公开(公告)号：US06777675B2

公开(公告)日：2004-08-17

申请号：US10126943

申请日：2002-04-18

Applicant: N. William Parker ,  Edward M. Yin ,  Frank Ching-Feng Tsai

Inventor： N. William Parker ,  Edward M. Yin ,  Frank Ching-Feng Tsai

IPC: H01J37244

CPC classification number: H01J37/244 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/057

Abstract: An electron beam column incorporating an asymmetrical detector optics assembly provides improved secondary electron collection. The electron beam column comprises an electron gun, an accelerating region, scanning deflectors, focusing lenses, secondary electron detectors and an asymmetrical detector optics assembly. The detector optics assembly comprises a field-free tube, asymmetrical with respect to the electron optical axis; the asymmetry can be introduced by offsetting the field-free tube from the electron optical axis or by chamfering the end of the tube. In other embodiments the detector optics assembly comprises a field-free tube and a voltage contrast plate, either or both of which are asymmetrical with respect to the electron optical axis.

Abstract translation: 包含不对称检测器光学组件的电子束柱提供改进的二次电子收集。 电子束柱包括电子枪，加速区，扫描偏转器，聚焦透镜，二次电子检测器和不对称检测器光学组件。 检测器光学组件包括相对于电子光轴不对称的无磁场管; 可以通过将无场磁管与电子光轴偏移或通过倒角管的端部来引入不对称性。 在其他实施例中，检测器光学组件包括无磁场管和电压对比板，其中一个或两个对于电子光轴是不对称的。

公开(公告)号：US20030205683A1

公开(公告)日：2003-11-06

申请号：US10210124

申请日：2002-07-31

Inventor： Victor M. Benveniste

IPC: H01J037/317

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/08 ,  H01J2237/0835 ,  H01J2237/31701

Abstract: Ion implantation systems and beamlines therefor are disclosed, in which a ribbon beam of a relatively large aspect ratio is mass analyzed and collimated to provide a mass analyzed ribbon beam for use in implanting one or more workpieces. The beamline system comprises two similar magnets, where the first magnet mass analyzes the ribbon beam to provide an intermediate mass analyzed ion beam, and the second magnet collimates the intermediate beam to provide a uniform mass analyzed ribbon beam to an end station. The symmetrical system provides equidistant beam trajectories for ions across the elongated beam width so as to mitigate non-linearities in the beam transport through the system, such that the resultant mass analyzed beam is highly uniform.

Abstract translation: 公开了离子注入系统和其束线，其中质量分析和准直以提供质量分析的带状束，用于植入一个或多个工件。 束线系统包括两个类似的磁体，其中第一磁体质量分析带状束以提供中间质量分析离子束，并且第二磁体准直中间光束，以向终端站提供均匀质量分析的带状束。 对称系统为细长波束宽度上的离子提供等距离的波束轨迹，以便减轻通过系统的波束传输中的非线性，使得所得到的质量分析波束高度均匀。

公开(公告)号：US06635883B2

公开(公告)日：2003-10-21

申请号：US09727810

申请日：2000-12-01

Applicant: Richard P. Torti ,  Jerald P. Dykstra

Inventor： Richard P. Torti ,  Jerald P. Dykstra

IPC: H01J4926

CPC classification number: H01J49/0422 ,  H01J27/026 ,  H01J37/05 ,  H01J49/10 ,  H01J2237/0812 ,  H05H7/04

Abstract: Incorporating the use of a permanent magnet within a GCIB apparatus to separate undesirable monomer ions from a gas cluster ion beam to facilitate improved processing of workpieces. In an alternate embodiment, the effect of the permanent magnet may be controlled by the use of an electrical coil. The above system eliminates problems related to power consumption and heat generation.

Abstract translation: 在GCIB装置中结合使用永磁体，以将不期望的单体离子与气体团簇离子束分离，以促进工件的改进处理。 在替代实施例中，永磁体的作用可以通过使用电线圈来控制。 上述系统消除了与功耗和发热有关的问题。

公开(公告)号：US20030098414A1

公开(公告)日：2003-05-29

申请号：US10258486

申请日：2002-10-25

Inventor： Stephan Uhlemann ,  Maximilian Haider

IPC: H01J037/05

CPC classification number: H01J37/05 ,  H01J49/46 ,  H01J2237/2602 ,  H01J2237/2823

Abstract: The invention relates to an electron/ion gun for electron or ion beams, comprising a beam source and a monochromator. According to the invention, said monochromator is equipped with an additional beam guidance system and a switchover element which conveys the particles coming from the beam source to either the monochromator or the rest of the beam guidance system is provided at the input of the monochromator.

