公开(公告)号：US20150003485A1

公开(公告)日：2015-01-01

申请号：US14487796

申请日：2014-09-16

Applicant: GIGAPHOTON INC.

Inventor： Tooru ABE ,  Takeshi OHTA ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

IPC: H01S3/036 ,  H01S3/097

CPC classification number: H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。

公开(公告)号：US20140346376A1

公开(公告)日：2014-11-27

申请号：US14455743

申请日：2014-08-08

Applicant: GIGAPHOTON INC.

Inventor： Krzysztof NOWAK ,  Osamu WAKABAYASHI

IPC: H01S3/00 ,  G02F1/03 ,  H05G2/00 ,  H01S3/11

CPC classification number: H01S3/0064 ,  G02F1/0316 ,  G02F1/0322 ,  H01S3/0315 ,  H01S3/04 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/11 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H05G2/008

Abstract: A laser apparatus may include a master oscillator configured to output a pulse laser beam, at least one amplifier provided in a path of the pulse laser beam from the master oscillator, and at least one first optical isolator provided in the path of the pulse laser beam, the first optical isolator including at least one of a GaAs crystal and a CdTe crystal as an electro-optic crystal.

Abstract translation: 激光装置可以包括主振荡器，其被配置为输出脉冲激光束，设置在来自主振荡器的脉冲激光束的路径中的至少一个放大器以及设置在脉冲激光束的路径中的至少一个第一光隔离器 所述第一光隔离器包括作为电光晶体的GaAs晶体和CdTe晶体中的至少一个。

公开(公告)号：US20140346374A1

公开(公告)日：2014-11-27

申请号：US14454962

申请日：2014-08-08

Applicant: GIGAPHOTON INC.

Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: G02F1/09 ,  H05G2/00 ,  H01S3/00

CPC classification number: G02F1/093 ,  G02F2201/38 ,  G02F2203/60 ,  H01S3/0064 ,  H05G2/008

Abstract: A Faraday rotator may include a magnetic field forming section configured to form a magnetic field at a predetermined magnetic flux density in a predetermined region, a Faraday element disposed in the predetermined region, and a first heat exhaust member, disposed on the side of one primary plane of the Faraday element, configured to form an optical contact surface with the Faraday element and configured to allow light at a predetermined wavelength to pass.

Abstract translation: 法拉第旋转器可以包括：磁场形成部，被配置为在预定区域中以预定的磁通密度形成磁场;布置在预定区域中的法拉第元件;以及第一散热构件，设置在一个主要侧面 法拉第元件的平面，被配置为与法拉第元件形成光学接触表面，并且被配置为允许预定波长的光通过。

公开(公告)号：US20130315272A1

公开(公告)日：2013-11-28

申请号：US13956282

申请日：2013-07-31

Applicant: GIGAPHOTON INC.

Inventor： Krzysztof NOWAK ,  Takashi SUGANUMA ,  Osamu WAKABAYASHI

IPC: H01S3/05 ,  H01S5/06 ,  H01S5/042 ,  H01S3/22

CPC classification number: H01S3/05 ,  B82Y20/00 ,  H01S3/0315 ,  H01S3/08031 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2232 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S5/042 ,  H01S5/06 ,  H01S5/14 ,  H01S5/3401

Abstract: A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.

Abstract translation: 根据本公开的一个方面的再生放大器与激光装置组合使用，再生放大器可以包括：构成光谐振器的一对谐振器镜; 设置在所述一对所述谐振器镜之间用于放大从所述激光装置输出的预定波长的激光束的平板放大器; 以及光学系统，被配置为配置多个光路，激光束沿着该光路在所述平板放大器内部往复运动，所述光学系统将所述激光束的光学图像在第一位置处作为所述激光束的光学图像在第二位置 。

公开(公告)号：US20130277452A1

公开(公告)日：2013-10-24

申请号：US13925727

申请日：2013-06-24

Applicant: GIGAPHOTON INC.

Inventor： Takayuki YABU ,  Kouji KAKIZAKI ,  Yukio WATANABE ,  Osamu WAKABAYASHI

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.

