-
公开(公告)号:US20210351220A1
公开(公告)日:2021-11-11
申请号:US17134699
申请日:2020-12-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minho Jang , Doowon Kwon , Dongchan Kim , Bokwon Kim , Kyungrae Byun , Jungchak Ahn , Hyunyoung Yeo
IPC: H01L27/146
Abstract: An image sensor chip includes a lower chip, an upper chip stacked on the lower chip and including a photoelectric element, a via hole penetrating through the upper chip and penetrating through at least a portion of the lower chip, and a conductive connection layer electrically connecting the lower chip and the upper chip to each other in the via hole. The upper chip includes an upper substrate, an upper isolation layer and an upper element on the upper substrate, a connection contact plug, and a multilayer interconnection line electrically connected to the connection contact plug. A distance between an upper surface of the connection contact plug and an upper surface of the upper isolation layer is greater than a distance between an upper surface of an upper gate electrode of the upper element and an upper surface of the upper isolation layer.
-
公开(公告)号:US11776982B2
公开(公告)日:2023-10-03
申请号:US17134699
申请日:2020-12-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minho Jang , Doowon Kwon , Dongchan Kim , Bokwon Kim , Kyungrae Byun , Jungchak Ahn , Hyunyoung Yeo
IPC: H01L27/146 , H01L25/065
CPC classification number: H01L27/14636 , H01L25/0657 , H01L27/14621 , H01L27/14623 , H01L27/14627 , H01L2225/06541
Abstract: An image sensor chip includes a lower chip, an upper chip stacked on the lower chip and including a photoelectric element, a via hole penetrating through the upper chip and penetrating through at least a portion of the lower chip, and a conductive connection layer electrically connecting the lower chip and the upper chip to each other in the via hole. The upper chip includes an upper substrate, an upper isolation layer and an upper element on the upper substrate, a connection contact plug, and a multilayer interconnection line electrically connected to the connection contact plug. A distance between an upper surface of the connection contact plug and an upper surface of the upper isolation layer is greater than a distance between an upper surface of an upper gate electrode of the upper element and an upper surface of the upper isolation layer.
-