公开(公告)号：US20240247362A1

公开(公告)日：2024-07-25

申请号：US18558817

申请日：2021-05-21

Applicant: Applied Materials, Inc.

Inventor： Julian AULBACH ,  Andreas MÜLLER ,  Harald WURSTER ,  Andreas LOPP ,  David Friedrich FREIHERR VON LINDENFELS ,  Takashi ANJIKI

IPC: C23C14/24 ,  C23C14/12

CPC classification number: C23C14/243 ,  C23C14/12

Abstract: A nozzle for an evaporated material distributor is described. The nozzle includes a nozzle inlet for receiving evaporated material; a nozzle outlet; and a nozzle passage extending between the nozzle inlet and the nozzle outlet having a first passage portion, a second passage portion and a third passage portion, the second passage portion having an aperture angle which continuously increases in a direction from the nozzle inlet to the nozzle outlet and the third passage portion having an essentially constant aperture angle.

公开(公告)号：US20250146123A1

公开(公告)日：2025-05-08

申请号：US18867897

申请日：2022-07-05

Applicant: Applied Materials, Inc.

Inventor： Julian AULBACH ,  Andreas MÜLLER ,  Andreas LOPP

IPC: C23C14/24

Abstract: A vapor source for depositing an evaporated material on a substrate is provided. The vapor source includes a vapor distribution pipe with a plurality of nozzles, wherein at least one nozzle of the plurality of nozzles includes a nozzle body with a nozzle channel extending along a nozzle axis for releasing evaporated material through a nozzle orifice; and a shielding portion connected to and in thermal contact with the nozzle body, the shielding portion having an aperture for passage of a low-angle part of the evaporated material toward a substrate. At least one lateral opening is provided between the shielding portion and the nozzle body for passage of a high-angle part of the evaporated material, particularly toward a wall of a material collector. Further described are a nozzle for a vapor source and a method of depositing an evaporated material on a substrate.