公开(公告)号：US20030215578A1

公开(公告)日：2003-11-20

申请号：US10408261

申请日：2003-04-08

发明人： Tomohiro Okumura ,  Toshinari Nitta

IPC分类号： H05H001/24 ,  H01L021/461 ,  C03C025/68

CPC分类号： H01L21/68721 ,  C03C17/23 ,  C03C19/00 ,  C03C2217/213 ,  C03C2218/153 ,  C03C2218/328 ,  H01J37/321 ,  H01J2237/2001 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67132 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68785

摘要： Provided is a plasma processing method and apparatus and a tray for plasma processing, which are able to improve the temperature controllability of a substrate. If a vacuum chamber is evacuated by a pump while introducing a specified gas by a gas supply unit into the vacuum chamber and a high-frequency power is applied by a coil use high-frequency power supply to a coil while maintaining the interior of the vacuum chamber to a specified pressure, then plasma is generated in the vacuum chamber, and a substrate placed on a substrate electrode can be subjected to plasma processing. At this time, by providing an adhesive sheet between the substrate electrode and the substrate, the temperature controllability of the substrate can be improved.

摘要翻译： 提供了能够提高基板的温度可控性的等离子体处理方法和等离子体处理装置和托盘。 如果真空室被泵抽气，同时通过气体供应单元将特定气体引入真空室，并且通过线圈将高频电力施加到线圈上，同时保持真空内部 室至规定的压力，然后在真空室中产生等离子体，并且可以对放置在基板电极上的基板进行等离子体处理。 此时，通过在基板电极和基板之间设置粘合片，能够提高基板的温度控制性。

公开(公告)号：US20030134060A1

公开(公告)日：2003-07-17

申请号：US09564758

申请日：2000-05-04

发明人： Marten Walther ,  Andreas Geiger ,  Petra Auchter-Krummel ,  Michael Spallek

IPC分类号： B32B001/02

CPC分类号： C23C16/045 ,  C03C17/22 ,  C03C17/30 ,  C03C2217/282 ,  C03C2218/153 ,  Y10S215/03 ,  Y10T428/1317 ,  Y10T428/1321

摘要： The glass container stores and preserves pharmaceutical or diagnostic solutions for medicinal purposes. In order to provide a silicone-free but residue free bottle after emptying, the glass container is provided with an amorphous transparent and pharmaceutically acceptable anti-adherent coating (4) over the entire interior surface of the glass container from its bottom over the wall (3) to the closure device (2). This anti-adherent coating (4) has a contact angle for wetting with water of null80null, even after autoclaving at about 120null C. for about 20 min, contains silicon, oxygen, carbon and hydrogen and is deposited according to a PECVD method, especially a PICVD method.

摘要翻译： 玻璃容器储存并保存用于药用目的的药物或诊断溶液。 为了在排空之后提供无硅氧烷但不残渣的瓶子，玻璃容器从玻璃容器底部的整个墙壁上的整个内表面上提供无定形透明和药学上可接受的防粘剂涂层（4） 3）到封闭装置（2）。 即使在约120℃下高压灭菌约20分钟后，该防粘涂层（4）也具有与水=> 80°的润湿接触角，含有硅，氧，碳和氢，并根据 PECVD方法，特别是PICVD方法。

公开(公告)号：US06451390B1

公开(公告)日：2002-09-17

申请号：US09544728

申请日：2000-04-06

申请人： Haruhiro H. Goto ,  Takako Takehara ,  Carl A. Sorensen ,  William R. Harshbarger ,  Kam S. Law

发明人： Haruhiro H. Goto ,  Takako Takehara ,  Carl A. Sorensen ,  William R. Harshbarger ,  Kam S. Law

IPC分类号： H05H124

CPC分类号： C03C17/245 ,  C03C2217/213 ,  C03C2218/153

摘要： A method for the deposition of a silicon dioxide film onto a substrate using plasma enhanced chemical vapor deposition and TEOS is disclosed. The method includes controlling the deposition rate of silicon dioxide on a substrate by pulsing the radio frequency power supply used to generate a TEOS oxide plasma. The obtained silicon dioxide film is good in electrical and mechanical film properties for the application of forming thin film transistors.

公开(公告)号：US20010044027A1

公开(公告)日：2001-11-22

申请号：US09747673

申请日：2000-12-22

发明人： Jerrel Charles Anderson

IPC分类号： B32B009/00

CPC分类号： C23C16/515 ,  C03C17/22 ,  C03C2217/282 ,  C03C2218/153 ,  C23C16/26 ,  Y10T428/265 ,  Y10T428/30

摘要： The present invention is a non-metallic article that has been coated with a diamond-like carbon (DLC) coating. A coated article of the present invention has increased hardness, increased abrasion resistance, and a reduced coefficient of friction when compared with the same properties of the article prior to the article being coated. DLC coatings of the present invention are applied in a chamber filled with hydrocarbon plasma and with application of electrical pulses.

