公开(公告)号：US20160187788A1

公开(公告)日：2016-06-30

申请号：US14983962

申请日：2015-12-30

Applicant: Gigaphoton Inc.

Inventor： Takashi ONOSE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI ,  Akiyoshi SUZUKI

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/7035 ,  G03F7/70408 ,  G03F7/70575

Abstract: An exposure apparatus may include a laser light source capable of varying a wavelength of a laser beam that is emitted from the laser light source, a mask on which a pattern is formed, the pattern being configured to generate diffracted light by being irradiated with the laser beam, and a controller configured to control, in accordance with a distance between the mask and a substrate, the wavelength of the laser beam that is emitted from the laser light source, wherein the mask is irradiated with the laser beam emitted from the laser light source to perform proximity exposure on a surface of the substrate.

Abstract translation: 曝光装置可以包括能够改变从激光光源发射的激光束的波长的激光源，形成有图案的掩模，该图案被配置为通过照射激光产生衍射光 光束和控制器，被配置为根据掩模和衬底之间的距离来控制从激光光源发射的激光束的波长，其中掩模被从激光发射的激光束照射 源，以在基板的表面上进行接近曝光。

公开(公告)号：US20160187787A1

公开(公告)日：2016-06-30

申请号：US15064019

申请日：2016-03-08

Applicant: Gigaphoton Inc.

Inventor： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

公开(公告)号：US20160172814A1

公开(公告)日：2016-06-16

申请号：US15040645

申请日：2016-02-10

Applicant: GIGAPHOTON INC.

Inventor： Takashi SUGANUMA ,  Hakaru MIZOGUCHI ,  Osamu WAKABAYASHI

IPC: H01S3/00 ,  G03F7/20 ,  H01S3/23 ,  G02B27/28 ,  H05G2/00 ,  H01S3/038

CPC classification number: H01S3/005 ,  G02B27/286 ,  G03F7/70033 ,  G03F7/70041 ,  H01S3/038 ,  H01S3/2316 ,  H05G2/008

Abstract: There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

Abstract translation: 提供了一种激光单元，其可以包括：主振荡器，被配置为输出线偏振激光束; 设置在所述线偏振激光的光路中并具有基本上与所述线偏振的入射激光的偏振方向对准的偏振轴的第一偏振光装置; 设置在所述线偏振激光的光路中并具有基本上与所述第一偏振装置的偏振轴的方向对准的偏振轴的第二偏振装置; 以及激光放大器，其设置在所述线偏振激光的光路中的所述第一偏振光装置与所述第二偏振光装置之间，并且包括一对相对设置的放电电极，所述一对放电电极的相反方向为 基本上与第一偏振装置的偏振轴的方向对准。

公开(公告)号：US20150351211A1

公开(公告)日：2015-12-03

申请号：US14824270

申请日：2015-08-12

Applicant: GIGAPHOTON INC.

Inventor： Hakaru MIZOGUCHI ,  Yasufumi KAWASUJI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/067 ,  H05G2/003 ,  H05G2/005

Abstract: Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.

Abstract translation: 提供一种极紫外光发生装置，其可以包括：容纳一种或多种气体的室; 光浓缩光学系统，其设置在从激光单元输出的脉冲激光的光路中，并且将脉冲激光聚焦成浓缩光束; 以及摄像部，其设置在所述脉冲激光的光路外的位置处，并且被配置为拾取作为所述室中的等离子体发射的图像的等离子体发射图像。 等离子体发射是通过将浓缩的束施加到腔室中的一种或多种气体而引起的。

公开(公告)号：US20150334814A1

公开(公告)日：2015-11-19

申请号：US14327401

申请日：2014-07-09

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G02B19/00 ,  H01S3/00

CPC classification number: H05G2/008 ,  B23K26/06 ,  G02B19/009 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2316

Abstract: A device is provided for controlling a laser beam. The device may include a first wavefront adjuster provided in a beam path of a laser beam outputted from a laser apparatus, a beam delivery unit provided in a beam path of the laser beam from the first wavefront adjuster, a second wavefront adjuster provided in a beam path of the laser beam from the beam delivery unit, a beam monitor provided in a beam path of the laser beam from the second wavefront adjuster, and a controller configured to control the first and second wavefront adjusters based on a detection result of the beam monitor. An extreme ultraviolet light apparatus including the device is also provided.

