公开(公告)号：US20220056576A1

公开(公告)日：2022-02-24

申请号：US17403273

申请日：2021-09-17

Applicant: Applied Materials, Inc.

Inventor： Thomas DEPPISCH ,  Ezhiylmurugan RANGASAMY ,  Stefan BANGERT ,  Mathew Dean ALLISON

IPC: C23C14/56 ,  H05K1/03 ,  H05K1/11

Abstract: A processing system for processing a flexible substrate is described. The processing system includes a vacuum chamber having a wall with an opening for the flexible substrate, a substrate support for supporting the flexible substrate during transportation of the flexible substrate through the opening, and a measurement assembly for measuring at least one of a property of the flexible substrate and a property of one or more coatings on the flexible substrate. The measurement assembly and the substrate support are attached to the wall.

公开(公告)号：US20160340776A1

公开(公告)日：2016-11-24

申请号：US15112800

申请日：2014-01-22

Applicant: Andreas Sauer ,  Florian Ries ,  Thomas Deppisch ,  Applied Materials, Inc.

Inventor： Andreas SAUER ,  Florian RIES ,  Thomas DEPPISCH

IPC: C23C14/56 ,  C23C14/34 ,  C23C14/54 ,  C23C16/505 ,  C23C16/46 ,  C23C14/24 ,  C23C16/52

CPC classification number: C23C14/562 ,  C23C14/24 ,  C23C14/34 ,  C23C14/50 ,  C23C14/541 ,  C23C14/568 ,  C23C16/463 ,  C23C16/505 ,  C23C16/52 ,  C23C16/545

Abstract: A processing apparatus for processing a flexible substrate in a vacuum chamber is described. The processing apparatus includes a processing drum for processing the flexible substrate while being guided on the processing drum, a roller arrangement having one or more rollers configured to contact the flexible substrate along a portion of one or more circumferences of the one or more rollers before the flexible substrate is guided on the processing drum, wherein the combined length of contact along one or more portions of the one or more circumferences of the one or more rollers is 270 mm or above, and wherein an individual length of contact along each of the one or more portions of the one or more circumferences of the one or more rollers is 500 mm or below, and a temperature adjustment element adjusting the temperature of the one or more rollers.

Abstract translation: 描述了一种在真空室中处理柔性基板的处理装置。 处理装置包括处理滚筒，用于在处理滚筒上被引导时处理柔性基板;滚筒装置，其具有一个或多个辊子，该滚筒装置构造成沿着一个或多个滚筒的一个或多个圆周的一部分接触柔性基板 柔性基底在处理滚筒上引导，其中沿一个或多个滚筒的一个或多个圆周的一个或多个部分的组合接触长度为270mm或更大，并且其中沿着一个或多个滚筒中的每一个的单独的接触长度 一个或多个辊的一个或多个圆周的多个部分或更多部分为500mm以下，以及调节一个或多个辊的温度的温度调节元件。

公开(公告)号：US20250059639A1

公开(公告)日：2025-02-20

申请号：US18939252

申请日：2024-11-06

Applicant: Applied Materials, Inc.

Inventor： Andreas SAUER ,  Volker HACKER ,  Thomas DEPPISCH ,  Ralf SCHEIDT

IPC: C23C14/24 ,  G01F11/28 ,  H01M4/02 ,  H01M4/04 ,  H01M4/38 ,  H01M10/052

Abstract: A vapor deposition apparatus is provided. The vapor deposition apparatus includes a tank for providing a liquefied material, a first unit having an alterable first volume, the first unit including a first actuator and including a first line to be in fluid communication with the tank. Further, the vapor deposition apparatus includes a second unit having an alterable second volume, the second unit including a second actuator and including a second line to be in fluid communication with the tank. The vapor deposition apparatus includes an evaporation arrangement, the evaporation arrangement being in fluid communication with the first unit and the second unit. The first actuator and the second actuator are configured to alternatingly provide a force to the alterable first volume and the alterable second volume for providing the liquefied material to the evaporation arrangement.

公开(公告)号：US20230137506A1

公开(公告)日：2023-05-04

申请号：US17442415

申请日：2021-08-16

Applicant: Applied Materials, Inc.

Inventor： Thomas DEPPISCH ,  Ezhiylmurugan RANGASAMY ,  Stefan BANGERT ,  Mathew Dean ALLISON

IPC: C23C14/56 ,  C23C14/50 ,  C23C14/54 ,  C23C14/16

Abstract: A processing system for processing a flexible substrate is described. The processing system includes a vacuum chamber having a wall with an opening for the flexible substrate, a substrate support for supporting the flexible substrate during transportation of the flexible substrate through the opening, and a measurement assembly for measuring at least one of a property of the flexible substrate and a property of one or more coatings on the flexible substrate. The measurement assembly and the substrate support are attached to the wall.

