-
91.发明授权Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets 有权主动干燥站和采用两气体出口之间的气体供应气体排出浸渍液的方法公开(公告)号：US08638415B2
公开(公告)日：2014-01-28
申请号：US12567617
申请日：2009-09-25
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , B05C9/12 , G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
摘要翻译： 公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。
-
92.发明授权Methods relating to immersion lithography and an immersion lithographic apparatus 有权涉及浸没式光刻和浸没式光刻设备的方法公开(公告)号：US08587762B2
公开(公告)日：2013-11-19
申请号：US12237557
申请日：2008-09-25
申请人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
发明人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
CPC分类号： G03F7/70916 , G03F7/70341
摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.
摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。
-
公开(公告)号：US08558989B2
公开(公告)日：2013-10-15
申请号：US12850472
申请日：2010-08-04
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
-
公开(公告)号：US08482845B2
公开(公告)日：2013-07-09
申请号：US12698932
申请日：2010-02-02
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
-
公开(公告)号：US20130057841A1
公开(公告)日：2013-03-07
申请号：US13544656
申请日：2012-07-09
IPC分类号： G03B27/54
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/709
摘要： A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
-
96.发明授权公开(公告)号：US08319939B2
公开(公告)日：2012-11-27
申请号：US12289591
申请日：2008-10-30
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
摘要翻译： 浸没式光刻在基材曝光完成后，检测器用于检测残留在基片和/或基片台上的任何残留液体。
-
公开(公告)号：US20120257178A1
公开(公告)日：2012-10-11
申请号：US13285583
申请日：2011-10-31
申请人： Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人： Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
-
98.发明申请公开(公告)号：US20120229786A1
公开(公告)日：2012-09-13
申请号：US13416387
申请日：2012-03-09
申请人： Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
发明人： Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
IPC分类号： G03B27/54
CPC分类号： G03F7/705 , G03F7/70091 , G03F7/70616
摘要： A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
摘要翻译： 一种控制光刻设备的方法，所述方法包括设置光刻设备的照明系统以实现选择的照明模式，测量光刻设备的第一参数的值，计算投影图像的第二参数的值 使用光刻设备的模型和第一参数的测量值具有多个特征的测试图案的特征，以及参考所计算的第二参数的值来控制光刻设备。
-
公开(公告)号：US08259289B2
公开(公告)日：2012-09-04
申请号：US12493592
申请日：2009-06-29
CPC分类号： G03F7/70341
摘要： In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.
摘要翻译： 在无光掩模光刻中，单个衬底的扫描通常比常规光刻中慢得多。 描述了将浸没式光刻技术应用于无光掩模光刻中的解决方案，并且特别地提供了一种或多种解决方案，以减少在成像期间浸没液体与衬底的顶表面的任何给定部分接触的时间量。
-
100.发明授权Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method 有权液体填充透镜元件，包括这种元件的光刻设备和器件制造方法公开(公告)号：US08237912B2
公开(公告)日：2012-08-07
申请号：US13043192
申请日：2011-03-08
申请人： Herman Boom , Borgert Kruizinga , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Huibert Visser , Peter Julian Pollard
发明人： Herman Boom , Borgert Kruizinga , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Huibert Visser , Peter Julian Pollard
IPC分类号： G03B27/52
CPC分类号： G03B27/522 , G03F7/70341 , G03F7/70808 , G03F7/70958
摘要： A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.
摘要翻译： 用于投影系统的透镜元件包括凹面。 透镜元件还包括膜和喷嘴，所述膜至少覆盖透镜元件的凹面。 喷嘴布置成用于在凹面和膜之间提供和/或去除液体和/或气体。
-
-
-
-
-
-
-
-
-
搜索结果
213 条记录 (耗时 0.036 秒)