Abstract translation: 本发明涉及一种用于电子或离子束的电子/离子枪，包括光束源和单色仪。 根据本发明，所述单色仪配备有附加的光束引导系统和将来自光束源的粒子传送到单色仪或光束引导系统的其余部分的切换元件设置在单色仪的输入端。

公开(公告)号：US20030030008A1

公开(公告)日：2003-02-13

申请号：US10191804

申请日：2002-07-10

Inventor： Hirosi Sobukawa ,  Yoshikazu Sugiyama

IPC: G21K001/08

CPC classification number: H01J37/1472 ,  H01J37/05 ,  H01J2237/1508 ,  H01J2237/24592

Abstract: A charged particle beam control system wherein electrodes and magnetic poles can be positioned accurately and easily is provided, together with a charged particle beam optical apparatus and a charged particle beam defect inspection apparatus, which use the charged particle beam control system. A part of a ceramic material is coated with a metal to form a pair of mutually opposing electrodes, and a pair of magnetic poles perpendicularly intersecting the pair of electrodes are provided to construct a Wien filter A. Side surfaces are formed on portions of the electrodes that are not coated with the metal, and first positioning surfaces are formed on the magnetic poles. The electrodes and the magnetic poles are positioned relative to each other by bringing the side surfaces and the positioning surfaces into abutting contact with each other, thereby allowing the electrodes and the magnetic poles to be positioned.

Abstract translation: 与使用带电粒子束控制系统的带电粒子束光学装置和带电粒子束缺陷检查装置一起，提供电极和磁极可以准确且容易地定位的带电粒子束控制系统。 陶瓷材料的一部分涂覆有金属以形成一对相互相对的电极，并且提供与该对电极垂直相交的一对磁极以构成维恩滤波器A.侧表面形成在电极的部分上 没有涂覆金属，第一定位面形成在磁极上。 电极和磁极通过使侧面和定位面彼此抵接而相对于彼此定位，从而允许电极和磁极定位。

公开(公告)号：US06495826B2

公开(公告)日：2002-12-17

申请号：US09832298

申请日：2001-04-10

Applicant: Katsushige Tsuno

Inventor： Katsushige Tsuno

IPC: H01J4948

CPC classification number: H01J37/05

Abstract: A monochrometer mounted with the electron gun of an electron microscope or the like. This monochrometer does not need movement of a slit. An electron source consisting of any one of a thermal emission-type electron source (such as an LaB6 electron source or a tungsten hairpin), a Schottky emission-type electron source, and a tunneling field emission-type electron source is used. The slit is made of a single metal plate and mounted in position fixedly. Electrons are emitted from the electron source and dispersed within a plane including the slit according to energies. The slit is so positioned that it passes only those of the dispersed electrons which have energies close to the peak energy and blocks electrons having energies higher or lower than the peak energy.

Abstract translation: 安装有电子显微镜等的电子枪的单色仪。 这种单色仪不需要狭缝的移动。 使用由热发射型电子源（例如LaB 6电子源或钨发夹）中的任一种，肖特基型发射型电子源和隧道场致发射型电子源构成的电子源。 狭缝由单个金属板制成并固定在一起。 电子从电子源发射并分散在根据能量的包括狭缝的平面内。 狭缝的定位使得其仅通过具有接近峰值能量的能量的分散电子的那些，并且阻挡具有高于或低于峰值能量的能量的电子。

公开(公告)号：US06410924B1

公开(公告)日：2002-06-25

申请号：US09440985

申请日：1999-11-16

Applicant: Li Wang

Inventor： Li Wang

IPC: H01J4948

CPC classification number: H01J49/466 ,  H01J37/05 ,  H01J37/153 ,  H01J2237/303

Abstract: The resolution of a charged particle beam, such as a focused ion beam (FIB), is optimized by providing an energy filter in the ion beam stream. The energy filter permits ions having a desired energy range to pass while dispersing and filtering out any ions outside the desired energy range. By reducing the energy spread of the ion beam, the chromatic aberration of the ion beam is reduced. Consequently, the current density of the ion beam is increased. The energy filter may be, e.g., a Wien type filter that is optimized as an energy filter as opposed to a mass filter. For example, to achieve useful dispersion the energy filter may use a quadrupole structure between two magnetic pole pieces thereby producing a combined quadrupole electric field and dipole electric field within a magnetic field.

