公开(公告)号：US07803516B2

公开(公告)日：2010-09-28

申请号：US11601777

申请日：2006-11-20

申请人： Hiroyuki Nagasaka

发明人： Hiroyuki Nagasaka

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： An exposure method for exposing a predetermined area on a substrate includes an operation for executing first exposure for the predetermined area by forming a liquid immersion area of a first liquid on the substrate, and an operation for executing second exposure for the predetermined area by forming a liquid immersion area of a second liquid different from the first liquid, on the substrate on which the first exposure has been executed, wherein the surface state of the substrate in the second exposure is allowed to differ from the surface state of the substrate in the first exposure. Even when the substrate is subjected to the first exposure and the second exposure by using the liquid immersion method, then the liquid immersion area of the liquid can be satisfactorily formed on the substrate in each of the exposure processes, and the substrate can be exposed satisfactorily.

摘要翻译： 用于暴露基板上的预定区域的曝光方法包括：通过在基板上形成第一液体的浸液区域，以及通过形成预定区域来执行第二曝光的操作来执行用于预定区域的第一曝光的操作 在与已经执行了第一曝光的基板上的第一液体不同的第二液体的液浸区域，其中允许第二曝光中的基板的表面状态与第一曝光中的基板的表面状态不同， 曝光。 即使使用浸液法对基板进行第一次曝光和第二次曝光，也可以在每个曝光工序中在基板上令人满意地形成液体的液浸区域，并且能够令人满意地曝光基板 。

公开(公告)号：US20100157262A1

公开(公告)日：2010-06-24

申请号：US12659066

申请日：2010-02-24

申请人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

发明人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.

公开(公告)号：US07705968B2

公开(公告)日：2010-04-27

申请号：US10594963

申请日：2006-03-20

申请人： Hiroyuki Nagasaka ,  Tomoharu Fujiwara

发明人： Hiroyuki Nagasaka ,  Tomoharu Fujiwara

IPC分类号： G03B27/58 ,  G03B27/52 ,  G03B27/42

CPC分类号： H01L21/68735 ,  G03F7/11 ,  G03F7/70341 ,  G03F7/707 ,  H01L21/68714 ,  H01L21/6875 ,  H01L21/68757

摘要： A substrate holder PH includes a first holder PH1 which holds a substrate P, a liquid-repellent inner surface Tc of a plate member T which faces a side surface Pc of the substrate P held on the first holder PH1 via a predetermined gap A, and a chamfered portion C provided on an upper portion of the inner surface Tc. On the side surface Pc of the substrate P, a liquid-repellent area is provided, and the chamfered portion C is provided so as to face the liquid-repellent area of the substrate P held on the first holder PH1. Thereby, a substrate holding device which can restrain inflow of the liquid into the back surface side of the substrate is provided.

摘要翻译： 衬底保持器PH包括保持衬底P的第一保持器PH1，经由预定间隙A与板构件T相对于保持在第一保持器PH1上的衬底P的侧表面Pc面向的液体排斥内表面Tc，以及 设置在内表面Tc的上部的倒角部C. 在基板P的侧面Pc上设置防液区域，并且设置倒角部分C，以面对保持在第一保持器PH1上的基板P的拒水区域。 由此，设置能够抑制液体流入基板的背面侧的基板保持装置。

公开(公告)号：US20090153820A1

公开(公告)日：2009-06-18

申请号：US12320771

申请日：2009-02-04

申请人： Hiroyuki Nagasaka ,  Takeshi Okuyama

发明人： Hiroyuki Nagasaka ,  Takeshi Okuyama

IPC分类号： G03B27/42

CPC分类号： G03F7/70883 ,  G03F7/70341

摘要： An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas.

摘要翻译： 曝光装置通过在基板上形成液浸区域来露出基板，并通过投影光学系统和形成液浸区域的液体将图案图像投影到基板上。 曝光装置包括具有多个光学元件的投影光学系统，通过该投影光学系统，通过液体将图案图像投影到基板上以露出基板，以及与气体一起回收液体的液体回收系统，并且具有分离器 分离回收的液体和回收的气体。

公开(公告)号：US20090015816A1

公开(公告)日：2009-01-15

申请号：US12232064

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US20080316453A1

公开(公告)日：2008-12-25

申请号：US12222583

申请日：2008-08-12

申请人： Hiroyuki Nagasaka

发明人： Hiroyuki Nagasaka

IPC分类号： G03B27/42 ,  G03F7/20 ,  G03B27/74

CPC分类号： G03F7/70466 ,  G03F7/7005 ,  G03F7/70275 ,  G03F7/70283 ,  G03F9/7088

摘要： An exposure apparatus includes an optical system irradiating a first exposure light from a first pattern and a second exposure light from a second pattern onto a first exposure area and second exposure area respectively to form an image of the first pattern and an image of the second pattern on the first and exposing areas respectively; a light receiving device receiving a detecting light via at least a part of the optical system; and a detection system obtaining, in parallel to at least a part of an operation of multiple-exposing a predetermined area on a substrate with the images of first and second patterns, informations about a positional relationship between the image of the first pattern and the substrate and a positional relationship between the image of the second pattern and the substrate via at least a part of the optical system. The substrate can be efficiently well multi-exposed.

