公开(公告)号：US20200244032A1

公开(公告)日：2020-07-30

申请号：US16849618

申请日：2020-04-15

Applicant: Gigaphoton Inc.

Inventor： Keisuke ISHIDA ,  Satoshi KOMURO ,  Hiroshi FURUSATO

IPC: H01S3/134 ,  H01S3/097 ,  H01S3/13 ,  H01S3/036 ,  G03F7/20

Abstract: An excimer laser apparatus according to the present disclosure includes a chamber configured to accommodate a laser gas and a pair of electrodes and generate pulse-oscillating laser light when the gas pressure of the laser gas is controlled in accordance with voltage applied between the pair of electrodes, a power supply configured to apply the voltage between the pair of electrodes, and a controller to which a target value of the spectral linewidth of the laser light is inputted, the controller configured to correct the voltage used to control the gas pressure, when the target value changes from a first target value to a second target value, based on a first function having the second target value as a parameter and control the gas pressure in accordance with the corrected voltage.