公开(公告)号：US20160319158A1

公开(公告)日：2016-11-03

申请号：US15103748

申请日：2014-12-10

Applicant: ARKEMA FRANCE ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

Inventor： Guillaume FLEURY ,  Christophe NAVARRO ,  Georges HADZIIOANNOU ,  Celia NICOLET ,  Xavier CHEVALIER ,  Chrystilla REBOUL ,  Veronica CASTILLO ,  Gilles PECASTAINGS

IPC: C09D187/00 ,  B05D3/06 ,  H01L21/027 ,  B01J31/06

CPC classification number: C09D187/005 ,  B01J31/06 ,  B05D3/06 ,  B81C1/00031 ,  B81C2201/0149 ,  C08F293/005 ,  C08F2438/02 ,  C08J9/26 ,  C09D153/00 ,  G03F7/0002 ,  H01L21/0271

Abstract: The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.

Abstract translation: 本发明涉及在基材上制备自组装嵌段共聚物的膜的方法，所述方法包括通过含有嵌段共聚物和随机的共混物的溶液同时沉积嵌段共聚物和无规共聚物 共聚物，其不同的化学性质并且不混溶，然后进行退火处理，允许促进嵌段共聚物的自组装固有的相分离。

公开(公告)号：US20160276053A1

公开(公告)日：2016-09-22

申请号：US15033479

申请日：2014-10-29

Applicant: ARKEMA FRANCE ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX

Inventor： Christophe NAVARRO ,  Wiljan SMAAL ,  Muhammad MUMTAZ ,  Eric CLOUTET ,  Cyril BROCHON ,  Georges HADZIIOANNOU

IPC: H01B1/12 ,  C08L81/02 ,  H01B1/24

CPC classification number: H01B1/127 ,  C08F2/38 ,  C08F12/20 ,  C08F12/30 ,  C08F291/14 ,  C08F2438/03 ,  C08G61/126 ,  C08G2261/1424 ,  C08G2261/3223 ,  C08G2261/51 ,  C08G2261/794 ,  C08L65/00 ,  C08L81/02 ,  C09D133/14 ,  C09K11/06 ,  C09K2211/1483 ,  H01B1/24 ,  H01L51/0003 ,  H01L51/0037 ,  H01L51/0048 ,  H01L51/102 ,  H01L51/444 ,  H01L51/5215 ,  C08L25/18 ,  C09D165/00 ,  C08L33/14 ,  C08K3/041

Abstract: The invention relates to a stable composition of poly(3,4-ethylenedioxythiophene) anionic stabilizers with a limited degree of acidity.

Abstract translation: 本发明涉及具有有限酸度的聚（3,4-亚乙基二氧噻吩）阴离子稳定剂的稳定组合物。

公开(公告)号：US20160168305A1

公开(公告)日：2016-06-16

申请号：US14971661

申请日：2015-12-16

Applicant: Arkema France

Inventor： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC: C08F297/02 ,  G03F7/004

CPC classification number: C08F297/026 ,  B81C2201/0149 ,  B82Y30/00 ,  C09D153/00 ,  G03F7/0002 ,  G03F7/004

Abstract: A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium and comprising the following steps: synthesizing a first nonpolar block in the form of a macro-initiator, preparing a solution of said macro-initiator previously synthesized by mixing it with an alkali metal alcoholate in an aprotic nonpolar solvent, preparing a solution of a polar monomer in an aprotic nonpolar solvent, injecting the two solutions previously prepared of macro-initiator and of polar monomer into a micro-mixer, connected to a polymerization reactor, at a constant flow ratio, recovering the copolymer obtained.

Abstract translation: 用于控制含有至少两个嵌段的嵌段共聚物的合成方法，其中至少一个非极性嵌段和至少一个极性嵌段，所述方法使得可以特别地控制嵌段之间的比例和每个嵌段的分子量 所述共聚物是在直接自组装（DSA）的纳米光刻方法中用作掩模的嵌段共聚物，所述对照通过非质子非极性介质中的半连续阴离子聚合实现，并包括以下步骤：合成 以大分子引发剂的形式存在的第一非极性嵌段，通过将非离子非极性溶剂中的碱金属醇化物混合而制备前述合成的所述大分子引发剂的溶液，在非质子非极性溶剂中制备极性单体的溶液， 将预先制备的大分子引发剂和极性单体的两种溶液注入与聚合反应器连接的微型混合器中， t流量比，回收得到的共聚物。

公开(公告)号：US20150331313A1

公开(公告)日：2015-11-19

申请号：US14654277

申请日：2013-12-16

Applicant: ARKEMA FRANCE ,  COMMISSARIAT A L' ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Christophe NAVARRO ,  Maxime ARGOUD ,  Xavier CHEVALIER ,  Raluca TIRON ,  Ahmed GHARBI

IPC: G03F1/76 ,  G03F7/32 ,  G03F1/00

CPC classification number: G03F1/76 ,  B82Y30/00 ,  C08L53/00 ,  G03F1/00 ,  G03F7/0002 ,  G03F7/325 ,  H01L21/0274

Abstract: The invention concerns a manufacturing method for nanolithography masks from a PS-b-PMMA block copolymer film deposited on a surface to be etched, said copolymer film comprising PMMA nanodomains orientated perpendicularly to the surface to be etched, said method being characterized in that it comprises the following steps: partially irradiating said copolymer film to form a first irradiated area and a second non-irradiated area in said copolymer film, then treating said copolymer film in a developer solvent to selectively remove at least said PMMA nanodomains of said first irradiated area of said copolymer film.

