DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20200328379A1

    公开(公告)日:2020-10-15

    申请号:US16719304

    申请日:2019-12-18

    Abstract: A display apparatus includes a substrate, a display portion that includes a plurality of pixels disposed on the substrate, and an encapsulation portion that covers the display portion and includes a hybrid encapsulation layer that includes a plurality of inorganic layers and at least one organic layer that includes a plasma polymer. An end of the hybrid encapsulation layer includes a tip portion that includes an inorganic material and a multi-layered portion which extends from the tip portion toward a central portion of the substrate and in which the plurality of inorganic layers and the at least one organic layer are sequentially and alternately stacked, and a thickness of each of the inorganic layers and the organic layer decreases toward the tip portion.

    APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE USING THE SAME

    公开(公告)号:US20240218513A1

    公开(公告)日:2024-07-04

    申请号:US18479214

    申请日:2023-10-02

    Abstract: An apparatus for treating a substrate includes a first gas pipe extending in a first direction and including a first injection part and a first exhaust part, a second gas pipe extending in the first direction, spaced apart from the first gas pipe in a second direction intersecting the first direction, and including a second injection part and a second exhaust part, multiple first gas connection pipes extending in the second direction, connected to the first gas pipe, and spaced apart from each other in the first direction, multiple second gas connection pipes extending in the second direction, connected to the second gas pipe, and spaced apart from each other in the first direction, and a gas supply adjacent to the plurality of first gas connection pipes and the plurality of second gas connection pipes.

    MANUFACTURING METHOD OF DISPLAY DEVICE AND MANUFACTURING DEVICE OF DISPLAY DEVICE

    公开(公告)号:US20240286165A1

    公开(公告)日:2024-08-29

    申请号:US18406431

    申请日:2024-01-08

    CPC classification number: B05C5/0291 B05D1/02

    Abstract: A manufacturing method of a display device includes forming a first droplet on a first region of a substrate by nozzles, moving the nozzles onto a second region of the substrate spaced apart in a first direction from the first region, forming a second droplet on the second region, calculating a first distance between the first and second droplets, moving the nozzles onto a third region of the substrate spaced apart in a direction opposite to the first direction from the second region, forming a third droplet on the third region, moving the nozzles onto a fourth region of the substrate spaced apart in the first direction from the third region, forming a fourth droplet on the fourth region, calculating a second distance between the third and the fourth droplets, and calculating a jetting velocity of each of the nozzles based on the first distance and the second distance.

    INKJET PRINTING METHOD AND INKJET PRINTING APPARATUS

    公开(公告)号:US20250121606A1

    公开(公告)日:2025-04-17

    申请号:US18823047

    申请日:2024-09-03

    Abstract: An inkjet printing method includes generating an initial sequence in which initial numbers are arranged in a matrix form, generating a correction sequence by correcting the initial numbers with correction numbers based on a variable range for a volume of droplets ejected into pixel areas and measurement error range for discharge volume of nozzles which discharge droplets to the pixel areas, and discharging droplets to the pixel areas while adjusting a discharge volume for each nozzle based on the correction sequence.

    SUBSTRATE PROCESSING APPARATUS
    8.
    发明公开

    公开(公告)号:US20230203649A1

    公开(公告)日:2023-06-29

    申请号:US17987374

    申请日:2022-11-15

    Abstract: A substrate processing apparatus includes: a chamber; first and second nozzle units inside the chamber; a remote plasma generator outside the chamber and converting a cleaning gas into a plasma state; a common pipe outside the chamber and connected to the remote plasma generator through which the cleaning gas in the plasma state flows; a first connection pipe connecting the common pipe and the first nozzle unit; a second connection pipe connecting the common pipe and the second nozzle unit; a source gas supply pipe connected to the first connection pipe outside the chamber, supplying a source gas to the first connection pipe, and in which a first supply valve is installed, and a reaction gas supply pipe connected to the second connecting pipe outside the chamber, supplying a reaction gas to the second connection pipe, and in which a second supply valve is installed.

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