公开(公告)号：US20240258757A1

公开(公告)日：2024-08-01

申请号：US18631098

申请日：2024-04-10

Applicant: Gigaphoton Inc.

Inventor： Yousuke FUJIMAKI

IPC: H01S3/00 ,  G02B17/06 ,  G03F7/00

CPC classification number: H01S3/0057 ,  G02B17/0647 ,  G03F7/70025 ,  G03F7/70041

Abstract: A pulse stretcher includes a beam splitter splitting pulse laser light into two beams of pulse laser light, first concave mirrors arranged side by side in a predetermined direction, and second concave mirrors arranged side by side in the predetermined direction as having the same number as the first concave mirrors and facing the first concave mirrors, respectively. One beam of pulse laser light split by the beam splitter travels to one first concave mirror among the first concave mirrors and is reflected alternately by the first concave mirrors and the second concave mirrors 12 times or more as even number times to return to the beam splitter. A number of overlapping of the one beam at each of concentration points where at least part of the one beam of pulse laser light overlaps at beam waists of the one beam is two.

公开(公告)号：US20220385029A1

公开(公告)日：2022-12-01

申请号：US17819060

申请日：2022-08-11

Applicant: Gigaphoton Inc.

Inventor： Yousuke FUJIMAKI

IPC: H01S3/134 ,  H01S3/11 ,  H01S3/08 ,  H01S3/13 ,  G03F7/20

Abstract: A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.

公开(公告)号：US20180261973A1

公开(公告)日：2018-09-13

申请号：US15973846

申请日：2018-05-08

Applicant: Gigaphoton Inc.

Inventor： Yousuke FUJIMAKI ,  Hiroaki TSUSHIMA ,  Hiroyuki IKEDA ,  Osamu WAKABAYASHI

IPC: H01S3/134 ,  H01S3/038 ,  H01S3/225 ,  H01S3/097 ,  H01S3/036 ,  H01S3/13 ,  H01S3/11

Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

公开(公告)号：US20240235149A1

公开(公告)日：2024-07-11

申请号：US18617704

申请日：2024-03-27

Applicant: Gigaphoton Inc.

Inventor： Hironori IGARASHI ,  Osamu WAKABAYASHI ,  Yousuke FUJIMAKI ,  Toru SUZUKI

IPC: H01S3/23 ,  H01S3/02 ,  H01S3/06 ,  H01S3/225

CPC classification number: H01S3/2333 ,  H01S3/025 ,  H01S3/0602 ,  H01S3/2251 ,  H01S3/2383

Abstract: A laser apparatus includes an oscillator that outputs laser light, an amplifier, a front optical system and a rear optical system that are disposed at positions where the front and rear optical systems face each other with a chamber sandwiched therebetween and constitute a ring resonator having a first optical path and a second optical path, and first plane parallel substrates disposed on the first optical path or the second optical path. The first optical path is an optical path along which the front optical system outputs the laser light. The second optical path is an optical path along which the rear optical system outputs the laser light. The first plane parallel substrates translate the first optical path and the second optical path, respectively, in the directions in which the first and second optical paths approach each other on the side facing the chamber.

公开(公告)号：US20240136787A1

公开(公告)日：2024-04-25

申请号：US18402835

申请日：2024-01-03

Applicant: Gigaphoton Inc.

Inventor： Yousuke FUJIMAKI

IPC: H01S3/139 ,  G03F7/00 ,  H01S3/034 ,  H01S3/13 ,  H01S3/23

CPC classification number: H01S3/139 ,  G03F7/70025 ,  G03F7/7015 ,  H01S3/034 ,  H01S3/1305 ,  H01S3/23

Abstract: A gas laser device includes a laser oscillator outputting laser light, and a laser amplifier amplifying the laser light and outputting the amplified laser light. The laser amplifier includes a discharge chamber accommodating electrodes for causing discharge, an input coupling optical system causing part of the laser light to be transmitted toward the discharge chamber, and an output coupling optical system configuring an optical resonator together with the input coupling optical system and causing part of the laser light transmitted through the input coupling optical system and the discharge chamber to be transmitted therethrough and output the amplified laser light. A first focal point of the input coupling optical system and a second focal point of the output coupling optical system in a first direction being perpendicular to a direction of the discharge coincides at a position between the input coupling optical system and the output coupling optical system.