Abstract translation: 本发明涉及一种沉积在被蚀刻表面上的PS-b-PMMA嵌段共聚物膜的纳米光刻掩模的制造方法，所述共聚物膜包含垂直于被蚀刻表面定向的PMMA纳米域，所述方法的特征在于它包括 以下步骤：部分地照射所述共聚物膜以在所述共聚物膜中形成第一照射区域和第二未照射区域，然后在显影剂溶剂中处理所述共聚物膜以选择性地除去所述第一照射区域的至少所述PMMA纳米域 所述共聚物膜。

公开(公告)号：US20240162488A1

公开(公告)日：2024-05-16

申请号：US18284563

申请日：2022-04-05

Applicant: Arkema France

Inventor： Gerome GODILLOT ,  Christophe NAVARRO ,  Christine TARISSE

IPC: H01M10/0565 ,  H01M10/0525 ,  H01M50/403 ,  H01M50/411 ,  H01M50/497

CPC classification number: H01M10/0565 ,  H01M10/0525 ,  H01M50/403 ,  H01M50/411 ,  H01M50/497 ,  H01M2300/0082

Abstract: The invention relates to a composition of a solid electrolyte which makes possible the manufacture of a film exhibiting a very good compromise between ion conductivity, electrochemical stability, high-temperature stability and mechanical strength. This film is intended for a separator application, in particular for Li-ion batteries. The invention also relates to a Li-ion battery comprising such a separator.

公开(公告)号：US20200301304A1

公开(公告)日：2020-09-24

申请号：US16084077

申请日：2017-03-03

Applicant: ARKEMA FRANCE ,  UNIVERSITÉ DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

Inventor： Deborah MIRBEL ,  Christophe NAVARRO ,  Cyril BROCHON ,  Éric CLOUTET ,  Georges HADZIIOANNOU

IPC: G03G9/125 ,  G03G9/135

Abstract: Some embodiments relate to an electrophoretic ink including particles that may have a negative charge, dispersed in a non-polar organic solvent. The ink includes a trialkylamine charge-control agent, selected from the following charge-control agents: tributylamine, triisobutylamine, tripentylamine, trihexylamine, tri(2-ethylhexyl)amine, trioctylamine, triisooctylamine, tridodecylamine, triisododecylamine. The particles have a hydrophobic surface and an isoelectric point (IEP) or a point of zero charge (PZC) that is lower than the pKa of the charge-control agent.

公开(公告)号：US20200231731A1

公开(公告)日：2020-07-23

申请号：US15768976

申请日：2016-10-07

Applicant: Arkema France ,  Institut Polytechnique De Bordeaux ,  Centre National De La Recherche Scientifique ,  Universite De Bordeaux

Inventor： Christophe NAVARRO ,  Celia Nicolet ,  Karim Aissou ,  Muhammad Mumtaz ,  Eric Cloutet ,  Cyril Brochon ,  Guillaume Fleury ,  Georges Hadziioannou

IPC: C08F297/02 ,  C08G77/442 ,  C09D153/00 ,  C08G77/60 ,  H01L21/027

Abstract: A process for preparing a nanostructured assembly by annealing a composition comprising a block copolymer on a surface. The block copolymer includes a first block resulting from the polymerization of at least one cyclic monomer having a structure as described herein. The block copolymer also includes a second block that includes a vinyl aromatic monomer.

公开(公告)号：US20170355802A1

公开(公告)日：2017-12-14

申请号：US15527406

申请日：2015-11-24

Applicant: Arkema France

Inventor： Christophe NAVARRO ,  Aline O. COUFFIN ,  Rosangela PIRRI ,  Frederic MALET

IPC: C08F279/06 ,  C08L51/04

CPC classification number: C08F279/06 ,  C08F279/02 ,  C08L51/04 ,  C08L67/00 ,  C08F220/10

Abstract: The present invention relates to a multistage polymer, its composition, its process of preparation, and its use as impact modifier in thermoplastic compositions. More particularly the present invention relates to a process for manufacturing a polymer composition comprising a multistage polymer and its use as impact modifier in thermoplastic compositions.

公开(公告)号：US20170145250A1

公开(公告)日：2017-05-25

申请号：US15317803

申请日：2015-06-01

Applicant: Arkema France

Inventor： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC: C09D153/00 ,  G03F7/00 ,  B05D1/00 ,  C08F297/02

CPC classification number: C09D153/00 ,  B05D1/005 ,  B82Y30/00 ,  B82Y40/00 ,  C08F297/026 ,  C08J5/18 ,  C08J2325/08 ,  C08J2333/08 ,  C08L53/00 ,  G03F7/0002

Abstract: The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

公开(公告)号：US20160333221A1

公开(公告)日：2016-11-17

申请号：US15103740

申请日：2014-12-11

Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  ARKEMA FRANCE

Inventor： Muhammad MUMTAZ ,  Karim AISSOU ,  Cyril BROCHON ,  Eric CLOUTET ,  Guillaume FLEURY ,  Georges HADZIIOANNOU ,  Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC: C09D183/00 ,  G03F7/00 ,  B81C1/00 ,  C08G77/00

CPC classification number: C09D183/00 ,  B81C1/00428 ,  B81C2201/0149 ,  B82Y40/00 ,  C08G77/00 ,  C09D153/00 ,  G03F7/0002

Abstract: The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which is crystallizable or has at least one liquid crystal phase.

Abstract translation: 本发明涉及一种能够通过嵌段共聚物的自组装形成纳米结构的方法，其中至少一个嵌段是可结晶的或具有至少一个液晶相。