Abstract translation: 提供了一种用于控制激光束的装置。 该装置可以包括设置在从激光装置输出的激光束的光束路径中的第一波前调整器，设置在来自第一波前调整器的激光束的光束路径中的光束传递单元，设置在光束中的第二波前调整器 来自光束传送单元的激光束的路径，设置在来自第二波前调整器的激光束的光束路径中的光束监视器，以及控制器，被配置为基于光束监视器的检测结果来控制第一和第二波前调整器 。 还提供了包括该装置的极紫外光装置。

公开(公告)号：US20150180192A1

公开(公告)日：2015-06-25

申请号：US14638883

申请日：2015-03-04

Applicant: GIGAPHOTON INC.

Inventor： Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI ,  Takahito KUMAZAKI ,  Takashi MATSUNAGA

IPC: H01S3/00 ,  H01S3/134 ,  G01J11/00 ,  H01S3/034 ,  H01S3/038 ,  H01S3/225

CPC classification number: H01S3/0014 ,  G01J1/4257 ,  G01J11/00 ,  H01S3/005 ,  H01S3/034 ,  H01S3/038 ,  H01S3/08009 ,  H01S3/0971 ,  H01S3/10069 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2308

Abstract: A laser apparatus may comprise: a laser chamber configured to include a laser gain medium; a pair of electrodes disposed in the laser chamber; an energy detector configured to measure pulse energy of laser beams outputted by discharging between the pair of the electrodes; an optical element disposed on a light path of the laser beams; and a controller configured to calculate an integration value of absorption energy at the optical element, and determine whether the integration value exceeds a lifetime integration value of the optical element based on the pulse energy of the laser beams.

Abstract translation: 激光装置可以包括：激光室，被配置为包括激光增益介质; 设置在激光室中的一对电极; 能量检测器，被配置为测量在所述一对电极之间通过放电而输出的激光束的脉冲能量; 设置在激光束的光路上的光学元件; 以及控制器，其被配置为计算所述光学元件处的吸收能的积分值，并且基于所述激光束的脉冲能量来确定所述积分值是否超过所述光学元件的寿命积分值。

公开(公告)号：US20150123019A1

公开(公告)日：2015-05-07

申请号：US14595940

申请日：2015-01-13

Applicant: GIGAPHOTON INC.

Inventor： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  F21K2/00

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20150123018A1

公开(公告)日：2015-05-07

申请号：US14590833

申请日：2015-01-06

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

Abstract translation: 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。

公开(公告)号：US20150043599A1

公开(公告)日：2015-02-12

申请号：US14523750

申请日：2014-10-24

Applicant: GIGAPHOTON INC.

Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H01S3/11

CPC classification number: H01S3/1106 ,  H01S3/005 ,  H01S3/105 ,  H01S3/107 ,  H01S3/1118 ,  H01S3/139 ,  H01S3/2316 ,  H01S3/235 ,  H05G2/008

Abstract: The laser system may include: a clock generator; a mode-locked laser device having an optical resonator; a controlling device capable of controlling resonator length of the optical resonator; a detector disposed in an optical path of the pulse laser beam, configured to detect the pulse laser beam and output a detection signal; a switching device disposed in the optical path of the pulse laser beam, capable of switching the pulse laser beam; and a controller, capable of controlling the controlling device based on the clock signal outputted by the clock generator and on the detection signal outputted by the detector, and capable of controlling the switching device based on the clock signal outputted by the clock generator and on a timing signal outputted by an external device.

Abstract translation: 激光系统可以包括：时钟发生器; 具有光谐振器的锁模激光器件; 能够控制光谐振器的谐振器长度的控制装置; 设置在所述脉冲激光束的光路中的检测器，被配置为检测所述脉冲激光束并输出检测信号; 设置在脉冲激光束的光路中的切换装置，能够切换脉冲激光束; 以及控制器，其能够基于由时钟发生器输出的时钟信号和由检测器输出的检测信号来控制控制装置，并且能够基于由时钟发生器输出的时钟信号来控制开关装置，并且在 定时信号由外部设备输出。

公开(公告)号：US20150008345A1

公开(公告)日：2015-01-08

申请号：US14481620

申请日：2014-09-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Tamotsu ABE ,  Hitoshi NAGANO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在所述室上的蚀刻气体导入单元，所述蚀刻气体通过所述室; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。