公开(公告)号：US20140375987A1

公开(公告)日：2014-12-25

申请号：US14304373

申请日：2014-06-13

Applicant: KLA-Tencor Corporation

Inventor： Rudolf Brunner

IPC: G01N21/88 ,  G01N21/95 ,  G02B26/02

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G02B26/02

Abstract: Methods and systems for reconfiguring an aperture of an optical inspection system are presented. A programmable aperture system includes a two dimensional array of mechanical pixels that selectively block light passing through the aperture. An array of linear guiding elements is aligned parallel to one another, and each row of mechanical pixels is supported by a corresponding linear guiding element. Each mechanical pixel is configured to slide along the corresponding linear guiding element when pushed by an actuator subsystem. The actuator subsystem repositions one or more of the mechanical pixel elements to change the shape of the aperture. The actuator subsystem is configured to selectively engage one or more mechanical pixel elements and translate the one or more mechanical pixel elements along corresponding linear guiding elements to a new position.

Abstract translation: 提出了用于重新配置光学检测系统孔径的方法和系统。 可编程光圈系统包括选择性地阻挡通过光圈的光的机械像素的二维阵列。 线性引导元件的阵列彼此平行排列，并且每排机械像素由相应的线性引导元件支撑。 每个机械像素构造成当由致动器子系统推动时沿着相应的线性引导元件滑动。 致动器子系统重新定位一个或多个机械像素元件以改变孔的形状。 致动器子系统被配置为选择性地接合一个或多个机械像素元件并将一个或多个机械像素元件沿对应的线性引导元件平移到新的位置。

公开(公告)号：US20170150590A1

公开(公告)日：2017-05-25

申请号：US15280073

申请日：2016-09-29

Applicant: KLA-Tencor Corporation

Inventor： Anant Chimmalgi ,  Rudolf Brunner ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Erik Kim ,  Rajeev Patil

IPC: H05G2/00 ,  G02B6/42 ,  H01J61/02 ,  H01J65/04 ,  H01J61/54

CPC classification number: H05G2/008 ,  G02B6/4204 ,  H01J61/025 ,  H01J61/54 ,  H01J65/04 ,  H01J65/042 ,  H05G2/003

Abstract: An illumination source for igniting and sustaining a plasma in a plasma lamp of a laser-sustained plasma (LSP) broadband source includes one or more ignition lasers configured to ignite the plasma within a gas contained within the plasma lamp. The illumination sources also includes one or more sustaining lasers configured to sustain the plasma. The illumination sources includes a delivery optical fiber one or more optical elements configured to selectively optically couple an output of the one or more ignition lasers and an output of the one or more sustaining lasers to the delivery optical fiber.

公开(公告)号：US20150042979A1

公开(公告)日：2015-02-12

申请号：US14521977

申请日：2014-10-23

Applicant: KLA-Tencor Corporation

Inventor： Anant Chimmalgi ,  Younus Vora ,  Rudolf Brunner

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8845 ,  G01N2021/95676 ,  G01N2201/0612 ,  G03F7/70483

Abstract: Disclosed are methods and apparatus for performing inspection or metrology of a semiconductor device. The apparatus includes a plurality of laser diode arrays that are configurable to provide an incident beam having different wavelength ranges. At least some of the laser diode arrays form two dimensional stacks that have different wavelength ranges from each other. The apparatus also includes optics for directing the incident beam towards the sample, a detector for generating an output signal or image based on an output beam emanating from the sample in response to the incident beam, and optics for directing the output beam towards the detector. The apparatus further includes a controller for configuring the laser diode arrays to provide the incident beam at the different wavelength ranges and detecting defects or characterizing a feature of the sample based on the output signal or image.

Abstract translation: 公开了用于执行半导体器件的检查或计量的方法和装置。 该装置包括可配置为提供具有不同波长范围的入射光束的多个激光二极管阵列。 至少一些激光二极管阵列形成彼此具有不同波长范围的二维叠层。 该装置还包括用于将入射光束引向样品的光学器件，用于响应于入射光束而从样品发出的输出光束产生输出信号或图像的检测器，以及用于将输出光束引向检测器的光学器件。 该装置还包括控制器，用于配置激光二极管阵列以在不同波长范围提供入射光束，并基于输出信号或图像检测缺陷或表征样本的特征。

公开(公告)号：US20150015874A1

公开(公告)日：2015-01-15

申请号：US14381315

申请日：2013-03-01

Applicant: KLA-Tencor Corporation

Inventor： Grace H. Chen ,  Rudolf Brunner ,  Lisheng Gao ,  Robert M. Danen ,  Lu Chen

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/0638 ,  G01N2201/068 ,  G01N2201/12

Abstract: In an optical inspection tool, an illumination aperture is opened at each of a plurality of aperture positions of an illumination pupil area one at a time across the illumination pupil area. For each aperture opening position, an incident beam is directed towards the illumination pupil area so as to selectively pass a corresponding ray bundle of the illumination beam at a corresponding set of one or more incident angles towards the sample and an output beam, which is emitted from the sample in response to the corresponding ray bundle of the incident beam impinging on the sample at the corresponding set of one or more incident angles, is detected. A defect detection characteristic for each aperture position is determined based on the output beam detected for each aperture position. An optimum aperture configuration is determined based on the determined defect detection characteristic for each aperture position.

