公开(公告)号：US20200040452A1

公开(公告)日：2020-02-06

申请号：US16510845

申请日：2019-07-12

Applicant: Applied Materials, Inc.

Inventor： Daniel HWUNG ,  Yuxing ZHANG ,  Kalyanjit GHOSH ,  Kaushik ALAYAVALLI ,  Amit Kumar BANSAL

IPC: C23C16/455 ,  H01L21/67

Abstract: A faceplate for a processing chamber is disclosed. The faceplate has a body with a plurality of apertures formed therethrough. A flexure is formed in the body partially circumscribing the plurality of apertures. A cutout is formed through the body on a common radius with the flexure. One or more bores extend from a radially inner surface of the cutout to an outer surface of the body. A heater is disposed between flexure and the plurality of apertures. The flexure and the cutout are thermal chokes which limit heat transfer thereacross from the heater.

公开(公告)号：US20250136386A1

公开(公告)日：2025-05-01

申请号：US18928578

申请日：2024-10-28

Applicant: Applied Materials, Inc.

Inventor： Upendra UMMETHALA ,  Kaushik ALAYAVALLI ,  Ralph LINDENBERG ,  Tuan Anh NGUYEN ,  Amit HATTANGADI

IPC: B65G47/26 ,  B65G47/90 ,  H02N13/00

Abstract: A cluster tool for fabricating substrates includes a factory interface; a first processing mainframe coupled to the factory interface, including: a processing chamber monolithic structure including four processing chambers in the same housing; four load locks coupled to the processing chamber monolithic structure, each load lock including a heater assembly configured to increase the temperature of a substrate disposed in the load lock; and a swapper assembly disposed between the four load locks and the processing chamber monolithic structure, wherein the swapper assembly includes four swappers, each swapper configured to swap substrates between one processing chamber and one load lock along a linear trajectory.

公开(公告)号：US20200098547A1

公开(公告)日：2020-03-26

申请号：US16583003

申请日：2019-09-25

Applicant: Applied Materials, Inc.

Inventor： Priyanka DASH ,  Zhijun JIANG ,  Ganesh BALASUBRAMANIAN ,  Qiang MA ,  Kalyanjit GHOSH ,  Kaushik ALAYAVALLI ,  Yuxing ZHANG ,  Daniel HWUNG ,  Shawyon JAFARI

IPC: H01J37/32 ,  H01L21/67 ,  C23C16/44

Abstract: Systems and methods for a process chamber that decreases the severity and occurrence of substrate defects due to loosened scale is discussed herein. A gas distribution assembly is disposed in a process chamber and includes a faceplate with a plurality of apertures formed therethrough and a second member. The faceplate is coupled to the second member which is configured to couple to the faceplate to reduce an exposed area of the faceplate and minimize an available area for material buildup during the release of gas into the process chamber. The second member is further configured to improve the glow of precursors into the process chamber. The gas distribution assembly can be heated before and during process chamber operations, and can remain heated between process chamber operations.

公开(公告)号：US20250033156A1

公开(公告)日：2025-01-30

申请号：US18784593

申请日：2024-07-25

Applicant: Applied Materials, Inc.

Inventor： Upendra UMMETHALA ,  Praveen CHORAGUDI ,  Kaushik ALAYAVALLI ,  Bhawesh AGRAWAL

IPC: B23Q7/14 ,  B23Q11/14

Abstract: A swapper assembly of a cluster tool includes a housing, at least two swappers, and a motor assembly. The at least two swappers are at least partially disposed within and rotatable relative to the housing. Each swapper includes a body, a first arm, and a second arm. The first arm and second arm are rotatable relative to the body. The motor assembly includes at least one motor, and the motor assembly is configured to operate the at least two swappers simultaneously to change the position of the first arm and second arm.

公开(公告)号：US20190226088A1

公开(公告)日：2019-07-25

申请号：US16255120

申请日：2019-01-23

Applicant: Applied Materials, Inc.

Inventor： Yuxing ZHANG ,  Sanjeev BALUJA ,  Kaushik ALAYAVALLI ,  Kalyanjit GHOSH ,  Daniel HWUNG

IPC: C23C16/455

Abstract: Embodiments herein generally relate to gas distribution apparatuses. In one aspect, the disclosure relates to a faceplate having a plurality of apertures therethrough. Thermal chokes are disposed on the faceplate radially outward of the apertures. Seals are disposed at distal ends of the thermal chokes and are thermally separated from a body of the faceplate by the thermal chokes.

公开(公告)号：US20190119816A1

公开(公告)日：2019-04-25

申请号：US16168462

申请日：2018-10-23

Applicant: Applied Materials, Inc.

