUNAGA ,  Masaki ARAKAWA ,  Osamu WAKABAYASHI

    IPC: H01S3/13 ,  H01L21/02 ,  H01L21/67 ,  H01S3/23 ,  H01S3/139

    CPC classification number: H01S3/09702 ,  B23K26/00 ,  B23K26/0608 ,  H01L21/02686 ,  H01L21/67115 ,  H01S3/0057 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/1394 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2383

    Abstract: The laser system may include a first laser apparatus configured to emit a first pulse laser beam, a second laser apparatus configured to emit a second pulse laser beam, a timing detector, and a controller. The timing detector may be configured to detect a first passage timing at which the first pulse laser beam passes a first position and a second passage timing at which the second pulse laser beam passes a second position. The controller may be configured to control a first trigger timing for the first laser apparatus to emit the first pulse laser beam and a second trigger timing for the second laser apparatus to emit the second pulse laser beam based on the first passage timing and the second passage timing.

    Abstract translation: 激光系统可以包括被配置为发射第一脉冲激光束的第一激光装置，被配置为发射第二脉冲激光束的第二激光装置，定时检测器和控制器。 定时检测器可以被配置为检测第一脉冲激光束通过第一位置的第一通过定时和第二脉冲激光束通过第二位置的第二通过定时。 控制器可以被配置为控制第一激光装置发射第一脉冲激光束的第一触发时序和用于第二激光装置基于第一通过定时和第二通道发射第二脉冲激光束的第二触发时序 定时。

    TWO-BEAM INTERFERENCE APPARATUS AND TWO-BEAM INTERFERENCE EXPOSURE SYSTEM
    16.
    发明申请
    TWO-BEAM INTERFERENCE APPARATUS AND TWO-BEAM INTERFERENCE EXPOSURE SYSTEM 有权
    两束干扰装置和两束干扰曝光系统

    公开(公告)号：US20130135601A1

    公开(公告)日：2013-05-30

    申请号：US13681744

    申请日：2012-11-20

    Applicant: Gigaphoton Inc.

    Inventor： Shinji OKAZAKI ,  Hakaru MIZOGUCHI ,  Junichi FUJIMOTO ,  Takashi MATSUNAGA ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

    IPC: G03B27/52

    CPC classification number: G03B27/522 ,  G03F7/70408

    Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

    Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台，分束器，用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光， 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光，从与第一方向垂直但与第二方向不同的第三方向照射第三激光，从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。

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