Abstract translation: 在光学检查工具中，照明光圈在照明光瞳区域的多个孔径位置中的每一个处打开，一次一个地穿过照明瞳孔区域。 对于每个光圈打开位置，入射光束被引向照明光瞳区域，以便选择性地将照射光束的相应光束束以对应于一个或多个入射角的一组对应于样品的输出光束和输出光束 检测来自样品的响应于在相应的一个或多个入射角度的入射光束入射到样品上的相应射线束。 基于针对每个孔径位置检测的输出光束来确定每个光圈位置的缺陷检测特性。 基于针对每个孔位置确定的缺陷检测特性来确定最佳孔径配置。

公开(公告)号：US20140168740A1

公开(公告)日：2014-06-19

申请号：US13911424

申请日：2013-06-06

Applicant: KLA-Tencor Corporation

Inventor： Rudolf Brunner

IPC: G02B5/00

CPC classification number: G02B5/005 ,  G02B26/02 ,  G02B26/06

Abstract: A system for providing flexible optical aperture shapes in an optical inspection system (e.g., an optical wafer inspection system) is described. The system includes one or more mechanisms for providing multiple optical aperture shapes along an optical beam path in the optical wafer inspection system. The multiple optical apertures shapes are stacked or overlapped to combine the shapes and form a single combined optical aperture shape along the optical beam path.

Abstract translation: 描述了一种用于在光学检查系统（例如，光学晶片检查系统）中提供柔性光学孔径形状的系统。 该系统包括用于在光学晶片检查系统中沿光束路径提供多个光学孔径形状的一个或多个机构。 多个光学孔形状被堆叠或重叠以组合形状并且沿着光束路径形成单个组合的光学孔形状。

公开(公告)号：US20140060792A1

公开(公告)日：2014-03-06

申请号：US13975945

申请日：2013-08-26

Applicant: KLA-Tencor Corporation

Inventor： Jincheng Wang ,  Anant Chimmalgi ,  Rajeev Patil ,  Erik Kim ,  Rudolf Brunner ,  Quang Giang ,  Lauren Wilson ,  Ken Gross ,  Ilya Bezel ,  Dan Scott ,  Younus Vora ,  Matthew Derstine ,  Cedric Lasfargues

IPC: F28C3/04

CPC classification number: F28C3/04 ,  F21V19/00 ,  F21V29/02 ,  F21V29/503 ,  F21V29/60

Abstract: A fluid input manifold distributes injected fluid around the body of a bulb to cool the bulb below a threshold. The injected fluid also distributes heat more evenly along the surface of the bulb to reduce thermal stress. The fluid input manifold may comprise one or more airfoils to direct a substantially laminar fluid flow along the surface of the bulb or it may comprise a plurality of fluid injection nozzles oriented to produce a substantially laminar fluid flow. An output portion may be configured to facilitate fluid flow along the surface of the bulb by allowing injected fluid to easily escape after absorbing heat from the bulb or by applying negative pressure to actively draw injected fluid along the surface of the bulb and away.

Abstract translation: 流体输入歧管将注入的流体分布在灯泡的主体周围以将灯泡冷却到阈值以下。 喷射的流体还可以沿着灯泡的表面更均匀地分布热量以减少热应力。 流体输入歧管可以包括一个或多个翼型件，以引导基本上层流的流体沿着灯泡的表面，或者其可以包括多个流体喷射喷嘴，其被定向以产生基本上层流的流体流。 输出部分可以被配置为通过允许注入的流体在从灯泡吸收热量之后容易地逸出，或者通过施加负压以沿着灯泡的表面主动地吸取注入的流体并且远离，从而促进沿着灯泡表面的流体流动。

公开(公告)号：US09523646B2

公开(公告)日：2016-12-20

申请号：US15158413

申请日：2016-05-18

Applicant: KLA-Tencor Corporation

Inventor： Grace H. Chen ,  Rudolf Brunner ,  Lisheng Gao ,  Robert M. Danen ,  Lu Chen

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/0638 ,  G01N2201/068 ,  G01N2201/12

Abstract: In an optical inspection tool, an illumination aperture is opened at each of a plurality of aperture positions of an illumination pupil area one at a time across the illumination pupil area. For each aperture opening position, an incident beam is directed towards the illumination pupil area so as to selectively pass a corresponding ray bundle of the illumination beam at a corresponding set of one or more incident angles towards the sample and an output beam, which is emitted from the sample in response to the corresponding ray bundle of the incident beam impinging on the sample at the corresponding set of one or more incident angles, is detected. A defect detection characteristic for each aperture position is determined based on the output beam detected for each aperture position. An optimum aperture configuration is determined based on the determined defect detection characteristic for each aperture position.

