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    Method and its apparatus for inspecting defects
    91.
    发明授权
    Method and its apparatus for inspecting defects 有权
    检查缺陷的方法及其装置

    公开(公告)号：US07599545B2

    公开(公告)日：2009-10-06

    申请号：US10893988

    申请日：2004-07-20

    申请人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

    发明人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

    IPC分类号： G06K9/00 ,  H04N7/18

    CPC分类号： G01N21/9501 ,  G01N21/13 ,  G01N21/8806 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/154 ,  G01N2021/8825 ,  G01N2021/9513

    摘要： The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.

    摘要翻译： 本发明涉及一种适用于图案精细化的高灵敏度检测方法和装置，其中使用以下技术提高了缺陷检查灵敏度：通过填充物镜30与物镜30之间的间隙来提高检测光学系统的分辨率。 样品1，具有液体，并且增加有效NA（数值孔径）; 并且当在样品的表面上形成透明的层间绝缘膜时，抑制液体与绝缘膜之间的界面处的振幅分裂，以减少由于薄膜的干扰引起的光学图像在亮度上的不均匀性，由 将物镜与样品之间的间隙浸入折射率接近于透明膜的液体。

    PATTERN INSPECTION METHOD AND ITS APPARATUS
    92.
    发明申请
    PATTERN INSPECTION METHOD AND ITS APPARATUS 审中-公开

    公开(公告)号：US20090169093A1

    公开(公告)日：2009-07-02

    申请号：US12393848

    申请日：2009-02-26

    申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

    发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.

    APPARATUS OF INSPECTING DEFECT IN SEMICONDUCTOR AND METHOD OF THE SAME
    93.
    发明申请
    APPARATUS OF INSPECTING DEFECT IN SEMICONDUCTOR AND METHOD OF THE SAME 失效
    检查半导体缺陷的设备及其方法

    公开(公告)号：US20090153848A1

    公开(公告)日：2009-06-18

    申请号：US12349373

    申请日：2009-01-06

    申请人： Akira Hamamatsu ,  Shunji Maeda ,  Hisae Shibuya

    发明人： Akira Hamamatsu ,  Shunji Maeda ,  Hisae Shibuya

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956

    摘要： When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.

    摘要翻译： 当通过现有技术的缺陷检查装置获得越来越小型化的图案的缺陷的尺寸时，不方便地给出不同于SEM的相同缺陷的测量值的值。 因此，需要精确地计算由缺陷检查装置检测到的缺陷的尺寸值，以近似于通过SEM测量的值。 为此，由缺陷检查装置检测到的缺陷的尺寸根据缺陷的特征量或类型进行修正，从而可以精确地计算缺陷尺寸。

    Apparatus And Method For Inspecting Defects
    94.
    发明申请
    Apparatus And Method For Inspecting Defects 有权
    检查缺陷的装置和方法

    公开(公告)号：US20090122303A1

    公开(公告)日：2009-05-14

    申请号：US12328357

    申请日：2008-12-04

    申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    IPC分类号： G01N21/88

    CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

    摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

    摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

    Defect inspection apparatus and its method
    96.
    发明申请
    Defect inspection apparatus and its method 有权
    缺陷检查装置及其方法

    公开(公告)号：US20090027664A1

    公开(公告)日：2009-01-29

    申请号：US12153853

    申请日：2008-05-27

    申请人： Akira Hamamatsu ,  Hisae Shibuya ,  Shunji Maeda

    发明人： Akira Hamamatsu ,  Hisae Shibuya ,  Shunji Maeda

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N2021/8822

    摘要： In a defect inspection apparatus for performing an inspection with an optical system, the dimension of a defect is measured substantially concurrently with detection of the defect. In order to promote the accuracy of measurement of the defect dimension, a collation unit is provided which collates the defect dimension by using a standard sample such as a standard grain.

    摘要翻译： 在用光学系统进行检查的缺陷检查装置中，在检测缺陷的同时测量缺陷的尺寸。 为了提高缺陷尺寸的测量精度，提供了一种对照单元，其通过使用诸如标准晶粒的标准样品来校正缺陷尺寸。

    Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections
    99.
    发明授权
    Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections 有权
    图像对准方法，比较检查方法和比较检查比较检查装置

    公开(公告)号：US07333677B2

    公开(公告)日：2008-02-19

    申请号：US11586203

    申请日：2006-10-24

    申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

    发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

    IPC分类号： G06K9/32

    CPC分类号： G06T7/001 ,  G01N21/95607 ,  G03F1/84 ,  G06T7/32 ,  G06T2207/30148

    摘要： The present invention provides a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences. In one embodiment an inspection image and a reference image are divided into multiple regions. An offset is calculated for each pair of sub-images. Out of these multiple offsets, only the offsets with high reliability are used to determine an offset for the entire image. This allows high-precision alignment with little or no dependency on pattern density or shape, differences in luminance between images, and uneven luminance within individual images. Also, detection sensitivity is adjusted as necessary by monitoring alignment precision.

    摘要翻译： 本发明提供了一种用于检查的高精度对准方法，装置和代码，其将检查图像与参考图像进行比较，并从其差异中检测缺陷。 在一个实施例中，检查图像和参考图像被分成多个区域。 为每对子图像计算偏移量。 在这些多个偏移量中，仅使用具有高可靠性的偏移量来确定整个图像的偏移。 这允许对图案密度或形状几乎或不依赖的高精度对准，图像之间的亮度差异以及各个图像内的不均匀亮度。 此外，通过监视对准精度，根据需要调整检测灵敏度。