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公开(公告)号:US20240014243A1
公开(公告)日:2024-01-11
申请号:US18295966
申请日:2023-04-05
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minho Jang , Doowon Kwon , Kyungtae Lim , Donghyun Kim
IPC: H01L27/146
CPC classification number: H01L27/14634 , H01L27/14645 , H01L27/14621 , H01L27/14627 , H01L27/14636 , H01L27/1469
Abstract: An image sensor includes a first substrate having a first transistor integrated therein, and a first plurality of wiring structures on the first substrate. The first plurality of wiring structures include a first wiring structure electrically connected to the first transistor. A second substrate extends on the first plurality of wiring structures, and has a second transistor integrated therein, which is electrically connected to a second wiring structure within the first plurality of wiring structures. A second plurality of wiring structures extend on the second substrate. A third substrate is provided on the second plurality of wiring structures. A microlens extends on a light receiving surface of the third substrate. A light sensing element extends within the third substrate. A transfer gate (TG) extends into a portion of the third substrate, extends adjacent the light sensing element, and is electrically connected to a first wiring structure within the second plurality of wiring structures. A floating diffusion (FD) region extends within the third substrate and adjacent the TG. The FD region is electrically connected to a second wiring structure within the second plurality of wiring structures.
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公开(公告)号:US11776982B2
公开(公告)日:2023-10-03
申请号:US17134699
申请日:2020-12-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minho Jang , Doowon Kwon , Dongchan Kim , Bokwon Kim , Kyungrae Byun , Jungchak Ahn , Hyunyoung Yeo
IPC: H01L27/146 , H01L25/065
CPC classification number: H01L27/14636 , H01L25/0657 , H01L27/14621 , H01L27/14623 , H01L27/14627 , H01L2225/06541
Abstract: An image sensor chip includes a lower chip, an upper chip stacked on the lower chip and including a photoelectric element, a via hole penetrating through the upper chip and penetrating through at least a portion of the lower chip, and a conductive connection layer electrically connecting the lower chip and the upper chip to each other in the via hole. The upper chip includes an upper substrate, an upper isolation layer and an upper element on the upper substrate, a connection contact plug, and a multilayer interconnection line electrically connected to the connection contact plug. A distance between an upper surface of the connection contact plug and an upper surface of the upper isolation layer is greater than a distance between an upper surface of an upper gate electrode of the upper element and an upper surface of the upper isolation layer.
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公开(公告)号:US20230081238A1
公开(公告)日:2023-03-16
申请号:US17901335
申请日:2022-09-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minho Jang , Seungkuk Kang
IPC: H01L27/146 , H01L23/00
Abstract: An image sensor includes a stack structure including an active pixel region in which a plurality of pixels are defined, and a pad region arranged on at least one side of the active pixel region. The stack structure includes a first substrate including a photoelectric conversion region and a floating diffusion region in each pixel, a first semiconductor substrate, a first front structure on the first semiconductor substrate, and a pad opening penetrating the first semiconductor substrate in the pad region, a second substrate attached to the first substrate and including a pixel gate electrically connected to the floating diffusion region in each pixel, a third substrate attached to the second substrate and including a logic transistor for driving the plurality of pixels, and a pad having a top surface that is exposed through the pad opening.
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公开(公告)号:US11412165B2
公开(公告)日:2022-08-09
申请号:US16986759
申请日:2020-08-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hongki Kim , Minkyung Kim , Minkwan Kim , Minho Jang , Insung Joe
IPC: H04N5/369 , H04N9/04 , H01L27/146
Abstract: An image sensor is presented which includes a pixel array including a plurality of image sensing pixels in a substrate, a phase detection shared pixel in the substrate, the phase detection shared pixel including two phase detection subpixels arranged next to each other, a color filter fence disposed on the plurality of image sensing pixels, and the phase detection shared pixel, the color filter fence defining a plurality of color filter spaces, a plurality of color filter layers respectively disposed in the plurality of color filter spaces on the plurality of image sensing pixels, and the phase detection shared pixel, a first micro-lens disposed on each of the plurality of image sensing pixels to have a first height, and a second micro-lens disposed to vertically overlap the two phase detection subpixels of the phase detection shared pixel and to have a second height greater than the first height.
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公开(公告)号:US12266674B2
公开(公告)日:2025-04-01
申请号:US17315321
申请日:2021-05-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Minho Jang , Kyoungwon Na , Seungkuk Kang , Hyunchul Kim , Hyun Young Yeo , In Sung Joe
IPC: H01L27/146
Abstract: An image sensor includes a first chip that includes a pixel region and a pad region, and a second chip that is in contact with one surface of the first chip and includes circuits that drive the first chip. The first chip includes a first substrate, an interlayer insulating layer disposed between the first substrate and the second chip, first interconnection lines disposed in the interlayer insulating layer, a conductive pad disposed in the pad region between the second chip and the first interconnection lines, and a recess region formed in the pad region that penetrates the first substrate and the interlayer insulating layer and exposes the conductive pad.
