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公开(公告)号：US10466595B2
公开(公告)日：2019-11-05
申请号：US15790287
申请日：2017-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC: G03F7/20
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US09798246B2
公开(公告)日：2017-10-24
申请号：US15184770
申请日：2016-06-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US10222707B2
公开(公告)日：2019-03-05
申请号：US15054010
申请日：2016-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Wilhelmus Polet , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
IPC: G03F7/20
Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
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公开(公告)号：US10114300B2
公开(公告)日：2018-10-30
申请号：US14419640
申请日：2013-08-15
Applicant: ASML Netherlands B.V.
Inventor： Henrikus Herman Marie Cox , Mark Marcus Gerardus Heeren , Peter Michel Silvester Maria Heijmans , Jacob Jan Velten , Johannes Hubertus Antonius Van De Rijdt , Godfried Katharina Hubertus Franciscus Geelen , Abdelhamid Kechroud
IPC: G03F9/00 , G03F7/20 , H02K41/035 , H02K9/22 , H02K1/06
Abstract: An electromagnetic actuator includes a coil assembly including a coil; a magnet assembly including a first and a second magnet unit, each magnet unit including a magnetic yoke and a plurality of permanent magnets mounted to the magnetic yoke, the first and second magnet unit forming a magnetic circuit for receiving the coil assembly and, upon energizing the coil, generating a force in a first direction; and a holder for holding the magnet units, wherein a weight ratio of the magnet assembly over the coil assembly is smaller than the weight ratio of the magnet assembly over the coil assembly when the ratio of force over electrical power is maximized.
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Patent Agency Ranking
公开(公告)号：US09477160B2
公开(公告)日：2016-10-25
申请号：US14624167
申请日：2015-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US09977341B2
公开(公告)日：2018-05-22
申请号：US14766112
申请日：2014-02-06
Applicant: ASML Netherlands B.V.
Inventor： Henrikus Herman Marie Cox
IPC: G03B27/62 , G03F7/20 , G05B19/402
CPC classification number: G03F7/70633 , G03F7/70725 , G05B19/402
Abstract: A position control system includes a position measurement system including a first position measurement configuration arranged to determine a position of an object in a first operating area and a second position measurement configuration to determine a position of the object in a second operating area; and a control unit configured to control a position of the object, the control unit including a first and a second controller, the first and second controllers being arranged to convert an input signal representing a position of the object to a respectively first and second control signal, the control unit being arranged to determine a combined control signal for controlling the position of the object in an overlapping area of the first and second operating area, wherein the combined control signal is obtained by applying a continuous weight function to the first and second control signal.
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公开(公告)号：US09671702B2
公开(公告)日：2017-06-06
申请号：US14956110
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Henrikus Herman Marie Cox
CPC classification number: G03F7/70775 , G03B27/53 , G03B27/58 , G03F7/70725
Abstract: A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.
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公开(公告)号：US20150212435A1
公开(公告)日：2015-07-30
申请号：US14419640
申请日：2013-08-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Henrikus Herman Marie Cox , Mark Marcus Gerardus Heeren , Peter Michel Silvester Mar Heijmans , Jacob Jan Velten , Johannes Hubertus Antonius Van De Rijdt , Godfried Katharina Hubertus Franciscu Geelen , Abdelhamid Kechroud
IPC: G03F9/00 , H02K41/035 , H02K1/06
CPC classification number: G03F9/7096 , G03F7/70758 , G03F2009/005 , H02K1/06 , H02K9/22 , H02K41/035 , H02K41/0356 , H02K2201/18 , H02K2213/03 , H02K2213/12
Abstract: An electromagnetic actuator includes a coil assembly including a coil; a magnet assembly including a first and a second magnet unit, each magnet unit including a magnetic yoke and a plurality of permanent magnets mounted to the magnetic yoke, the first and second magnet unit forming a magnetic circuit for receiving the coil assembly and, upon energizing the coil, generating a force in a first direction; and a holder for holding the magnet units, wherein a weight ratio of the magnet assembly over the coil assembly is smaller than the weight ratio of the magnet assembly over the coil assembly when the ratio of force over electrical power is maximized.
Abstract translation: 电磁致动器包括：线圈组件，其包括线圈; 包括第一和第二磁体单元的磁体组件，每个磁体单元包括磁轭和安装在磁轭上的多个永磁体，第一和第二磁体单元形成用于接收线圈组件的磁路，并且在通电时 所述线圈在第一方向上产生力; 以及用于保持磁体单元的保持器，其中当电力上的力比达到最大时，磁体组件超过线圈组件的重量比小于线圈组件上的磁体组件的重量比。
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公开(公告)号：US20150168850A1
公开(公告)日：2015-06-18
申请号：US14624167
申请日：2015-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
Abstract translation: 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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