摘要翻译： 本发明是已经涂覆有类金刚石碳（DLC）涂层的非金属制品。 本发明的涂层制品与在制品被涂覆之前的制品相同的特性相比，具有增加的硬度，增加的耐磨性和降低的摩擦系数。 将本发明的DLC涂层施加在填充有烃等离子体的室中并且施加电脉冲。

公开(公告)号：US6136389A

公开(公告)日：2000-10-24

申请号：US216450

申请日：1998-12-18

申请人： Stephen P. Conover ,  Ashok K. Sharma

发明人： Stephen P. Conover ,  Ashok K. Sharma

IPC分类号： B05D7/24 ,  C03C17/09 ,  C03C17/36 ,  C03C17/38 ,  C03C17/40 ,  C04B41/51 ,  C04B41/88 ,  C08F2/46 ,  C23C16/04 ,  C23C16/18 ,  H05H1/24

CPC分类号： C03C17/36 ,  B05D1/62 ,  C03C17/09 ,  C03C17/38 ,  C03C17/40 ,  C04B41/009 ,  C04B41/5105 ,  C04B41/5122 ,  C04B41/88 ,  C23C16/045 ,  C23C16/18 ,  C03C2217/25 ,  C03C2217/254 ,  C03C2217/255 ,  C03C2218/153 ,  C04B2111/00801

摘要： A method for preparing thin films of noble metals upon porous substrate surfaces including utilizing plasma polymerization wherein the noble metals are derived from a monomer or comonomer precursor of the noble metal and with the precursor being disposed within a plasma glow zone to convert the precursor to its dissociated form, thereby allowing the substrate to receive a deposit of a substantially continuous noble metal film thereon. A wide variety of noble metals and their alloys may be treated in this fashion, including such noble metals as platinum, ruthenium, gold and certain alloys thereof.

公开(公告)号：US5851252A

公开(公告)日：1998-12-22

申请号：US798270

申请日：1997-02-11

申请人： Yasuhiko Sato ,  Hiroaki Fujita

发明人： Yasuhiko Sato ,  Hiroaki Fujita

IPC分类号： C03B40/02 ,  C03B11/00 ,  C03B11/08 ,  C03C17/22 ,  C03B40/00 ,  C03C17/00

CPC分类号： C03C17/22 ,  C03B11/08 ,  C03B2215/72 ,  C03C2217/282 ,  C03C2218/153 ,  Y02P40/57

摘要： In a method of forming a mold release film on the surface of a glass blank from which an optical element is made by press molding, a carbon film having a thickness of less than 50 angstroms or, preferably, less than 10 angstroms is formed on the surface of the glass blank, thereby improving the releasability of the mold and the molded article with respect to each other. A glass blank (1) is subjected to ashing with an oxygen plasma so as to remove organic dirt attached to the glass blank (1). Then, plasma cleaning with an argon plasma is effected so as to remove inorganic dirt attached to the glass blank (1). Thereafter, the glass blank (1) is subjected to methane plasma processing such that a carbon film (2) having a thickness of less than 50 angstroms is formed on the surface of the glass blank (1) from which the dirt has been removed.

摘要翻译： 在通过压制成型从其制造光学元件的玻璃坯料的表面上形成脱模膜的方法中，形成厚度小于50埃，优选小于10埃的碳膜， 从而提高了模具和模制品相对于彼此的脱模性。 玻璃坯料（1）用氧等离子体进行灰化，以除去附着在玻璃坯料（1）上的有机污垢。 然后，进行氩等离子体的等离子体清洗，以除去附着在玻璃坯料（1）上的无机污垢。 此后，对玻璃坯料（1）进行甲烷等离子体处理，使得在去除了污物的玻璃坯料（1）的表面上形成厚度小于50埃的碳膜（2）。

公开(公告)号：US5643365A

公开(公告)日：1997-07-01

申请号：US686464

申请日：1996-07-25

申请人： L. M. Blinov ,  W. Neuberger ,  V. V. Pavlov

发明人： L. M. Blinov ,  W. Neuberger ,  V. V. Pavlov

IPC分类号： C03C17/22 ,  C23C16/26 ,  C23C16/511 ,  H01J37/32 ,  C23C16/00

CPC分类号： H01J37/32229 ,  C03C17/22 ,  C23C16/511 ,  H01J37/32284 ,  H01J37/32357 ,  C03C2217/282 ,  C03C2218/153

摘要： A method and apparatus for efficiently depositing a dielectric film with a preselected thickness pattern, in particular, a homogeneous, uniform diamond or diamond-like film, on large area substrates through the use of opposing plasma torches and linearly superimposing of microwave modes within the reaction chamber creating and maintaining an extended linear plasma in close proximity to the substrate surfaces and utilizing laminar flow of the reactant gases in the plasma and over the surfaces. Substrate surfaces can be moved past the opposing torches permitting the coating of large area, rectangularly-shaped substrate surfaces in a simple manner. Alternatively, the plasma horn or horns can be moved across the substrate permitting coating of large area, rectangularly-shaped substrate surfaces.