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公开(公告)号:US20220353446A1
公开(公告)日:2022-11-03
申请号:US17812795
申请日:2022-07-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hongki Kim , Minkyung Kim , Minkwan Kim , Minho Jang , Insung Joe
IPC: H04N5/369 , H04N9/04 , H01L27/146
Abstract: An image sensor is presented which includes a pixel array including a plurality of image sensing pixels in a substrate, a phase detection shared pixel in the substrate, the phase detection shared pixel including two phase detection subpixels arranged next to each other, a color filter fence disposed on the plurality of image sensing pixels, and the phase detection shared pixel, the color filter fence defining a plurality of color filter spaces, a plurality of color filter layers respectively disposed in the plurality of color filter spaces on the plurality of image sensing pixels, and the phase detection shared pixel, a first micro-lens disposed on each of the plurality of image sensing pixels to have a first height, and a second micro-lens disposed to vertically overlap the two phase detection subpixels of the phase detection shared pixel and to have a second height greater than the first height.
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公开(公告)号:US12272709B2
公开(公告)日:2025-04-08
申请号:US17655576
申请日:2022-03-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Minho Jang , Jeongsoon Kang , Donghyun Kim , Seungkuk Kang , Insung Joe
IPC: H01L27/146
Abstract: An image sensor includes a first structure, a second structure, and a third structure that are sequentially stacked in a vertical direction. The first structure includes a first substrate and at least one first transistor disposed on the first substrate. The second structure includes a second substrate and at least one second transistor disposed on the second substrate. The third structure includes a third substrate that includes an upper surface on which light is incident and a lower surface that is opposite to the upper surface, a photoelectric conversion region disposed in the third substrate, a transfer gate disposed on the lower surface of the third substrate, and a reflective structure disposed on the lower surface of the third substrate and on a lower surface and side surface of the transfer gate.
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公开(公告)号:US20230328404A1
公开(公告)日:2023-10-12
申请号:US18336495
申请日:2023-06-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hongki Kim , Minkyung Kim , Minkwan Kim , Minho Jang , Insung Joe
IPC: H04N25/704 , H01L27/146 , H04N25/11
CPC classification number: H04N25/704 , H01L27/14645 , H01L27/14621 , H01L27/14685 , H04N25/11 , H01L27/1464 , H01L27/14641 , H01L27/14627 , H01L27/14629
Abstract: An image sensor is presented which includes a pixel array including a plurality of image sensing pixels in a substrate, a phase detection shared pixel in the substrate, the phase detection shared pixel including two phase detection subpixels arranged next to each other, a color filter fence disposed on the plurality of image sensing pixels, and the phase detection shared pixel, the color filter fence defining a plurality of color filter spaces, a plurality of color filter layers respectively disposed in the plurality of color filter spaces on the plurality of image sensing pixels, and the phase detection shared pixel, a first micro-lens disposed on each of the plurality of image sensing pixels to have a first height, and a second micro-lens disposed to vertically overlap the two phase detection subpixels of the phase detection shared pixel and to have a second height greater than the first height.
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公开(公告)号:US12080744B2
公开(公告)日:2024-09-03
申请号:US17377792
申请日:2021-07-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Dong-Chul Lee , Beomsuk Lee , Minho Jang , Kwansik Cho
IPC: H01L27/146
CPC classification number: H01L27/14636 , H01L27/14623 , H01L27/1463 , H01L27/1464
Abstract: An image sensor includes a first chip including a pixel region, a pad region, and an optical black region interposed between the pixel region and the pad region, and a second chip being in contact with a first surface of the first chip and including circuits for driving the first chip. The first chip includes a first substrate, a device isolation portion disposed in the first substrate and defining unit pixels, an interlayer insulating layer interposed between the first substrate and the second chip, a connection wiring structure disposed in the interlayer insulating layer, and a connection contact plug disposed in the interlayer insulating layer and connecting the connection wiring structure to the device isolation portion in the optical black region. The image sensor further includes a conductive pad disposed in the first chip or the second chip.
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公开(公告)号:US11935908B2
公开(公告)日:2024-03-19
申请号:US17327885
申请日:2021-05-24
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Mihye Jang , Seungjoo Nah , Minho Jang , Heegeun Jeong
IPC: H01L27/146 , H01L21/768 , H01L23/00 , H10K39/32
CPC classification number: H01L27/14636 , H01L21/76898 , H01L24/83 , H01L27/14634 , H01L27/1469 , H10K39/32 , H01L24/06 , H01L24/32 , H01L2224/06155 , H01L2224/32145 , H01L2224/83931 , H01L2224/83951
Abstract: An image sensor includes a first structure including a first substrate, and a first internal wiring structure on the first substrate. The first substrate includes an active pixel region and a through electrode region around the active pixel region. The first internal wiring structure includes a plurality of first internal wiring patterns. The image sensor further includes a second structure including a second substrate and a second internal wiring structure on the second substrate. The second substrate is arranged on the first substrate. The image sensor additionally includes a through electrode layer arranged in the through electrode region to at least partially fill a through electrode trench, which penetrates the first substrate, and to connect the first internal wiring structure to the second internal wiring structure.
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