公开(公告)号：US20220161363A1

公开(公告)日：2022-05-26

申请号：US17650814

申请日：2022-02-11

Applicant: Applied Materials, Inc.

Inventor： Morgan EVANS ,  Joseph C. OLSON ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: B23K26/34 ,  C04B41/00 ,  G02B5/18 ,  G02B6/34 ,  G03F7/00

Abstract: Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.

公开(公告)号：US20210294014A1

公开(公告)日：2021-09-23

申请号：US17257767

申请日：2019-07-01

Applicant: Applied Materials, Inc.

Inventor： Morgan EVANS ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: F21V8/00 ,  G02B5/18 ,  G02B27/01

Abstract: An apparatus with a grating structure and a method for forming the same are disclosed. The grating structure includes forming a recess in a grating layer. A plurality of channels is formed in the grating layer to define slanted grating structures therein. The recess and the slanted grating structures are formed using a selective etch process.

公开(公告)号：US20210027985A1

公开(公告)日：2021-01-28

申请号：US17037935

申请日：2020-09-30

Applicant: Applied Materials, Inc.

Inventor： Joseph C. OLSON ,  Morgan EVANS ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: H01J37/305 ,  H01J37/12 ,  G02B6/136 ,  H01J37/147 ,  H01J37/20

Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.