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公开(公告)号:US20240011156A1
公开(公告)日:2024-01-11
申请号:US18296499
申请日:2023-04-06
Applicant: Samsung Display Co., LTD.
Inventor: CHOELMIN JANG , JUNGGON KIM , MYUNGSOO HUH
IPC: C23C16/455 , C23C16/44 , C23C16/52 , C23C16/458
CPC classification number: C23C16/45561 , C23C16/4412 , C23C16/45544 , C23C16/52 , C23C16/4583
Abstract: A deposition apparatus includes a gas supply including a plurality of gas injection ports, a plate disposed to face the gas supply and to move up and down toward the gas supply, wherein a target substrate is seated on the plate, a body part includes a first portion defining a reaction space between the plate and the gas supply, a second portion disposed below the first portion and defining a lower space, an inner wall spaced apart from the plate, and a plurality of first exhaust parts provided on an outer wall of the first portion.
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公开(公告)号:US20200328379A1
公开(公告)日:2020-10-15
申请号:US16719304
申请日:2019-12-18
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: CHEOLMIN JANG , MYUNGSOO HUH , SUNGHUN KEY , JUNGGON KIM , EUN JUNG
Abstract: A display apparatus includes a substrate, a display portion that includes a plurality of pixels disposed on the substrate, and an encapsulation portion that covers the display portion and includes a hybrid encapsulation layer that includes a plurality of inorganic layers and at least one organic layer that includes a plasma polymer. An end of the hybrid encapsulation layer includes a tip portion that includes an inorganic material and a multi-layered portion which extends from the tip portion toward a central portion of the substrate and in which the plurality of inorganic layers and the at least one organic layer are sequentially and alternately stacked, and a thickness of each of the inorganic layers and the organic layer decreases toward the tip portion.
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公开(公告)号:US20230203649A1
公开(公告)日:2023-06-29
申请号:US17987374
申请日:2022-11-15
Applicant: Samsung Display Co., Ltd.
Inventor: JUNGGON KIM , CHOELMIN JANG , MYUNGSOO HUH
IPC: C23C16/44 , C23C16/50 , C23C16/455 , H01J37/32
CPC classification number: C23C16/4405 , C23C16/50 , C23C16/4412 , C23C16/45561 , C23C16/45563 , H01J37/32357 , H01J37/32449 , H01J37/32834 , H01J2237/3321
Abstract: A substrate processing apparatus includes: a chamber; first and second nozzle units inside the chamber; a remote plasma generator outside the chamber and converting a cleaning gas into a plasma state; a common pipe outside the chamber and connected to the remote plasma generator through which the cleaning gas in the plasma state flows; a first connection pipe connecting the common pipe and the first nozzle unit; a second connection pipe connecting the common pipe and the second nozzle unit; a source gas supply pipe connected to the first connection pipe outside the chamber, supplying a source gas to the first connection pipe, and in which a first supply valve is installed, and a reaction gas supply pipe connected to the second connecting pipe outside the chamber, supplying a reaction gas to the second connection pipe, and in which a second supply valve is installed.
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4.
公开(公告)号:US20190237702A1
公开(公告)日:2019-08-01
申请号:US16199848
申请日:2018-11-26
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: CHOELMIN JANG , SUNGHUN KEY , JUNGGON KIM , MYUNGSOO HUH
CPC classification number: H01L51/5256 , H01L27/3244 , H01L51/56 , H01L2251/303 , H01L2251/5338 , H01L2251/558
Abstract: Provided are an encapsulating structure, an organic light-emitting display device including the encapsulating structure, and a method of manufacturing the same. The encapsulating structure includes a first barrier layer including a first inorganic layer having a first thickness; a plasma polymer layer on the first inorganic layer, the plasma polymer layer having a second thickness smaller than or equal to the first thickness; and a second barrier layer including at least one second inorganic layer on the plasma polymer layer. The at least one second inorganic layer has a third thickness, and the third thickness is smaller than or equal to the second thickness.
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5.
公开(公告)号:US20190206659A1
公开(公告)日:2019-07-04
申请号:US16239874
申请日:2019-01-04
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: JUNGGON KIM , Sunghun Key , Choelmin Jang , Myungsoo Huh
IPC: H01J37/32 , C23C16/455
CPC classification number: H01J37/32449 , C23C16/45563 , H01J37/32834 , H01J37/32862
Abstract: A deposition apparatus includes a deposition gas supply unit including an opening and closing valve. The deposition gas supply unit is configured to selectively supply a source gas or a mixture gas into a chamber. A cleaning gas supply unit is configured to supply a cleaning gas into the chamber. A deposition head includes a first deposition head including a first nozzle configured to supply the source gas and the cleaning gas and a second deposition head including a second nozzle configured to supply the source gas, the mixture gas, and the cleaning gas. An exhaust unit is configured to discharge the cleaning gas and remaining source and mixture gases from the chamber. A cleaning gas valve unit is configured to be selectively opened and closed to supply the cleaning gas to at least any one of the first deposition head and the second deposition head.
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