公开(公告)号：US20240209489A1

公开(公告)日：2024-06-27

申请号：US18457386

申请日：2023-08-29

Applicant: Samsung Display Co., Ltd. ,  Olum Material Corporation

Inventor： HONG-KYUN AHN ,  ByoungIl LEE ,  Taekyong JANG ,  JUNGWOO KO ,  SEUNGJIN LEE

IPC: C23C14/04

CPC classification number: C23C14/042

Abstract: A mask includes a mask frame having an opening, an open mask disposed on the mask frame, the open mask having a first opening, the first opening disposed in the opening in case that viewed in a plan view, and a cell mask disposed on the open mask and having a second opening, the second opening being smaller than the first opening.

公开(公告)号：US20230317492A1

公开(公告)日：2023-10-05

申请号：US18104453

申请日：2023-02-01

Applicant: Samsung Display Co., Ltd.

Inventor： EUIGYU KIM ,  SANG MIN YI ,  JUNHYEUK KO ,  JONGBUM KIM ,  JAESUK MOON ,  HONG-KYUN AHN ,  KYUNGHOON CHUNG

IPC: H01L21/683

CPC classification number: H01L21/6833

Abstract: Disclosed is a deposition mask stage comprising a stage frame, chucks combined with the stage frame, and support blocks on a back side of the stage frame. The chucks are spaced apart from each other in a first direction and a second direction that are defined in an extending direction of the stage frame. The first and second directions intersect each other. The support blocks are spaced apart from each other in the first direction and the second direction on the back side of the stage frame.

公开(公告)号：US20240423081A1

公开(公告)日：2024-12-19

申请号：US18815804

申请日：2024-08-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： SANGSHIN LEE ,  SANGHOON KIM ,  SEIL KIM ,  HONG-KYUN AHN ,  JONGSUNG PARK ,  SEUNGJIN LEE

IPC: H10K71/16 ,  C23C14/04 ,  H10K59/12 ,  H10K71/00 ,  H10K71/10

Abstract: A mask includes: a body portion including a cell area, and a peripheral area surrounding the cell area, the body portion having a plurality of cell openings defined therein; and a plurality of mark patterns at the peripheral area. The cell area includes: a first area; and a second area adjacent to the first area, and the plurality of cell openings includes: first cell openings defined at the first area, and spaced from each other; and second cell openings defined at the second area, and spaced from each other. Each of the mark patterns includes at least one recess portion, and has a point-symmetrical shape with respect to a corresponding symmetry point.

公开(公告)号：US20230058620A1

公开(公告)日：2023-02-23

申请号：US17824991

申请日：2022-05-26

Applicant: Samsung Display Co., Ltd.

Inventor： SEUNGJIN LEE ,  HONG-KYUN AHN ,  SANGHOON KIM ,  JONGSUNG PARK

IPC: C23C14/04

Abstract: A mask assembly includes: a frame; an open mask disposed on the frame, and defining a first deposition opening, a second deposition opening spaced apart from the first deposition opening in a first direction, and a first dummy opening located between the first deposition opening and the second deposition opening; and a shield member including a first shield part overlapping the first dummy opening in a plan view.

公开(公告)号：US20240382999A1

公开(公告)日：2024-11-21

申请号：US18660092

申请日：2024-05-09

Applicant: Samsung Display Co., Ltd.

Inventor： MINSEOK KIM ,  BYUNG IK KONG ,  SEO YEON KIM ,  HONG-KYUN AHN

IPC: B05C21/00

Abstract: Provided is a mask assembly and a method of manufacturing the same. The mask assembly according to one or more embodiments of the present disclosure may include a mask frame defining a first opening, an open mask above the mask frame, and defining second openings arranged in a first direction and a second direction crossing the first direction, unit masks above the open mask, and defining a unit opening, the unit opening having an area that is less than an area of each of the second openings in plan view, and cell masks above the unit masks, and defining cell openings, one of the cell openings have an area that is less than the area of the unit opening.

公开(公告)号：US20220199905A1

公开(公告)日：2022-06-23

申请号：US17446437

申请日：2021-08-30

Applicant: Samsung Display Co., Ltd.

Inventor： SANGSHIN LEE ,  SANGHOON KIM ,  SEIL KIM ,  HONG-KYUN AHN ,  JONGSUNG PARK ,  SEUNGJIN LEE

IPC: H01L51/00 ,  H01L27/32 ,  H01L51/56 ,  C23C14/04

Abstract: A mask includes: a body portion including a cell area, and a peripheral area surrounding the cell area, the body portion having a plurality of cell openings defined therein; and a plurality of mark patterns at the peripheral area. The cell area includes: a first area; and a second area adjacent to the first area, and the plurality of cell openings includes: first cell openings defined at the first area, and spaced from each other; and second cell openings defined at the second area, and spaced from each other. Each of the mark patterns includes at least one recess portion, and has a point-symmetrical shape with respect to a corresponding symmetry point.