公开(公告)号：US20240146214A1

公开(公告)日：2024-05-02

申请号：US18446274

申请日：2023-08-08

Applicant: Samsung Display Co., LTD.

Inventor： MINCHUL SONG ,  JUNHYEUK KO ,  MINGOO KANG ,  EUIGYU KIM ,  Sukha Ryu ,  YOUNGSUN CHO

IPC: H02N13/00 ,  C23C14/50

CPC classification number: H02N13/00 ,  C23C14/50

Abstract: An electrostatic chuck unit includes: a first plate having a first surface and a second surface facing each other and a first hole extending from the first surface to the second surface; a second plate on the first surface of the first plate and having a groove corresponding to the first hole; a coupling bolt inserted into the first hole and the groove; and a height adjusting member spaced apart from the coupling bolt in a plan view.

公开(公告)号：US20240096679A1

公开(公告)日：2024-03-21

申请号：US18469684

申请日：2023-09-19

Applicant: Samsung Display Co., LTD.

Inventor： JUNHYEUK KO ,  MINGOO KANG ,  MINSEOK KIM ,  MINCHUL SONG ,  Sukha Ryu ,  EUIGYU KIM

IPC: H01L21/683 ,  H01L21/68

CPC classification number: H01L21/6833 ,  H01L21/682

Abstract: A substrate loading device includes an electrostatic chuck that chucks a substrate, a mask frame disposed under the electrostatic chuck, and including an edge having a flat top surface, and a plurality of holders disposed between the electrostatic chuck and the mask frame. Each of the plurality of holders includes a first connection part connected to a side of the electrostatic chuck, a second connection part connected to the first connection part and extending in a direction intersecting an extension direction of the first connection part, and a third connection part connected to the second connection part, extending in a direction intersecting an extension direction of the second connection part, and rotationally moving between a first position overlapping the substrate in a thickness direction of the substrate and a second position spaced apart from the substrate.