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公开(公告)号：US20230280662A1
公开(公告)日：2023-09-07
申请号：US18023708
申请日：2021-08-17
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/706841 , G03F7/70133
Abstract: Methods of performing metrology. In one arrangement a substrate has a layer. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.
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公开(公告)号：US20230279919A1
公开(公告)日：2023-09-07
申请号：US18178088
申请日：2023-03-03
Applicant: Carl Zeiss SMT GmbH , ASML Netherlands B.V.
Inventor： Alexander Petrus Josephus VAN LANKVELT , Michiel VERVOORDELDONK , Pavel KAGAN , Marc Wilhelmus Maria VAN DER WIJST , Galip Tuna TURKBEY , Marco HUISKAMP , Ulrich SCHOENHOFF
IPC: F16F9/04 , F16F15/027
CPC classification number: F16F9/049 , F16F15/027 , F16F2224/046 , F16F2222/126 , F16F2230/42
Abstract: A vibration isolator (10; 210) for supporting a payload and isolating the payload from vibrations has a contact member (12) configured for supporting the payload, at least two pressurized gas compartments (24) arranged offset from each other to support the contact member at different locations, which pressurized gas compartments are connected to each other via a tubing system (54). The tubing system contains at least one restriction (66) at which a cross section of the tubing system is reduced by at least 50%.
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183.发明授权公开(公告)号：US11747738B2
公开(公告)日：2023-09-05
申请号：US16314805
申请日：2017-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Coen Adrianus Verschuren , Erwin Paul Smakman
CPC classification number: G03F7/70291 , G03F7/70383 , G03F7/70433 , G03F7/70508
Abstract: A direct write exposure apparatus configured to process a plurality of substrates, the apparatus including: a substrate holder configured to hold a substrate having a usable patterning area; a patterning system configured to project different patterns onto the substrate; a processing system configured to: determine a first combination of one or more patterns that are to be applied on a first substrate of the plurality of substrates; and determine a second, different combination of one or more patterns that are to be applied on a second, subsequent, substrate of the plurality of substrates.
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公开(公告)号：US20230273533A1
公开(公告)日：2023-08-31
申请号：US18300094
申请日：2023-04-13
Applicant: ASML NETHERLANDS B.V.
Inventor： NICOLAAS TEN KATE , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/00
CPC classification number: G03F7/70875 , G03F7/7085
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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185.发明公开公开(公告)号：US20230273502A1
公开(公告)日：2023-08-31
申请号：US18014724
申请日：2021-07-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Yongfeng NI
CPC classification number: G02F1/365 , G02F1/3551 , G03F7/706847 , G02F1/3528 , G02F2202/32
Abstract: A method of generating broadband output radiation and associated broadband radiation source. The method includes generating pulses of input radiation having a duration between 50fs and 400fs and having a rise time of less than 60fs; and exciting a working medium within a hollow core fiber with the pulses of input radiation.
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Patent Agency Ranking
186.发明授权公开(公告)号：US11740560B2
公开(公告)日：2023-08-29
申请号：US17910454
申请日：2021-03-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Eleftherios Koulierakis , Carlo Lancia , Juan Manuel Gonzalez Huesca , Alexander Ypma , Dimitra Gkorou , Reza Sahraeian
CPC classification number: G03F7/70525
Abstract: A method for determining an inspection strategy for at least one substrate, the method including: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre-processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for the at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.
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187.发明公开公开(公告)号：US20230267711A1
公开(公告)日：2023-08-24
申请号：US18015313
申请日：2021-07-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Maxim PISARENCO , Markus Gerardus Martinus Maria VAN KRAAIJ , Coen Adrianus VERSCHUREN
IPC: G06V10/774 , G06N3/0464 , G06V10/50
CPC classification number: G06V10/774 , G06N3/0464 , G06V10/50
Abstract: A method and apparatus for selecting patterns from an image such as a design layout. The method includes obtaining an image (e.g., of a target layout) having a plurality of patterns; determining, based on pixel intensities within the image, a metric (e.g., entropy) indicative of an amount of information contained in one or more portions of the image; and selecting, based on the metric, a sub-set of the plurality of patterns from the one or more portions of the image having values of the metric within a specified range. The sub-set of patterns can be provided as training data for training a model associated with a patterning process.
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公开(公告)号：US11733617B2
公开(公告)日：2023-08-22
申请号：US17572864
申请日：2022-01-11
Applicant: ASML Netherlands B.V.
CPC classification number: G03F9/7065 , G02B6/02328 , G02F1/365 , G03F7/7015 , G03F7/70133 , G03F7/70316 , G03F7/70325 , G03F7/70575 , G03F7/70616
Abstract: An apparatus for receiving input radiation and broadening a frequency range of the input radiation to provide broadband output radiation. The apparatus includes a chamber, a fiber, a gas generating apparatus, and a radical generating apparatus. The fiber includes a hollow core configured to guide radiation propagating through the fiber, the hollow core in fluid communication with the chamber. The gas generating apparatus is configured to provide a gas within the chamber. The radical generating apparatus is configured to provide free radicals within the chamber to reduce contaminants in the gas. The apparatus may be included in a radiation source.
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189.发明公开公开(公告)号：US20230260820A1
公开(公告)日：2023-08-17
申请号：US18305925
申请日：2023-04-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Robby Franciscus Josephus MARTENS , Youssef Karel Maria DE VOS , Ringo Petrus Cornelis VAN DORST , Gerhard Albert TEN BRINKE , Dirk Jerome Andre SENDEN , Coen Hubertus Matheus BALTIS , Justin Johannes Hermanus GERRITZEN , Jelmer Mattheüs KAMMINGA , Evelyn Wallis PACITTI , Thomas POIESZ , Arie Cornelis SCHEIBERLICH , Bert Dirk SCHOLTEN , André SCHREUDER , Abraham Alexander SOETHOUDT , Siegfried Alexander TROMP , Yuri Johannes Gabriël VAN DE VIJVER
IPC: H01L21/683 , G03F7/00 , H01L21/687 , B25B11/00
CPC classification number: H01L21/6838 , G03F7/707 , G03F7/70733 , H01L21/68742 , B25B11/005
Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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公开(公告)号：US20230259042A1
公开(公告)日：2023-08-17
申请号：US18012398
申请日：2021-05-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Sarathi ROY
CPC classification number: G03F7/706851 , G03F7/70633 , G03F7/70666 , G03F7/706839 , G03F9/7092 , G03F9/7046 , G03F9/7011 , G01B11/27
Abstract: A method to determine a performance indicator indicative of alignment performance of a processed substrate. The method includes obtaining measurement data including a plurality of measured position values of alignment marks on the substrate and calculating a positional deviation between each measured position value and a respective expected position value. These positional deviations are used to determine a directional derivative between the alignment marks, and the directional derivatives are used to determine at least one directional derivative performance indicator.
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