公开(公告)号：US20170314120A1

公开(公告)日：2017-11-02

申请号：US15531693

申请日：2014-12-17

Applicant: Applied Materials, Inc.

Inventor： Thomas GEBELE ,  Uwe SCHÜßLER ,  Jose Manuel DIEGUEZ-CAMPO ,  Andreas LOPP

IPC: C23C14/24 ,  C23C14/04 ,  H01L51/00

CPC classification number: C23C14/243 ,  C23C14/042 ,  C23C14/12 ,  C23C14/24 ,  H01L51/001 ,  H01L51/0011

Abstract: A material deposition arrangement for depositing evaporated material on a substrate in a vacuum chamber is described. The material deposition arrangement includes a crucible for providing material to be evaporated; a linear distribution pipe in fluid communication with the crucible; and a plurality of nozzles in the distribution pipe for guiding the evaporated material into the vacuum chamber. Each nozzle may have a nozzle inlet for receiving the evaporated material, a nozzle outlet for releasing the evaporated material to the vacuum chamber, and a nozzle passage between the nozzle inlet and the nozzle outlet. The nozzle passage of at least one of the plurality of nozzles includes a first section having a first length and a first size, and a second having a second length and a second size. The ratio of the second size to the first size is between 2 and 10.

公开(公告)号：US20250146123A1

公开(公告)日：2025-05-08

申请号：US18867897

申请日：2022-07-05

Applicant: Applied Materials, Inc.

Inventor： Julian AULBACH ,  Andreas MÜLLER ,  Andreas LOPP

IPC: C23C14/24

Abstract: A vapor source for depositing an evaporated material on a substrate is provided. The vapor source includes a vapor distribution pipe with a plurality of nozzles, wherein at least one nozzle of the plurality of nozzles includes a nozzle body with a nozzle channel extending along a nozzle axis for releasing evaporated material through a nozzle orifice; and a shielding portion connected to and in thermal contact with the nozzle body, the shielding portion having an aperture for passage of a low-angle part of the evaporated material toward a substrate. At least one lateral opening is provided between the shielding portion and the nozzle body for passage of a high-angle part of the evaporated material, particularly toward a wall of a material collector. Further described are a nozzle for a vapor source and a method of depositing an evaporated material on a substrate.

公开(公告)号：US20220056575A1

公开(公告)日：2022-02-24

申请号：US16998872

申请日：2020-08-20

Applicant: Applied Materials, Inc.

Inventor： Andreas LOPP ,  Stefan BANGERT ,  Wolfgang BUSCHBECK

IPC: C23C14/26 ,  C23C14/54 ,  H01M4/04

Abstract: One or more heating assemblies for a material deposition apparatus for pre-heating a substrate before entering a material deposition area and/or for post-heating the substrate after exiting the material deposition area are described.

公开(公告)号：US20190226090A1

公开(公告)日：2019-07-25

申请号：US15552022

申请日：2016-09-22

Applicant: Andreas LOPP ,  Dieter HAAS ,  Applied Materials, Inc.

Inventor： Andreas LOPP ,  Dieter HAAS

IPC: C23C16/455

Abstract: A nozzle for being connected to a distribution assembly for guiding evaporated material from a material source into a vacuum chamber is described. The nozzle includes: a nozzle inlet for receiving the evaporated material; a nozzle outlet for releasing the evaporated material to the vacuum chamber; and a nozzle passage extending from the nozzle inlet the nozzle outlet in a flow direction, wherein the nozzle passage comprises an outlet section having an aperture angle which continuously increases in the flow direction. Further, a material deposition arrangement having such a nozzle, a vacuum deposition system with the material source arrangement, and a method for depositing evaporated material are provided.

公开(公告)号：US20180187302A1

公开(公告)日：2018-07-05

申请号：US15572585

申请日：2015-09-21

Applicant: Jose Manuel DIEGUEZ-CAMPO ,  Andreas LOPP ,  Uwe SCHÜSSLER ,  Stefan BANGERT ,  Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Andreas LOPP ,  Uwe SCHÜSSLER ,  Stefan BANGERT

IPC: C23C14/54 ,  G01N29/24 ,  G01N29/02 ,  C23C14/24

CPC classification number: C23C14/546 ,  C23C14/24 ,  G01N29/022 ,  G01N29/2443 ,  G01N2291/0256

Abstract: A measurement assembly for measuring a deposition rate of an evaporated material is described. The measurement assembly includes an oscillation crystal for measuring the deposition rate, a measurement outlet for providing evaporated material to the oscillation crystal, and a magnetic closing mechanism configured for opening and closing the measurement outlet by magnetic force.

公开(公告)号：US20160043319A1

公开(公告)日：2016-02-11

申请号：US14782500

申请日：2014-04-21

Applicant: APPLIED MATERIALS, INC.

Inventor： John M. WHITE ,  Robert Jan VISSER ,  Dieter HAAS ,  Tommaso VERCESI ,  Andreas LOPP

IPC: H01L51/00 ,  H01L51/56 ,  G02B26/02

Abstract: The embodiments described herein generally relate to active alignment of a fine metal mask. The fine metal mask is connected with a frame through a plurality of microactuators. The microactuators can act on the fine metal mask to stretch the mask, reposition the mask or both. In this way, the position and size of the fine metal mask can be maintained in relation to the substrate.

Abstract translation: 本文描述的实施例通常涉及精细金属掩模的主动对准。 细金属掩模通过多个微致动器与框架连接。 微致动器可以作用在细金属掩模上以拉伸掩模，重新定位掩模或两者。 以这种方式，可以相对于衬底维持细金属掩模的位置和尺寸。