摘要翻译： 曝光装置包括：光学系统，将来自第一图案的第一曝光光和第二图案的第二曝光光分别照射到第一曝光区域和第二曝光区域上，以形成第一图案的图像和第二图案的图像 分别在第一和暴露地区; 光接收装置，经由所述光学系统的至少一部分接收检测光; 以及检测系统，与第一和第二图案的图像对基板上的预定区域进行多次曝光的操作的至少一部分并行获得关于第一图案的图像与基板之间的位置关系的信息 以及经由至少一部分光学系统的第二图案的图像与基板之间的位置关系。 底物可以有效地良好地多曝光。

公开(公告)号：US07453550B2

公开(公告)日：2008-11-18

申请号：US11826624

申请日：2007-07-17

申请人： Hiroyuki Nagasaka ,  Soichi Owa ,  Yasugumi Nishii

发明人： Hiroyuki Nagasaka ,  Soichi Owa ,  Yasugumi Nishii

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

摘要： An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, a liquid recovery mechanism which recovers the liquid on the substrate at a liquid recovery position apart from the projection area, and a trap member which is arranged outside the liquid recovery position of the liquid recovery mechanism with respect to the projection area and which is formed with a liquid trap surface for capturing the liquid.

摘要翻译： 曝光装置通过将预定图案的图像通过液体投影到基板上来曝光基板。 曝光装置包括将图案的图像投影到基板上的投影光学系统，将液体供给到基板上以在基板的一部分上形成液浸区域的液体供给机构，该液浸区域包括投影光学部 系统，液体回收机构，其在离开投影区域的液体回收位置处回收基板上的液体;以及捕集部件，其相对于投影区域布置在液体回收机构的液体回收位置的外侧， 形成有用于捕获液体的液体捕获表面。

公开(公告)号：US20080266533A1

公开(公告)日：2008-10-30

申请号：US11597745

申请日：2005-06-09

申请人： Hiroyuki Nagasaka ,  Takeshi Okuyama

发明人： Hiroyuki Nagasaka ,  Takeshi Okuyama

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085

摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

摘要翻译： 曝光装置通过投影光学系统和液体用曝光光照射基板来曝光基板。 曝光装置设置有用于供给液体并回收液体的浸液机构。 浸液机构具有与基板的表面相对的倾斜面，并且相对于基板的表面倾斜，并且在倾斜面上形成有液浸机构的液体回收口。 在基板和投影光学系统之间设置平坦部分。 液浸区域可以保持较小。

公开(公告)号：US20080231824A1

公开(公告)日：2008-09-25

申请号：US12149782

申请日：2008-05-08

申请人： Hiroyuki Nagasaka

发明人： Hiroyuki Nagasaka

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus comprises a recovery member that recover a liquid. The recovery ability with which the recovery member recovers the liquid differs in accordance with the region of the recovery member.

摘要翻译： 曝光装置包括回收液体的回收构件。 回收构件回收液体的回收能力根据回收构件的区域而不同。

公开(公告)号：US07379157B2

公开(公告)日：2008-05-27

申请号：US11325654

申请日：2006-01-05

申请人： Hiroyuki Nagasaka

发明人： Hiroyuki Nagasaka

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the substrate, includes a liquid supply mechanism having supply ports for supplying the liquid on both sides of a projection area respectively and capable of simultaneously supplying the liquid from the supply ports, the image of the pattern being projected onto the projection area. The liquid supply mechanism supplies the liquid from only one of the supply ports disposed on the both sides when the mechanism starts to supply the liquid. The liquid may be supplied while moving an object such as a substrate placed to face the projection optical system. Accordingly, an optical path space on the image side of the projection optical system can be filled with the liquid quickly while suppressing formation of air bubbles.

摘要翻译： 通过投影光学系统和形成在基板上的液浸区域的液体将图案的图像投影到基板上而曝光基板的曝光装置包括具有用于将液体供给的供给口的液体供给机构 并且能够同时从供给口供给液体，将图案的图像投影到投影区域上。 当机构开始供应液体时，液体供给机构仅从设置在两侧的供给口中的一个供应液体。 可以在移动诸如放置在面对投影光学系统的基板的物体的同时供应液体。 因此，能够在抑制气泡的形成的同时快速地填充投影光学系统的像侧的光路空间。