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公开(公告)号：US20200244032A1
公开(公告)日：2020-07-30
申请号：US16849618
申请日：2020-04-15
Applicant: Gigaphoton Inc.
Inventor： Keisuke ISHIDA , Satoshi KOMURO , Hiroshi FURUSATO
Abstract: An excimer laser apparatus according to the present disclosure includes a chamber configured to accommodate a laser gas and a pair of electrodes and generate pulse-oscillating laser light when the gas pressure of the laser gas is controlled in accordance with voltage applied between the pair of electrodes, a power supply configured to apply the voltage between the pair of electrodes, and a controller to which a target value of the spectral linewidth of the laser light is inputted, the controller configured to correct the voltage used to control the gas pressure, when the target value changes from a first target value to a second target value, based on a first function having the second target value as a parameter and control the gas pressure in accordance with the corrected voltage.
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公开(公告)号：US20240128706A1
公开(公告)日：2024-04-18
申请号：US18540946
申请日：2023-12-15
Applicant: Gigaphoton Inc.
Inventor： Keisuke ISHIDA
CPC classification number: H01S3/134 , G03F7/70025 , H01S3/10069 , H01S3/139
Abstract: A control method of a discharge-excitation type laser device including a power source configured to control a pulse energy of pulse laser light includes: during a first period, outputting the pulse laser light including a plurality of pulses from the discharge-excitation type laser device while periodically changing a wavelength; calculating correction data for correcting a voltage command value to be set to the power source in accordance with a change in the wavelength by using first time-series data of pulse energies of the plurality of pulses; and during a second period, acquiring the voltage command value, correcting the acquired voltage command value using the correction data, and outputting the pulse laser light from the discharge-excitation type laser device in accordance with the corrected voltage command value.
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公开(公告)号：US20220158408A1
公开(公告)日：2022-05-19
申请号：US17665087
申请日：2022-02-04
Applicant: Gigaphoton Inc.
Inventor： Keisuke ISHIDA
Abstract: A laser device may include a laser resonator; a chamber arranged on an optical path of the laser resonator; a pair of electrodes arranged in the chamber; a power source applying a voltage to the electrodes; a storage unit storing a voltage value; and a control unit configured to set an application voltage value of the voltage applied to the electrodes as setting the application voltage value for outputting a pulse whose pulse number is equal to or larger than 1 and smaller than i based on the voltage command value and the voltage value stored in the storage unit, and setting the application voltage for outputting a pulse whose pulse number is equal to or larger than i and smaller than j based on the voltage command value and an offset value corresponding to the voltage command value, where i>1 and j>i.
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公开(公告)号：US20230396033A1
公开(公告)日：2023-12-07
申请号：US18447520
申请日：2023-08-10
Applicant: Gigaphoton Inc.
Inventor： Keisuke ISHIDA
CPC classification number: H01S3/134 , H01S3/038 , H01S3/1305 , G03F7/2004 , G03F7/70025 , G03F7/7055 , H01S3/225
Abstract: A gas laser apparatus includes a laser oscillator including a pair of discharge electrodes disposed to face each other and configured to generate light from laser gas upon application of voltage, and a laser-side resonator in which the light resonates; an amplifier including an amplification unit and an amplification-side resonator; a beam splitter configured to reflect a part of the light from the laser-side resonator; an optical sensor configured to detect the light reflected by the beam splitter; and a processor configured to control the voltage based on an output from the optical sensor. The amplification-side resonator includes a rear mirror and an output coupling mirror. The laser-side resonator includes a grating and an output coupling mirror. The processor maintains the voltage at a constant value equal to or larger than a threshold of the voltage when the voltage is to be smaller than the threshold.
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Patent Agency Ranking
公开(公告)号：US20180254600A1
公开(公告)日：2018-09-06
申请号：US15973896
申请日：2018-05-08
Applicant: Gigaphoton Inc.