Abstract translation: 通过在离子束流中提供能量过滤器来优化带电粒子束（例如聚焦离子束（FIB））的分辨率。 能量过滤器允许具有期望能量范围的离子通过，同时分散和滤出任何离开所需能量范围之外的离子。 通过减小离子束的能量扩散，离子束的色差减小。 因此，离子束的电流密度增加。 能量过滤器可以是例如与质量过滤器相反优化为能量过滤器的维恩型过滤器。 例如，为了实现有用的分散，能量过滤器可以在两个磁极片之间使用四极结构，从而在磁场内产生组合的四极电场和偶极电场。

公开(公告)号：US06407384B1

公开(公告)日：2002-06-18

申请号：US09610126

申请日：2000-07-05

Applicant: Michiyoshi Tanaka ,  Masami Terauchi ,  Katsushige Tsuno ,  Toshikazu Honda

Inventor： Michiyoshi Tanaka ,  Masami Terauchi ,  Katsushige Tsuno ,  Toshikazu Honda

IPC: H01J4944

CPC classification number: H01J37/05

Abstract: There is disclosed an energy filter capable of reducing the Boersch effect. Also, an electron microscope using this energy filter is disclosed. This energy filter is composed of a first-stage energy filter and a second-stage energy filter arranged along the optical axis of an electron beam. The length L1 of the first-stage filter is selected to be greater than the length L2 of the second-stage filter. An energy-selecting slit is positioned in the electron beam path within the free space between the first- and second-stage filters. Each of these two stages of filters is a Wien filter having mutually perpendicular electric and magnetic fields.

Abstract translation: 公开了能够降低Boersch效应的能量过滤器。 此外，公开了使用该能量过滤器的电子显微镜。 该能量滤波器由沿着电子束的光轴布置的第一级能量滤波器和第二级能量滤波器组成。 第一级滤波器的长度L1被选择为大于第二级滤波器的长度L2。 能量选择狭缝位于第一和第二级过滤器之间的自由空间内的电子束路径中。 这两级滤波器中的每一个都是具有相互垂直的电场和磁场的维恩滤波器。

公开(公告)号：US20020043621A1

公开(公告)日：2002-04-18

申请号：US09736253

申请日：2000-12-15

Inventor： Derek Aitken

IPC: H01J049/00 ,  B01D059/44

CPC classification number: H01J49/06 ,  H01J37/05 ,  H01J37/3171 ,  H01J49/322 ,  H01J2237/055 ,  H01J2237/057

Abstract: The present invention provides an apparatus for acting upon charge particles in dependence upon on or more parameters including mass and/or energy and/or charged state of the particles. The apparatus includes an array of elongate magnetic poles extending longitudinally in an elongation direction of the array; an array reference surface extending in the array elongation direction and passing through the array with a magnetic pole on each side of the reference surface; a means for providing charged particles entering into or originating in the field of the magnetic pole array. The magnetic poles are configured in a plane perpendicular to the elongation direction to give parameter dependent change of direction to charged particles moving in array with a direction of movement substantially parallel to the reference surface, whereby parameter dependent selection of charged particles may be achieved by parameter dependent dispersion in a plane transverse to the reference surface.

Abstract translation: 本发明提供一种用于根据或多个参数（包括颗粒的质量和/或能量和/或带电状态）作用于电荷颗粒的装置。 该装置包括沿阵列的伸长方向纵向延伸的细长磁极阵列; 在所述阵列延伸方向上延伸并且在所述基准面的每一侧上通过所述阵列的阵列参考面; 用于提供进入或源自磁极阵列领域的带电粒子的装置。 磁极被配置在垂直于伸长方向的平面中，以使得与带电粒子的方向相关的参数相关的变化使得阵列中的移动方向基本上平行于参考表面，从而参数依赖性地选择带电粒子可以通过参数 在垂直于参考表面的平面中的依赖性色散。

公开(公告)号：US6111253A

公开(公告)日：2000-08-29

申请号：US143288

申请日：1998-08-28

Applicant: Katsushige Tsuno

Inventor： Katsushige Tsuno

IPC: H01J37/05 ,  H01J37/26 ,  H01J49/00

CPC classification number: H01J37/26 ,  H01J37/05 ,  H01J2237/047

Abstract: A transmission electron microscope that produces a monochromated electron beam and thus has improved spatial resolution. This microscope has a retarding monochromator mounted between the first anode (extraction electrode) of a field emission gun (FEG) and the second anode. The monochromator includes a decelerating portion, a Wien filter and an accelerating portion. An exit slit is so positioned that this exit slit and the object plane of the monochromator are symmetrical with respect to the center of the Wien filter. The beam extracted by the cathode of the gun is monochromated by the monochromator and so the chromatic aberrations can be improved. Consequently, the spatial resolution can be improved.

Abstract translation: 透射电子显微镜，其产生单色电子束，因此具有改善的空间分辨率。 该显微镜具有安装在场发射枪（FEG）的第一阳极（引出电极）和第二阳极之间的延迟单色仪。 单色器包括减速部分，维恩滤波器和加速部分。 出口狭缝被定位成使得该出口狭缝和单色仪的物平面相对于维恩过滤器的中心对称。 由枪的阴极提取的光束由单色器单色，因此可以改善色像差。 因此，可以提高空间分辨率。