SUBSTRATE LOADING DEVICE AND SUBSTRATE LOADING METHOD USING THE SAME

    公开(公告)号:US20240096679A1

    公开(公告)日:2024-03-21

    申请号:US18469684

    申请日:2023-09-19

    CPC classification number: H01L21/6833 H01L21/682

    Abstract: A substrate loading device includes an electrostatic chuck that chucks a substrate, a mask frame disposed under the electrostatic chuck, and including an edge having a flat top surface, and a plurality of holders disposed between the electrostatic chuck and the mask frame. Each of the plurality of holders includes a first connection part connected to a side of the electrostatic chuck, a second connection part connected to the first connection part and extending in a direction intersecting an extension direction of the first connection part, and a third connection part connected to the second connection part, extending in a direction intersecting an extension direction of the second connection part, and rotationally moving between a first position overlapping the substrate in a thickness direction of the substrate and a second position spaced apart from the substrate.

    MASK ASSEMBLY AND METHOD OF PROVIDING MASK ASSEMBLY

    公开(公告)号:US20220018011A1

    公开(公告)日:2022-01-20

    申请号:US17195771

    申请日:2021-03-09

    Abstract: A mask assembly includes a mask frame including an edge portion including opposing upper and lower portions along a first direction, and a support which between the upper portion and the lower portion of the edge portion along the first direction; and a mask attachable to the mask frame. The mask includes a pattern area corresponding to the support and including a first welded area at which the mask is attachable to the support, an alignment adjustment pattern adjacent to the first welded area along the first direction, and a second thickness of the mask at the alignment adjustment pattern which is less than a first thickness of the mask at the first welded area, and a first deposition area including upper deposition openings of the mask and between the upper portion and the support of the mask frame.

    MASK AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220020926A1

    公开(公告)日:2022-01-20

    申请号:US17231652

    申请日:2021-04-15

    Abstract: A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction and that includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion.

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