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公开(公告)号:US20240178167A1
公开(公告)日:2024-05-30
申请号:US18437444
申请日:2024-02-09
Applicant: Huawei Technologies Co., Ltd.
Inventor: Ran He , Huifang Jiao
IPC: H01L23/00
CPC classification number: H01L24/05 , H01L24/03 , H01L24/06 , H01L24/08 , H01L24/80 , H01L2224/0345 , H01L2224/03462 , H01L2224/03466 , H01L2224/03845 , H01L2224/05554 , H01L2224/05571 , H01L2224/05582 , H01L2224/05584 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05666 , H01L2224/05681 , H01L2224/05686 , H01L2224/06517 , H01L2224/08145 , H01L2224/80357 , H01L2224/80896 , H01L2924/04642 , H01L2924/04941 , H01L2924/04953 , H01L2924/05042 , H01L2924/05442 , H01L2924/059
Abstract: The invention provide a chip package structure, which includes a first chip and a first hybrid bonding structure. The first chip is connected to another chip through the first hybrid bonding structure. The first hybrid bonding structure includes a first bonding layer. The first bonding layer is disposed on a side away from a substrate of the first chip, and the first bonding layer includes a first insulation material and a plurality of first metal solder pads embedded in the first insulation material. Each of the plurality of first metal solder pads includes a groove structure. A groove bottom of the groove structure is buried in the first insulation material, and a groove opening of the groove structure is exposed to a surface of the first insulation material and is flush with the surface of the first insulation material.
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公开(公告)号:US11756922B2
公开(公告)日:2023-09-12
申请号:US17525964
申请日:2021-11-15
Applicant: HUAWEI TECHNOLOGIES CO., LTD.
Inventor: Ran He , Huifang Jiao , Yufeng Dai , Guanglin Yang , Chihon Ho , Ronghua Xie
CPC classification number: H01L24/80 , H01L24/08 , H01L2224/0801 , H01L2224/08056 , H01L2224/08059 , H01L2224/08145 , H01L2224/80047 , H01L2224/80095 , H01L2224/80345 , H01L2224/80895 , H01L2224/80896
Abstract: Embodiments of this application disclose a hybrid bonding structure and a hybrid bonding method. The hybrid bonding structure includes a first chip and a second chip. A surface of the first chip includes a first insulation dielectric and a first metal, and a first gap area exists between the first metal and the first insulation dielectric. A surface of the second chip includes a second insulation dielectric and a second metal. A surface of the first metal is higher than a surface of the first insulation dielectric. Metallic bonding is formed after the first metal is in contact with the second metal, and the first metal is longitudinally and transversely deformed in the first gap area. Insulation dielectric bonding is formed after the first insulation dielectric is in contact with the second insulation dielectric.
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公开(公告)号:US12183425B2
公开(公告)日:2024-12-31
申请号:US17893067
申请日:2022-08-22
Applicant: HUAWEI TECHNOLOGIES CO., LTD.
Inventor: Huifang Jiao , Ran He , Luming Fan , Yue Pan
Abstract: A memory includes S storage blocks, N global bitlines, and a signal amplification circuit. Each of the S storage blocks is connected to the N global bitlines, the N global bitlines are connected to the signal amplification circuit, the signal amplification circuit is configured to amplify electrical signals on the N global bitlines, and each storage block includes N columns of storage units, N local bitlines, and N bitline switches. In each storage block, storage units in an ith column are connected to an ith local bitline, the ith local bitline is connected to an ith global bitline by using an ith bitline switch in the N bitline switches. A memory array is fine-grained, so that ith local bitlines in the S storage blocks can share one global bitline.
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公开(公告)号:US20220077105A1
公开(公告)日:2022-03-10
申请号:US17525964
申请日:2021-11-15
Applicant: HUAWEI TECHNOLOGIES CO.,LTD.
Inventor: Ran He , Huifang Jiao , Yufeng Dai , Guanglin Yang , Chihon Ho , Ronghua Xie
IPC: H01L23/00
Abstract: Embodiments of this application disclose a hybrid bonding structure and a hybrid bonding method. The hybrid bonding structure includes a first chip and a second chip. A surface of the first chip includes a first insulation dielectric and a first metal, and a first gap area exists between the first metal and the first insulation dielectric. A surface of the second chip includes a second insulation dielectric and a second metal. A surface of the first metal is higher than a surface of the first insulation dielectric. Metallic bonding is formed after the first metal is in contact with the second metal, and the first metal is longitudinally and transversely deformed in the first gap area. Insulation dielectric bonding is formed after the first insulation dielectric is in contact with the second insulation dielectric.
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