公开(公告)号：US20150103325A1

公开(公告)日：2015-04-16

申请号：US14395979

申请日：2013-03-19

Applicant: ASML Netherlands B.V.

Inventor： Ronald Van Der Wilk ,  Roger Schmitz ,  Arnoud Willem Notenboom ,  Manon Elise Will

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/70875 ,  H01L21/6831

Abstract: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.

Abstract translation: 一种构造成保持物体的静电夹具（21），所述静电夹具包括电极（24），由位于所述电极上的电阻材料形成的电阻部分（23）和由电介质材料形成的电介质部分 位于电阻部分上。

公开(公告)号：US20180267414A1

公开(公告)日：2018-09-20

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. DELPUERTO ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US20140211190A1

公开(公告)日：2014-07-31

申请号：US14242156

申请日：2014-04-01

Applicant: ASML Netherlands B.V.

Inventor： Alexander Petrus HILBERS ,  Ronald Van Der Wilk

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  G03F7/70066 ,  G03F7/70708 ,  G03F7/70991 ,  H05K1/0256 ,  H05K3/4007 ,  H05K2201/09472

Abstract: An electrical connector comprises a high voltage pad and a high voltage plate. When connected to another electrical connector, the two plates, which are at the same voltage as the pads, form a region of high voltage in which the field is low. The pads are positioned in that region. An electrostatic clamp of an EUV lithographic apparatus may have such a pad and plate, for connecting to the electrical connector. By placing the interconnection in a low field region, triple points (points of contact between a conductor, a solid insulator and a gas) may be present in that region.

Abstract translation: 电连接器包括高压焊盘和高压板。 当连接到另一个电连接器时，与焊盘处于相同电压的两个板形成场中低电压的区域。 垫位于该区域。 EUV光刻设备的静电夹具可以具有用于连接到电连接器的垫和板。 通过将互连置于低场区域中，可以在该区域中存在三个点（导体，固体绝缘体和气体之间的接触点）。

公开(公告)号：US12189309B2

公开(公告)日：2025-01-07

申请号：US17781411

申请日：2020-11-02

Applicant: ASML Netherlands B.V.

Inventor： Ronald Van Der Wilk ,  Tiannan Guan

IPC: G03F7/00

Abstract: A clamp assembly is disclose, the clamp assembly comprising a clamp (50) configurable to clamp a support member (110) to a lower base surface (49) of the clamp by electrostatic adhesion, and an arrangement configurable to direct a gas to the lower base surface (49) of the clamp. The arrangement is configurable to humidify the gas by exposing the gas to a liquid. Also disclosed is a method of discharging a lower base surface of a clamp, The method comprises the steps of humidifying a gas by exposing the gas to a liquid, and directing the humidified gas to a lower base surface of the clamp.

公开(公告)号：US20230008915A1

公开(公告)日：2023-01-12

申请号：US17781411

申请日：2020-11-02

Applicant: ASML Netherlands B.V.

Inventor： Ronald Van Der Wilk ,  Tiannan Guan

IPC: G03F7/20

Abstract: A clamp assembly is disclose, the clamp assembly comprising a clamp (50) configurable to clamp a support member (110) to a lower base surface (49) of the clamp by electrostatic adhesion, and an arrangement configurable to direct a gas to the lower base surface (49) of the clamp. The arrangement is configurable to humidify the gas by exposing the gas to a liquid. Also disclosed is a method of discharging a lower base surface of a clamp, The method comprises the steps of humidifying a gas by exposing the gas to a liquid, and directing the humidified gas to a lower base surface of the clamp.

公开(公告)号：US11443912B2

公开(公告)日：2022-09-13

申请号：US17140699

申请日：2021-01-04

Applicant: ASML Netherlands B.V.

Inventor： Ronald Van Der Wilk

IPC: H01J5/46 ,  C03C27/04 ,  H01J5/36 ,  H01J9/28

Abstract: A feedthrough for providing an electrical connection is provided. The feedthrough comprises a conductor and a quartz or a glass structure configured to surround at least a portion of the conductor and provide isolation to the conductor. The conductor and the quartz or glass structure may be coaxially arranged. The feedthrough can provide an electrical connection between an inside and outside of a vacuum chamber that contains a sample.

公开(公告)号：US10241418B2

公开(公告)日：2019-03-26

申请号：US15527645

申请日：2015-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Marc Hauptmann ,  Dylan John David Davies ,  Paul Janssen ,  Naoko Tsugama ,  Richard Joseph Bruls ,  Kornelis Tijmen Hoekerd ,  Edwin Johannes Maria Janssen ,  Petrus Johannes Van Den Oever ,  Ronald Van Der Wilk ,  Antonius Hubertus Van Schijndel ,  Jorge Alberto Vieyra Salas

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  G03F1/84 ,  G01N21/95 ,  H01L21/66 ,  G01N21/956 ,  G01N27/61

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

公开(公告)号：US09798251B2

公开(公告)日：2017-10-24

申请号：US14772721

申请日：2014-02-26

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis LaFarre ,  Satish Achanta ,  Matteo Filippi ,  Yogesh Karade ,  Antonius Johannes Maria Nellissen ,  Ronald Van Der Wilk ,  Hendrikus Christoffel Maria Van Doremalen ,  Wilhelmus Jacobus Johannes Welters

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70708

Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

公开(公告)号：US09165814B2

公开(公告)日：2015-10-20

申请号：US14242156

申请日：2014-04-01

Applicant: ASML Netherlands B.V.

Inventor： Alexander Petrus Hilbers ,  Ronald Van Der Wilk

IPC: H01L21/683 ,  H05K1/02 ,  G03F7/20 ,  H05K3/40

CPC classification number: H01L21/6833 ,  G03F7/70066 ,  G03F7/70708 ,  G03F7/70991 ,  H05K1/0256 ,  H05K3/4007 ,  H05K2201/09472

Abstract: An electrical connector comprises a high voltage pad and a high voltage plate. When connected to another electrical connector, the two plates, which are at the same voltage as the pads, form a region of high voltage in which the field is low. The pads are positioned in that region. An electrostatic clamp of an EUV lithographic apparatus may have such a pad and plate, for connecting to the electrical connector. By placing the interconnection in a low field region, triple points (points of contact between a conductor, a solid insulator and a gas) may be present in that region.

Abstract translation: 电连接器包括高压焊盘和高压板。 当连接到另一个电连接器时，与焊盘处于相同电压的两个板形成场中低电压的区域。 垫位于该区域。 EUV光刻设备的静电夹具可以具有用于连接到电连接器的垫和板。 通过将互连置于低场区域中，可以在该区域中存在三个点（导体，固体绝缘体和气体之间的接触点）。