Abstract translation: 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。

公开(公告)号：US20130206863A1

公开(公告)日：2013-08-15

申请号：US13675790

申请日：2012-11-13

Applicant: GIGAPHOTON INC.

Inventor： Takayuki YABU ,  Yukio WATANABE ,  Toshihiro NISHISAKA ,  Hiroshi SOMEYA ,  Osamu WAKABAYASHI

IPC: B05B17/06

CPC classification number: B05B17/0607 ,  B05B12/082

Abstract: A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.

Abstract translation: 目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件 被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成 使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。

公开(公告)号：US20130186976A1

公开(公告)日：2013-07-25

申请号：US13744334

申请日：2013-01-17

Applicant: Gigaphoton Inc.

Inventor： Takanobu ISHIHARA ,  Tamotsu ABE ,  Osamu WAKABAYASHI

IPC: B05B17/06

CPC classification number: B05B17/06 ,  B05B5/001 ,  B05B5/035 ,  B05B12/082 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal.

Abstract translation: 用于确定由脉冲电压驱动以产生目标材料的液滴的目标发生器的目标生成条件的装置可以包括检测器，被配置为检测由目标发生器产生的目标并输出目标的检测信号， 以及控制器，被配置为控制用于驱动目标发生器的脉冲电压的脉冲持续时间。 控制器可以基于检测信号来确定目标发生器是否产生目标，并且基于检测信号来确定生成的目标是否包括多个液滴。

公开(公告)号：US20130135601A1

公开(公告)日：2013-05-30

申请号：US13681744

申请日：2012-11-20

Applicant: Gigaphoton Inc.

Inventor： Shinji OKAZAKI ,  Hakaru MIZOGUCHI ,  Junichi FUJIMOTO ,  Takashi MATSUNAGA ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC: G03B27/52

CPC classification number: G03B27/522 ,  G03F7/70408

Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台，分束器，用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光， 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光，从与第一方向垂直但与第二方向不同的第三方向照射第三激光，从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。

公开(公告)号：US20240322521A1

公开(公告)日：2024-09-26

申请号：US18735830

申请日：2024-06-06

Applicant: Gigaphoton Inc.

Inventor： Koichi FUJII ,  Takanobu ISHIHARA ,  Osamu WAKABAYASHI

IPC: H01S5/062 ,  G03F7/00

CPC classification number: H01S5/06233 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70525 ,  G03F7/70575

Abstract: An electronic device manufacturing method includes acquiring a pulse spectral shape of pulse laser light, and a target integrated spectral shape realized by the pulse laser light of pulses generated based on wavelength sequence in which a center wavelength of the pulse laser light periodically changes; calculating target center wavelengths allocated to the pulses to realize the target integrated spectral shape, and a number of allocation pulses of each target center wavelength being the number of allocation pulses per cycle of the wavelength sequence; calculating the wavelength sequence by correspondingly allocating at least one first center wavelength having the number of allocation pulses of 2 or greater so that the smaller the number of allocation pulses is, the larger a time interval of the allocation pulses for the first center wavelength is, and then correspondingly allocating at least one second center wavelength having the number of allocation pulses of 1.

公开(公告)号：US20240023217A1

公开(公告)日：2024-01-18

申请号：US18363381

申请日：2023-08-01

Applicant: Gigaphoton Inc.

Inventor： Yuji MINEGISHI ,  Osamu WAKABAYASHI

IPC: H05B45/50 ,  H05B47/17 ,  H05B47/19 ,  H05B47/105

CPC classification number: H05B45/50 ,  H05B47/17 ,  H05B47/19 ,  H05B47/105

Abstract: A light source parameter information management method for managing information on a parameter of a light source used in an exposure apparatus, the method including acquiring priority target parameter information containing an item of a variable that is a priority target parameter prioritized in the operation of the light source, and a target value of the variable, estimating maintenance information based on the priority target parameter information, the maintenance information containing a value representing the life of a consumable in the light source until maintenance of the consumable, and outputting the maintenance information.