摘要翻译： 一种用于通过使用相对的等离子体炬和在反应中线性叠加微波模式来在大面积衬底上有效地沉积具有预选厚度图案的电介质膜，特别是均匀的均匀的金刚石或类金刚石膜的方法和装置 在室内产生和维持延伸的线性等离子体，其接近基板表面并且利用等离子体中和表面上的反应物气体的层流。 基板表面可以移动通过相对的焊炬，允许以简单的方式涂覆大面积的矩形基板表面。 或者，等离子体喇叭或喇叭可以移动穿过基板，允许涂覆大面积的矩形形状的基板表面。

公开(公告)号：US5009920A

公开(公告)日：1991-04-23

申请号：US502348

申请日：1990-03-30

申请人： James C. Lee

发明人： James C. Lee

IPC分类号： G02B5/28 ,  B05D7/24 ,  C03C17/09 ,  C23C16/50 ,  C23C16/509 ,  G02B1/10

CPC分类号： B05D1/62 ,  C23C16/509 ,  C03C2217/229 ,  C03C2218/153

摘要： Precision multilayer optical interference coating of substrates having complex topology using complementary shaped electrodes and plasma enhanced chemical vapor deposition within a chamber. The materials for the optical quality thin films are obtained from starting reactants of the form M-R where M denotes a metal atom and R denotes an organic component. These vapor phase starting reactants are brought into a reactive atmosphere of the chamber through a plurality of orifices in one of the shaped electrodes. The resulting substances are deposited as thin films upon the substrates with inherently superior scatter loss performance because of the low temperature nature and simple direct vapor-to-solid phase transformation path of the process.

公开(公告)号：US4661409A

公开(公告)日：1987-04-28

申请号：US797635

申请日：1985-11-13

申请人： Jorg Kieser ,  Michael Neusch

发明人： Jorg Kieser ,  Michael Neusch

IPC分类号： C23C16/50 ,  C03C17/22 ,  C23C16/02 ,  C23C16/26 ,  C23C16/511 ,  H01L23/29 ,  B32B9/00 ,  C01B31/00

CPC分类号： C23C16/511 ,  C03C17/22 ,  C23C16/0272 ,  C23C16/26 ,  H01L23/29 ,  C03C2217/282 ,  C03C2218/153 ,  H01L2924/0002 ,  Y10T428/30 ,  Y10T428/31645 ,  Y10T428/31663 ,  Y10T428/31696

摘要： A method for producing amorphous carbon coatings on substrates by degrading a gaseous hydrocarbon compound in an ionized gas atmosphere within a reaction chamber. An electromagnetic alternating field is used for the excitation of the plasma. To achieve the object of increasing the deposition rate and permitting substrates even of great surface area to be uniformly coated, the frequency of the electromagnetic alternating field is selected in the microwave region (915 to 2,540 MHz). Furthermore, the microwave energy is put into the gaseous atmosphere by means of at least one ladder-type waveguide situated outside of the reaction chamber. The invention also relates to a substance provided with an amorphous carbon coating, in which an adhesion-mediating coating consisting of a polymer from the group of the siloxanes or silazanes is provided between the substrate and the amorphous carbon coating.

摘要翻译： 一种通过在反应室内的电离气体气氛中降解气态烃化合物来在基底上生产无定形碳涂层的方法。 电磁场用于等离子体的激发。 为了实现提高沉积速率并允许均匀涂覆大面积的基板的目的，在微波区域（915-2,540MHz）中选择电磁交变场的频率。 此外，通过位于反应室外部的至少一个梯形波导将微波能量放入气体气氛中。 本发明还涉及具有无定形碳涂层的物质，其中在基体和无定形碳涂层之间提供由来自硅氧烷或硅氮烷的聚合物组成的粘附介质涂层。

公开(公告)号：US20240246812A1

公开(公告)日：2024-07-25

申请号：US18564996

申请日：2022-06-22

申请人： UNIVERSITY OF WASHINGTON

发明人： Bo Zhang ,  Todd Anderson ,  Chris McAllister

IPC分类号： B81C1/00 ,  B81B7/00 ,  C03C15/00 ,  C03C17/22 ,  C03C17/245 ,  C23C16/02 ,  C23C16/34 ,  C23C16/40 ,  C23C16/50 ,  C23C16/56 ,  G01N33/487

CPC分类号： B81C1/00341 ,  B81B7/00 ,  C03C15/00 ,  C03C17/225 ,  C03C17/245 ,  C23C16/0227 ,  C23C16/345 ,  C23C16/401 ,  C23C16/50 ,  C23C16/56 ,  G01N33/48721 ,  B81B2203/0127 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/0176 ,  B81C2201/019 ,  C03C2218/152 ,  C03C2218/153 ,  C03C2218/32

摘要： An ultrathin free-standing solid state membrane, including an etched well on a glass wafer, and a layer of SiX deposited on a backside of the etched well on the glass wafer.