公开(公告)号：US09110037B2

公开(公告)日：2015-08-18

申请号：US14521977

申请日：2014-10-23

Applicant: KLA-Tencor Corporation

Inventor： Anant Chimmalgi ,  Younus Vora ,  Rudolf Brunner

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/88 ,  G03F7/20 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8845 ,  G01N2021/95676 ,  G01N2201/0612 ,  G03F7/70483

Abstract: Disclosed are methods and apparatus for performing inspection or metrology of a semiconductor device. The apparatus includes a plurality of laser diode arrays that are configurable to provide an incident beam having different wavelength ranges. At least some of the laser diode arrays form two dimensional stacks that have different wavelength ranges from each other. The apparatus also includes optics for directing the incident beam towards the sample, a detector for generating an output signal or image based on an output beam emanating from the sample in response to the incident beam, and optics for directing the output beam towards the detector. The apparatus further includes a controller for configuring the laser diode arrays to provide the incident beam at the different wavelength ranges and detecting defects or characterizing a feature of the sample based on the output signal or image.

Abstract translation: 公开了用于执行半导体器件的检查或计量的方法和装置。 该装置包括可配置为提供具有不同波长范围的入射光束的多个激光二极管阵列。 至少一些激光二极管阵列形成彼此具有不同波长范围的二维叠层。 该装置还包括用于将入射光束引向样品的光学器件，用于响应于入射光束而从样品发出的输出光束产生输出信号或图像的检测器，以及用于将输出光束引向检测器的光学器件。 该装置还包括控制器，用于配置激光二极管阵列以在不同波长范围提供入射光束，并基于输出信号或图像检测缺陷或表征样本的特征。

公开(公告)号：US08896827B2

公开(公告)日：2014-11-25

申请号：US13924216

申请日：2013-06-21

Applicant: KLA-Tencor Corporation

Inventor： Anant Chimmalgi ,  Younus Vora ,  Rudolf Brunner

IPC: G01N21/00 ,  G03F7/20 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8845 ,  G01N2021/95676 ,  G01N2201/0612 ,  G03F7/70483

Abstract: Disclosed are methods and apparatus for performing inspection or metrology of a semiconductor device. The apparatus includes a plurality of laser diode arrays that are configurable to provide an incident beam having different wavelength ranges. The apparatus also includes optics for directing the incident beam towards the sample, a detector for generating an output signal or image based on an output beam emanating from the sample in response to the incident beam, and optics for directing the output beam towards the detector. The apparatus further includes a controller for configuring the laser diode arrays to provide the incident beam at the different wavelength ranges and detecting defects or characterizing a feature of the sample based on the output signal or image.

Abstract translation: 公开了用于执行半导体器件的检查或计量的方法和装置。 该装置包括可配置为提供具有不同波长范围的入射光束的多个激光二极管阵列。 该装置还包括用于将入射光束引向样品的光学器件，用于响应于入射光束而从样品发出的输出光束产生输出信号或图像的检测器，以及用于将输出光束引向检测器的光学器件。 该装置还包括控制器，用于配置激光二极管阵列以在不同波长范围提供入射光束，并基于输出信号或图像检测缺陷或表征样本的特征。

公开(公告)号：US20130342825A1

公开(公告)日：2013-12-26

申请号：US13924216

申请日：2013-06-21

Applicant: KLA-Tencor Corporation

Inventor： Anant Chimmalgi ,  Younus Vora ,  Rudolf Brunner

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8845 ,  G01N2021/95676 ,  G01N2201/0612 ,  G03F7/70483

Abstract: Disclosed are methods and apparatus for performing inspection or metrology of a semiconductor device. The apparatus includes a plurality of laser diode arrays that are configurable to provide an incident beam having different wavelength ranges. The apparatus also includes optics for directing the incident beam towards the sample, a detector for generating an output signal or image based on an output beam emanating from the sample in response to the incident beam, and optics for directing the output beam towards the detector. The apparatus further includes a controller for configuring the laser diode arrays to provide the incident beam at the different wavelength ranges and detecting defects or characterizing a feature of the sample based on the output signal or image.

Abstract translation: 公开了用于执行半导体器件的检查或计量的方法和装置。 该装置包括可配置为提供具有不同波长范围的入射光束的多个激光二极管阵列。 该装置还包括用于将入射光束引向样品的光学器件，用于响应于入射光束而从样品发出的输出光束产生输出信号或图像的检测器，以及用于将输出光束引向检测器的光学器件。 该装置还包括控制器，用于配置激光二极管阵列以在不同波长范围提供入射光束，并基于输出信号或图像检测缺陷或表征样本的特征。