Inventor： Takahito KUMAZAKI , Keisuke ISHIDA , Hiroshi FURUSATO
CPC classification number: H01S3/137 , G01J3/0205 , G01J3/0218 , G01J3/027 , G01J3/10 , G01J3/26 , G01J3/28 , G01J2003/2859 , G03F7/70025 , G03F7/70575 , G03F7/70725 , H01S3/005 , H01S3/0078 , H01S3/034 , H01S3/08004 , H01S3/08009 , H01S3/10038 , H01S3/10061 , H01S3/10069 , H01S3/106 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308
Abstract: A narrowband laser apparatus may be provided with a laser resonator including optical elements for narrowing a spectral linewidth, a spectrometer configured to detect spectral intensity distributions of multiple pulses included in a pulsed laser beam output from the laser resonator, a spectral waveform producer configured to produce a spectral waveform by adding up the spectral intensity distributions of the multiple pulses, a device function storage configured to store a device function of the spectrometer, a wavelength frequency function generator configured to generate a wavelength frequency function which represents a frequency distribution of center wavelengths of the multiple pulses, and a deconvolution processor configured to perform deconvolution processing on the spectral waveform with the device function and the wavelength frequency function.
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公开(公告)号：US20180123312A1
公开(公告)日：2018-05-03
申请号：US15857894
申请日：2017-12-29
Applicant: Gigaphoton Inc.
Inventor： Hiroshi FURUSATO , Keisuke ISHIDA , Takeshi OHTA , Takahito KUMAZAKI , Osamu WAKABAYASHI
CPC classification number: H01S3/11 , H01S3/0078 , H01S3/08004 , H01S3/08009 , H01S3/134 , H01S3/137 , H01S3/1398 , H01S3/225 , H01S2301/04
Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. The controller is configured to measure a duty in a predetermined period before starting the second burst oscillation and a length of a suspension period from a time of ending the first burst oscillation to a time of starting the second burst oscillation, and perform a first control of the spectral width varying unit based on the duty and the length of the suspension period.
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公开(公告)号：US20200274315A1
公开(公告)日：2020-08-27
申请号：US16871758
申请日：2020-05-11
Applicant: Gigaphoton Inc.
Inventor： Keisuke ISHIDA , Masato MORIYA , Natsuhiko KOUNO , Takeshi ASAYAMA , Takashi KUSAMA
Abstract: An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.
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公开(公告)号：US20170222391A1
公开(公告)日：2017-08-03
申请号：US15486323
申请日：2017-04-13
Applicant: Gigaphoton Inc.
Inventor： Masato MORIYA , Takeshi OHTA , Keisuke ISHIDA , Takashi KUSAMA
CPC classification number: H01S3/13 , G01J1/0425 , G01J1/0474 , G01J3/28 , G01J9/0246 , G01J2009/0257 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0811 , H01S3/0823 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/2251 , H01S3/2256
Abstract: A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.
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公开(公告)号：US20150380893A1
公开(公告)日：2015-12-31
申请号：US14852120
申请日：2015-09-11
Applicant: Gigaphoton Inc.
Inventor： Takashi MATSUNAGA , Takahito KUMAZAKI , Keisuke ISHIDA , Osamu WAKABAYASHI
CPC classification number: H01S3/137 , H01S3/104 , H01S3/1055 , H01S3/1305 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256
Abstract: A laser device (100) may include: a laser resonator (20, 30) configured to output pulsed laser light (L); an actuator (35, 36, 37) configured to change wavelength of the pulsed laser light; and a controller (110) configured to receive data of target wavelength for a plurality of pulses of the pulsed laser light before the pulsed laser light is output, and to control the actuator, based on the data of the target wavelength for the plurality of pulses, such that the wavelength of the pulsed laser light approaches the data of the target wavelength.
Abstract translation: 激光装置（100）可以包括：激光谐振器（20,30），被配置为输出脉冲激光（L）; 被配置为改变脉冲激光的波长的致动器（35,36,37）; 以及控制器（110），被配置为在脉冲激光输出之前接收脉冲激光的多个脉冲的目标波长的数据，并且基于多个脉冲的目标波长的数据来控制致动器 使得脉冲激光的波长接近目标波长的数据。
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