公开(公告)号：US09105445B2

公开(公告)日：2015-08-11

申请号：US14220719

申请日：2014-03-20

Applicant: EBARA CORPORATION

Inventor： Ryo Tajima ,  Kenichi Suematsu ,  Shoji Yoshikawa

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/244 ,  H01J37/285

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/285

Abstract: An inspection system includes a primary optical system configured to irradiate a charged particle or an electromagnetic wave as a beam, a movable unit configured to hold an inspection target and move the target through a position where the beam is irradiated, and a TDI sensor configured to integrate an amount of secondary charged particles in a predetermined direction to sequentially transfer the integrated amount. The secondary charged particles are obtained by irradiating the beam onto the target while moving the movable unit in the predetermined direction. The inspection system further includes a prevention module configured to prevent an arrival of the beam at the target side or an arrival of the secondary charged particles at the TDI sensor during a time period from one transfer to the following transfer after the elapse of a predetermined length of time from the one transfer and until the following transfer.

Abstract translation: 检查系统包括被配置为照射带电粒子或作为光束的电磁波的主光学系统，被配置为保持检查目标并将目标移动通过射束的位置的移动单元，以及被配置为 在预定方向上积分一定量的二次带电粒子以顺序地转移积分量。 通过在沿着预定方向移动可移动单元的同时将光束照射到目标物上而获得二次带电粒子。 所述检查系统还包括防止模块，所述防止模块被配置为在经过预定长度之后的一次转移到后续转移的时间段期间防止所述束到达所述目标侧或所述二次带电粒子到达所述TDI传感器 的时间从一次转移到下一次转移。

公开(公告)号：US20150122993A1

公开(公告)日：2015-05-07

申请号：US14596447

申请日：2015-01-14

Applicant: EBARA CORPORATION

Inventor： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC: H01J37/20 ,  G01N23/22

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

Abstract: A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

Abstract translation: 用一次电子照射衬底，由检测器检测由衬底产生的二次电子。 将参考管芯放置在平台上以获得包括参考管芯的特征坐标的模式匹配模板图像。 使用模板图像，使用包含基准管芯的行或列中的任意管芯进行图案匹配，以获得任意管芯的特征坐标。 基于任意模具的特征坐标和参考模具的特征坐标，在包括基准模具的行或列的方向与基板的移动方向之间计算出未对准的角度。 旋转台阶以校正未对准的角度，以使包括基准模具的行或列的方向与衬底的移动方向之一相一致。