Abstract:
A method for fabricating a patterned layer is disclosed. Firstly, a semiconductor substrate is provided. Then, a precursory gas on the semiconductor substrate is formed. Finally, a patterned layer on the semiconductor substrate is deposited by reacting the precursory gas with at least one electron beam or at least one ion beam. The present invention not only fabricates a patterned layer on the substrate in a single step but also achieves a high lithographic resolution and avoids remains of contaminations by using the properties of the electron beam or the ion beam and the precursory gas.
Abstract:
The present invention provides an integrated system of full optical complete bridge safety monitoring with speech warming for smart phones. The Integrated system of full optical complete bridge safety monitoring includes a stabilizing device, optical sensing device and communication device. The basic structure involves cable and optical fiber connecting two ends and joined by heat shrink tubes. A measuring segment is located between two heat shrink tubes. The stabilizing device provides a pre-determined tensile strength to the measuring segment. The optical fiber sensing device detects a response via a Fiber Bragg grating in the optical fiber's measuring segment. When the measuring segment receives a response, it changes from first phase to second phase and creates a signal change from the reflected signals. Signal processing device converts the signal changes to physical parameters. The communication device sends warning signals to users. Warning signals are sent to users' smart phones, to proactively inform the bridge's safety status with speeches.
Abstract:
An in situ manufacturing process monitoring system of extreme smooth thin film and method thereof, comprising a coating device for coating a thin film on at least one substrate during a coating process, an ion figuring device for processing a surface polishing process on the thin film, a control device electrically coupled to the coating device and the ion figuring device respectively for controlling the coating device and the ion figuring device processing the coating process and surface polishing process by adjusting at least one device parameter of the coating device and the ion figuring device, and an in situ monitoring device electrically coupled to the control device for in situ monitoring at least one optical parameter of the thin film.
Abstract:
A method for correcting abnormal point cloud is disclosed. Firstly, receiving a Primitive Point Cloud Data set by an operation unit for dividing a point cloud array into a plurality of sub-point cloud sets and obtaining a plurality of corresponding distribution feature data according to an original vector data of the Primitive Point Cloud Data set. Furthermore, recognizing the sub-point cloud sets according to the corresponding distribution feature data for correcting recognized abnormal point cloud. Thus, when the point cloud array is rendered to a corresponding image, the color defect of the point cloud array will be improved or decreased for obtaining lossless of the corresponding image.
Abstract:
A microbial inhibition device for inhibiting microorganisms on a predetermined object includes: a covering member covering the predetermined object, and having an attachment surface for attaching to the predetermined object, and an exposed surface opposite to the attachment surface, wherein the covering member includes at least a conductive medium layer, and the conductive medium layer constitutes a predetermined area of the exposed surface; a control module configured to issue a control command reflecting a predetermined conduction mode; and a power supply module electrically connected to the conductive medium layer, and configured to receive the control command so as to power the conductive medium layer according to the predetermined conduction mode based on the control command. The conductive medium layer is conducted with current according to the predetermined conduction mode through the power supply module. Accordingly predetermined microorganisms on the predetermined area are inhibited or killed.
Abstract:
The present disclosure provides a time delay integration (TDI) sensor using a rolling shutter. The TDI sensor includes multiple pixel columns. Each pixel column includes multiple pixels arranged in an along-track direction, wherein two adjacent pixels or two adjacent pixel groups in every pixel column have a separation space therebetween. The separation space is equal to a pixel height multiplied by a time ratio of a line time difference of the rolling shutter and a frame period, or equal to a summation of at least one pixel height and a multiplication of the pixel height by the time ratio of the line time difference and the frame period. The TDI sensor further generates pixel data amplified by different gains for a processor to perform the image combination.
Abstract:
A joint structure installed in the physical structure is provided. The joint structure includes a first latching member and a second latching member. The first latching member includes a first main body, a head portion extending from the first main body and a first convex portion extending from the first main body. The second latching member includes a second main body, a second convex portion extending from the second main body and a third convex portion extending from the second main body. When the first latching member and the second latching member are in an assembling status, the first convex portion slides between the second convex portion and the third convex portion.
Abstract:
The present invention relates to a method for size estimation by image recognition of a specific target using a given scale. First, a reference objected is recognized in an image and the corresponding scale is established. Then the specific target is searched and the size of the specific target is estimated according to the acquired scale.
Abstract:
A method of making a semiconductor device includes: providing a substrate; forming an insulating layer on the substrate; forming a first trench in the insulating layer; forming a first semiconductor layer in the first trench; and removing a portion of the insulating layer to expose the first semiconductor layer.
Abstract:
A catadioptric optical system in sequence of ray tracing comprises a first mirrors group of Ritchey-Chrétien type hyperbolic mirrors with positive diopter including a concave primary mirror having a central through hole and a convex secondary mirror, a second corrector lens group with negative diopter positioned at the image-side of the first mirrors group including a first meniscus lens element having positive refractive power and a convex object-side surface, a second lens element having negative refractive power and biconcave surfaces, a third meniscus lens element having negative refractive power and a concave object-side surface, and a fourth lens element having positive refractive power and biconvex surfaces. The infinite conjugate beams of incident light within field of view pass through the catadioptric optical system to become a corrected beam having a small CRA angle.