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1.发明申请APPARATUS AND METHOD FOR SYNCHRONIZING SAMPLE STAGE MOTION WITH A TIME DELAY INTEGRATION CHARGE-COUPLE DEVICE IN A SEMICONDUCTOR INSPECTION TOOL 有权在半导体检测工具中与时间延迟积分充电耦合器件同步采样阶段运动的装置和方法公开(公告)号：US20130270444A1
公开(公告)日：2013-10-17
申请号：US13862148
申请日：2013-04-12
Applicant: KLA-TENCOR CORPORATION
Inventor： Pradeep Subrahmanyan , Daniel Wack , Michael Wright , David Alles
IPC: G01N21/95
CPC classification number: G01N21/9501 , G01N21/956 , G01N2021/95676
Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.
Abstract translation: 一种用于在半导体检测工具中使样本台运动与时间延迟积分（TDI）电荷耦合器件（CCD）同步的方法，包括：测量保持被检样品的台的横向位置; 测量舞台的垂直位置; 基于所测量的横向和垂直位置确定样本的成像像素的校正横向位置; 以及使所述TDI CCD的电荷转移与被成像像素的校正横向位置同步。
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Patent Agency Ranking
公开(公告)号：US20140307943A1
公开(公告)日：2014-10-16
申请号：US14251312
申请日：2014-04-11
Applicant: KLA-Tencor Corporation
Inventor： Fred Stanke , Ilya Toytman , David Alles , Gregg Anthony Inderhees , Stanley E. Stokowski , Mehdi Vaez-Iravani
CPC classification number: G06T7/001 , G01N21/956 , G01N2021/95676 , G06K9/00 , G06T2207/10056 , G06T2207/30148
Abstract: Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
Abstract translation: 仅使用测试图像的高分辨率光掩模的光学检测方法和设备。 将滤波器应用于从具有测试图像的光掩模透射或反射的辐射接收的图像信号。 滤波器可以使用编程控制来实现，以调节和控制滤波器条件，照明条件和放大条件。
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3.发明申请SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE INSPECTION SYSTEM 有权欧盟专业检疫系统的光谱滤光片和光监测仪公开(公告)号：US20140217298A1
公开(公告)日：2014-08-07
申请号：US14170808
申请日：2014-02-03
Applicant: KLA-Tencor Corporation
Inventor： Daimian Wang , Li Wang , Frank Chilese , David Alles
IPC: G01N21/88
CPC classification number: G03F1/24 , G01N21/956 , G01N2021/95676 , G03F1/22 , G03F1/84 , G03F7/70033
Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.
Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 EUV光的第一部分沿着光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜过滤器。
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公开(公告)号：US09619878B2
公开(公告)日：2017-04-11
申请号：US14251312
申请日：2014-04-11
Applicant: KLA-Tencor Corporation
Inventor： Fred Stanke , Ilya Toytman , David Alles , Gregg Anthony Inderhees , Stanley E. Stokowski , Mehdi Vaez-Iravani
IPC: G06K9/00 , G06T7/00 , G01N21/956
CPC classification number: G06T7/001 , G01N21/956 , G01N2021/95676 , G06K9/00 , G06T2207/10056 , G06T2207/30148
Abstract: Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
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5.发明授权Spectral purity filter and light monitor for an EUV reticle inspection system 有权用于EUV掩模版检查系统的光谱纯度过滤器和光监测器公开(公告)号：US09348214B2
公开(公告)日：2016-05-24
申请号：US14170808
申请日：2014-02-03
Applicant: KLA-Tencor Corporation
Inventor： Daimian Wang , Li Wang , Frank Chilese , David Alles
CPC classification number: G03F1/24 , G01N21/956 , G01N2021/95676 , G03F1/22 , G03F1/84 , G03F7/70033
Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.
Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 EUV光的第一部分沿着光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜过滤器。
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6.发明授权Apparatus and method for synchronizing sample stage motion with a time delay integration charge-couple device in a semiconductor inspection tool 有权在半导体检测工具中使样品台运动与时间延迟积分电荷耦合器件同步的装置和方法公开(公告)号：US08772731B2
公开(公告)日：2014-07-08
申请号：US13862148
申请日：2013-04-12
Applicant: KLA-Tencor Corporation
Inventor： Pradeep Subrahmanyan , Daniel Wack , Michael Wright , David Alles
IPC: G01J1/42
CPC classification number: G01N21/9501 , G01N21/956 , G01N2021/95676
Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.
Abstract translation: 一种用于在半导体检测工具中使样本台运动与时间延迟积分（TDI）电荷耦合器件（CCD）同步的方法，包括：测量保持被检样品的台的横向位置; 测量舞台的垂直位置; 基于所测量的横向和垂直位置确定样本的成像像素的校正横向位置; 以及使所述TDI CCD的电荷转移与被成像像素的校正横向位置同步。
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