Inventor： Yuxing ZHANG ,  Daniel HWUNG ,  Ashutosh AGARWAL ,  Kaushik ALAYAVALLI ,  Kalyanjit GHOSH

IPC: C23C16/455 ,  C23C16/44

Abstract: Embodiments herein relate to gas distribution apparatuses. In one aspect, the disclosure herein relates to a showerhead including a body having an upper surface and a lower surface. A thermal choke is disposed adjacent a perimeter of the body. The thermal choke includes a plurality of interleaved channels. One or more apertures are disposed between the upper surface and the lower surface of the body.

公开(公告)号：US20250038021A1

公开(公告)日：2025-01-30

申请号：US18752292

申请日：2024-06-24

Applicant: Applied Materials, Inc.

Inventor： Upendra UMMETHALA ,  Tuan Anh NGUYEN ,  Kaushik ALAYAVALLI

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687

Abstract: A cluster tool includes: a factory interface including a first robot with an end effector; a first processing mainframe coupled to the factory interface, including: a first processing chamber; a first load lock including a first opening facing the factory interface configured to receive the end effector of the first robot, the first load lock further including a first slit valve configured to selectively open and close the first opening; at least one first LCF sensor disposed between the factory interface and the first slit valve; and a swapper assembly disposed between the first load lock and the first processing chamber, wherein the swapper assembly includes a first swapper configured to swap substrates between the first processing chamber and the first load lock along a first trajectory.

公开(公告)号：US20240271284A1

公开(公告)日：2024-08-15

申请号：US18634376

申请日：2024-04-12

Applicant: Applied Materials, Inc.

Inventor： Kallol BERA ,  Sathya Swaroop GANTA ,  Timothy Joseph FRANKLIN ,  Kaushik ALAYAVALLI ,  Akshay DHANAKSHIRUR ,  Stephen C. GARNER ,  Bhaskar KUMAR

IPC: C23C16/52 ,  C23C16/505 ,  C23C16/54 ,  H01J37/32

CPC classification number: C23C16/52 ,  C23C16/505 ,  C23C16/54 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/3266 ,  H01J37/32669

Abstract: Embodiments described herein relate to magnetic and electromagnetic systems and a method for controlling the density profile of plasma generated in a process volume of a PECVD chamber to affect deposition profile of a film on a substrate and/or facilitate chamber cleaning after processing. In one embodiment, a system is disclosed that includes a rotational magnetic housing disposed about an exterior sidewall of a chamber. The rotational magnetic housing includes a plurality of magnets coupled to a sleeve that are configured to travel in a circular path when the rotational magnetic housing is rotated around the chamber, and a plurality of shunt doors movably disposed between the chamber and the sleeve, wherein each of the shunt doors are configured to move relative to the magnets.

公开(公告)号：US20210269919A1

公开(公告)日：2021-09-02

申请号：US17131315

申请日：2020-12-22

Applicant: Applied Materials, Inc.

Inventor： Kallol BERA ,  Sathya Swaroop GANTA ,  Timothy Joseph FRANKLIN ,  Kaushik ALAYAVALLI ,  Akshay DHANAKSHIRUR ,  Stephen C. GARNER ,  Bhaskar KUMAR

IPC: C23C16/52 ,  H01J37/32 ,  C23C16/54

Abstract: Embodiments described herein relate to magnetic and electromagnetic systems and a method for controlling the density profile of plasma generated in a process volume of a PECVD chamber to affect deposition profile of a film on a substrate and/or facilitate chamber cleaning after processing. In one embodiment, a system is disclosed that includes a rotational magnetic housing disposed about an exterior sidewall of a chamber. The rotational magnetic housing includes a plurality of magnets coupled to a sleeve that are configured to travel in a circular path when the rotational magnetic housing is rotated around the chamber, and a plurality of shunt doors movably disposed between the chamber and the sleeve, wherein each of the shunt doors are configured to move relative to the magnets.

公开(公告)号：US20190226089A1

公开(公告)日：2019-07-25

申请号：US16255377

申请日：2019-01-23

Applicant: Applied Materials, Inc.

Inventor： Yuxing ZHANG ,  Sanjeev BALUJA ,  Kaushik ALAYAVALLI ,  Kalyanjit GHOSH ,  Daniel HWUNG

IPC: C23C16/455 ,  C23C16/458

Abstract: Embodiments herein relate to an apparatus for use in a substrate processing chamber is disclosed herein. The apparatus has a faceplate, a support member, and a spacer. A plurality of apertures is formed through the faceplate. The faceplate is coupled to and supported by the support member. The spacer is further coupled to the support member.