公开(公告)号：US20220364223A1

公开(公告)日：2022-11-17

申请号：US17317115

申请日：2021-05-11

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Thomas DEPPISCH ,  Wolfgang BUSCHBECK

IPC: C23C14/54 ,  C23C16/46 ,  C23C14/56 ,  C23C16/458 ,  C23C14/50

Abstract: A roller for transporting a flexible substrate is described. The roller includes a first coolant supply for cooling a first part of the roller and a second coolant supply for cooling a second part and a third part of the roller. The first part is provided between the second part and the third part. Additionally, a vacuum processing apparatus including a roller and a method of cooling a roller are described.

公开(公告)号：US20220228251A1

公开(公告)日：2022-07-21

申请号：US17563242

申请日：2021-12-28

Applicant: Applied Materials, Inc.

Inventor： Andreas SAUER ,  Volker HACKER ,  Thomas DEPPISCH ,  Ralf SCHEIDT

IPC: C23C14/24 ,  G01F11/28 ,  H01M4/04 ,  H01M4/38 ,  H01M10/052

Abstract: A vapor deposition apparatus is provided. The vapor deposition apparatus includes a tank for providing a liquefied material, a first unit having an alterable first volume, the first unit including a first actuator and including a first line to be in fluid communication with the tank. Further, the vapor deposition apparatus includes a second unit having an alterable second volume, the second unit including a second actuator and including a second line to be in fluid communication with the tank. The vapor deposition apparatus includes an evaporation arrangement, the evaporation arrangement being in fluid communication with the first unit and the second unit. The first actuator and the second actuator are configured to alternatingly provide a force to the alterable first volume and the alterable second volume for providing the liquefied material to the evaporation arrangement.

公开(公告)号：US20170067149A1

公开(公告)日：2017-03-09

申请号：US15118810

申请日：2014-02-21

Applicant: Thomas DEPPISCH ,  Applied Materials, Inc.

Inventor： Thomas DEPPISCH

IPC: C23C14/58 ,  C23C14/24 ,  H01J37/32 ,  C23C16/50 ,  C23C16/56

CPC classification number: C23C14/5873 ,  C23C14/24 ,  C23C14/562 ,  C23C16/50 ,  C23C16/56 ,  H01J37/32082 ,  H01J2237/3321 ,  H01J2237/335

Abstract: According to the present disclosure, a flexible substrate coating apparatus is provided. The flexible substrate coating apparatus includes a vacuum process chamber for processing a flexible substrate. The vacuum process chamber includes one or more deposition units and a cleaning unit positioned directly downstream of the one or more deposition units. In another aspect, a method for depositing a thin-film on a flexible substrate is provided. The method for depositing a thin-film on a flexible substrate includes vacuum coating of the flexible substrate, thereby depositing one or more layers on the flexible substrate, and cleaning the flexible substrate directly downstream of the coating.

Abstract translation: 根据本公开，提供了柔性基板涂布装置。 柔性基板涂布装置包括用于处理柔性基板的真空处理室。 真空处理室包括一个或多个沉积单元和位于该一个或多个沉积单元的直接下游的清洁单元。 另一方面，提供了一种在柔性基板上沉积薄膜的方法。 用于在柔性基板上沉积薄膜的方法包括真空涂覆柔性基底，从而在柔性基底上沉积一层或多层，以及直接在涂层的下游清洁柔性基底。

公开(公告)号：US20150110960A1

公开(公告)日：2015-04-23

申请号：US14254695

申请日：2014-04-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Andreas SAUER ,  Jürgen HENRICH ,  Thomas DEPPISCH ,  Dirk WAGNER

IPC: B05D1/00 ,  B05C1/00 ,  H01L21/677

CPC classification number: B05D1/60 ,  B05C1/003 ,  C23C16/46 ,  C23C16/481 ,  C23C16/54 ,  H01L21/67739

Abstract: A deposition arrangement for depositing a material on a substrate is described. The deposition arrangement includes a vacuum chamber; a roller device within the vacuum chamber; and an electrical heating device within the roller device, wherein the heating device comprises a first end and a second end, and wherein the heating device is held at the first end and at the second end. Also, a method for heating a substrate in a vacuum deposition arrangement is described.

Abstract translation: 描述了用于在衬底上沉积材料的沉积装置。 沉积装置包括真空室; 真空室内的滚筒装置; 以及在所述辊装置内的电加热装置，其中所述加热装置包括第一端和第二端，并且其中所述加热装置保持在所述第一端和所述第二端。 另外，描述了一种在真空沉积装置中加热衬底的方法。