发明授权
- 专利标题: Method and equipment for detecting pattern defect
- 专利标题(中): 检测图案缺陷的方法和设备
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申请号: US11593091申请日: 2006-11-06
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公开(公告)号: US07456963B2公开(公告)日: 2008-11-25
- 发明人: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- 申请人: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP10-372769 19981228; JP11-262997 19990917
- 主分类号: G01J4/00
- IPC分类号: G01J4/00
摘要:
An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
公开/授权文献
- US20070052955A1 Method and equipment for detecting pattern defect 公开/授权日:2007-03-08
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